2015 Fiscal Year Final Research Report
Development of innovative application of graphene nanoribbon with advanced plasma processing
Project/Area Number |
25706028
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Research Category |
Grant-in-Aid for Young Scientists (A)
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Allocation Type | Partial Multi-year Fund |
Research Field |
Plasma electronics
|
Research Institution | Tohoku University |
Principal Investigator |
Kato Toshiaki 東北大学, 工学(系)研究科(研究院), 講師 (20502082)
|
Project Period (FY) |
2013-04-01 – 2016-03-31
|
Keywords | グラフェンナノリボン / プラズマCVD / 大面積合成 / 合成機構 |
Outline of Final Research Achievements |
Wafer-scale, high-yield synthesis of suspended graphene nanoribbon arrays using a bottom-up approach is demonstrated and a promising growth model of suspended graphene nanoribbons is also established through a comprehensive study that combined experiments, molecular dynamics simulations and theoretical calculations with a phase-diagram analysis. Since the suspended graphene nanoribbon includes unique electrical and mechanical structures, our results can contribute to developing a novel application of graphene nanoribbon.
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Free Research Field |
プラズマエレクトロニクス
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