Photo-induced sol-gel processing for low-temperature fabrication of high-performance silsesquioxane membranes for use in molecular separation

2015 Fiscal Year Final Research Report

• Project/Area Number: 25630345
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Properties in chemical engineering process/Transfer operation/Unit operation
• Research Institution: Hiroshima University
• Principal Investigator: Tsuru Toshinori 広島大学, 工学(系)研究科(研究院), 教授 (20201642)
• Co-Investigator(Renkei-kenkyūsha): YOSHIOKA TOMOHISA 広島大学, 大学院工学研究院, 准教授 (50284162) ; KANEZASHI MASAKOTO 広島大学, 大学院工学研究院, 助教 (10467764)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Keywords: シリカ膜 / 光ゾルゲル / 光酸発生剤 / 分離 / 薄膜製膜

Outline of Final Research Achievements

Silsesquioxane (SQ) has demonstrated properties that are seen in both silica (SiO2, inorganic) and silicone (organic). Conventionally, SQ-derived sols are coated onto ceramic supports, followed by firing at 200~400C, which facilitates further condensation to form a SQ separation layer with high separation performance. In this work, we proposed, for the first time, the strategy for fabricating silsesquioxane (SQ) membranes at low temperature using photo-induced sol-gel processing. Radical and cationic polymerization of SQ membranes showed high degrees of separation factor and permeance for water/isopropanol separation in pervaporation.

Free Research Field

化学工学　分離工学