Study of Electroless plating film/glass interface by development of in-situ XAFS system

2016 Fiscal Year Final Research Report

• Project/Area Number: 26420741
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Material processing/Microstructural control engineering
• Research Institution: Kyushu University
• Principal Investigator: Sugiyama Takeharu 九州大学, シンクロトロン光利用研究センター, 准教授 (80391994)
• Project Period (FY): 2014-04-01 – 2017-03-31
• Keywords: 無電解めっき / UV処理 / in-situ XAFS / 放射光 / 硬X線

Outline of Final Research Achievements

Measurements of XAFS have been performed for electro- and electroless-deposition films formed in combination with an UV irradiation treatment on non-conductive substrates. Although XANES spectra of the Ag L3 edge (3.35 keV) represented no significant difference, the results suggested the existence of an oxidation layer at an outermost surface. An in-situ XAFS system equipped with a sample heating holder has been developed. The system is applicable for both of a conversion electron yield method and a partial fluorescence yield method using an X-ray energy below 4 keV in He gas.

Free Research Field

分光計測