Crystal growth of molybdenum oxide films and its application in environmentally-resistant devices

2016 Fiscal Year Final Research Report

• Project/Area Number: 25390033
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Nanomaterials engineering
• Research Institution: Osaka Institute of Technology
• Principal Investigator: Koike Kazuto 大阪工業大学, 工学部, 教授 (40351457)
• Project Period (FY): 2013-04-01 – 2017-03-31
• Keywords: 酸化モリブデン / 分子線エピタキシー / 結晶構造解析 / 熱処理効果 / 高エネルギー粒子線耐性

Outline of Final Research Achievements

Molybdenum trioxide (MoO3) has attracted much attention for such application fields as resistive random access memories, electrochromic displays and microbatteries. Therefore, growth and characterization of amorphous/polycrystalline MoO3 films have been studied extensively, however, there are few reports on single-crystalline MoO3 films. In this work, we studied molecular beam epitaxial (MBE) growth of MoO3 films on sapphire and LSAT substrates and reported that high-quality orthorhombic-phase MoO3 films were successfully grown on these substrates (Details are described in the next section). Our experimental results may be useful for the application of MoO3 films to novel functional devices in the next generation.

Free Research Field

結晶成長，物性探索，新規能デバイス応用