High sensitive and high resolution imaging of the optical near field based the surface photovoltage

2014 Fiscal Year Final Research Report

• Project/Area Number: 25600117
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Optical engineering, Photon science
• Research Institution: Osaka University
• Principal Investigator: LI yanjun 大阪大学, 工学(系)研究科(研究院), 准教授 (50379137)
• Co-Investigator(Kenkyū-buntansha): 菅原 康弘 , 教授 (40206404)
• Project Period (FY): 2013-04-01 – 2015-03-31
• Keywords: 近接場光 / AFM / 原子分解能

Outline of Final Research Achievements

The atomic-resolution optical imaging that overcomes the diffraction limit of light is a challenging task. However, atomic-resolution imaging of the optical field has not yet been achieved. We investigate the atomic-resolution imaging of the optical near-field on a surface. In this method, the surface photovoltage of the silicon tip apex induced by the optical near-field on the surface is measured. For the first time, we achieve atomic resolution imaging of the optical near-field on the sapphire α-Al2O3 (0001) surface.
We observe the strong tip-sample distance dependence of the surface photovoltage. This success is a promising development in the exploration of atomic-scale physical and chemical interactions between light and atoms/molecules and offers deeper insight into the various photonic processes and functions on surfaces.

Free Research Field

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