2016 Fiscal Year Final Research Report
Development of plasma processing methods for the metallic oxide thin films having an electricity storage function
| Project/Area Number |
26390098
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Plasma electronics
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| Research Institution | Kyushu University |
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Principal Investigator |
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| Project Period (FY) |
2014-04-01 – 2017-03-31
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| Keywords | フォトクロミズム / プラズマCVD / PLD / 金属酸化薄膜 / X線吸収微細構造 / 蓄電機能 |
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| Outline of Final Research Achievements |
Metallic oxide thin-films made of zinc oxide and silicon oxide, for example, exhibit photochromism (PC) and electrochromism. This study developed the method to fabricate such thin films using plasma processing. Two methods were used. One was the pulsed laser deposition (PLD) method and another was the plasma CVD method. By the PLD method, PC thin films were successfully fabricated on the whole surface of the 30 mm square substrate. For the CVD method, we found that the PC-transformation can be exhibited only by the zinc oxide (ZnO) thin film. The crystal structure of the ZnO PC thin films were examined by the x-ray absorption at the Zn-K edge. It is confirmed that the ionic valence around Zn atoms is changed as a result of the PC-transformation.
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| Free Research Field |
プラズマ理工学
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