Optimization of Isostatic Press Conditions and Improvement of Interfacial Adhesion Strength to Create Highly Densified Nano Organic Semiconducting Films

2016 Fiscal Year Final Research Report

• Project/Area Number: 26420033
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Materials/Mechanics of materials
• Research Institution: Ibaraki National College of Technology
• Principal Investigator: KANARI Moriyasu 茨城工業高等専門学校, 電子制御工学科, 准教授 (70331981)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Keywords: 有機半導体 / 空孔 / 等方加圧 / 密度 / 弾性率 / 硬さ / 曲げ強度 / 高分子材料

Outline of Final Research Achievements

In this study, we aim to establish an isostatic press (IP) method, by which low-molecular-weight and polymeric organic thin films are wholly densified and strengthened, and optimize conditions of coating and pressing pressure. All the low molecular films have been successfully densified by the IP method. Densifying rates of the films ranged from 40% of metal-free phthalocyanine films to 8.4% of pentacene films depending on their grain shapes and aggregation conditions. Two polymeric films also have densified over the rate of 15%. The indentation hardness of as-coat PMMA films was improved by a rate of 40% with the IP method. PEDOT/PSS films have been densified by adding a organic solvent into the pristine solution.

Free Research Field

ナノマイクロ材料力学。特に、ナノインデンテーション法を用いた薄膜等の材料の力学的性質の評価。