2014 Fiscal Year Final Research Report
Development of an innovative atmospheric-pressure CVD method for the synthesis of graphene films
| Project/Area Number |
25800309
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Plasma science
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| Research Institution | National Institute of Advanced Industrial Science and Technology |
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Principal Investigator |
KIM JAEHO 独立行政法人産業技術総合研究所, 電子光技術研究部門, 主任研究員 (30376595)
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| Project Period (FY) |
2013-04-01 – 2015-03-31
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| Keywords | グラフェン / ナノカーボン材料 / 大気圧プラズマ / プラズマCVD / マイクロ波プラズマ |
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| Outline of Final Research Achievements |
The technology for the production of a large-scale atmospheric pressure plasma jet is realized using microstrip line and an array configuration. The developed plasma jet provides a low-temperature plasma with high uniformity even at atmospheric pressure and has advanced discharge characteristics as a plasma source for CVD applications. Also, the high-pressure CVD system for the synthesis of graphene films was developed using the plasma jet.
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| Free Research Field |
プラズマ応用工学
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