2016 Fiscal Year Final Research Report
Deep UV emisson device by integrated pulsed laser deposition method
Project/Area Number |
25289256
|
Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Partial Multi-year Fund |
Section | 一般 |
Research Field |
Material processing/Microstructural control engineering
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Research Institution | Tohoku University |
Principal Investigator |
|
Co-Investigator(Renkei-kenkyūsha) |
SATO SHUNICHI 東北大学, 多元物質科学研究所, 教授 (30162431)
|
Project Period (FY) |
2013-04-01 – 2017-03-31
|
Keywords | パルスレーザー堆積法 / 冷凍ターゲット / ワイドバンドギャップ半導体 / 薄膜 |
Outline of Final Research Achievements |
This study aimed at fabricating a high-quality cubic-type boron nitride (c-BN) thin films for a deep-UV light-emitting diode by integrated pulsed laser deposition method. A diamond-like carbon (DLC) films with high sp3 content and with very flat surface morphology were prepared by PLD using a frozen cyclohesane target. A thin film composed of c-BN and B2O3 was formed by PLD of a frozed borazine target with high intensity laser pulses. B2O3 was formed by laser ablation of a B(OH)3 which was produced by chemical reaction of borazine with water molecules during laser irradiation.
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Free Research Field |
レーザープロセッシング
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