2015 Fiscal Year Final Research Report
Development of conductive scanning probe microscopy system for highly sensitive current-voltage measurement at nanoscale
| Project/Area Number |
25630168
|
|---|
| Research Category |
Grant-in-Aid for Challenging Exploratory Research
|
| Allocation Type | Multi-year Fund |
|---|
| Research Field |
Measurement engineering
|
|---|
| Research Institution | University of Tsukuba |
|---|
Principal Investigator |
|
|---|
| Project Period (FY) |
2013-04-01 – 2016-03-31
|
| Keywords | 導電性プローブ顕微鏡 |
|---|
| Outline of Final Research Achievements |
Fabrication of coaxial conductive probes and suppression of displacement current using electro static shields were investigated for highly sensitive current-voltage measurement at nanoscale using a conductive atomic-force microscopy (CAFM). The coaxial conductive probes with a probe hole of a diameter of around 10 um were successfully fabricated by focused ion beam processes. In addition, the stray capacitance of CAFM were found to be reduced up to 95 % by using the electro static shields. This result indicates that the sensitivity of current-voltage measurement of CAFM can be improved 10 times using the electro static shields.
|
| Free Research Field |
プローブ顕微鏡
|
