2015 Fiscal Year Final Research Report
3D Microfabrication on silicon by a femtosecond laser via non-linear processes
Project/Area Number |
26630023
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Research Category |
Grant-in-Aid for Challenging Exploratory Research
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Allocation Type | Multi-year Fund |
Research Field |
Production engineering/Processing studies
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Research Institution | Nagaoka University of Technology |
Principal Investigator |
ITO YOSHIRO 長岡技術科学大学, 工学(系)研究科(研究院), 教授 (60176378)
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Co-Investigator(Kenkyū-buntansha) |
田辺 里枝 長岡技術科学大学, 技学研究院機械創造工学, 助教 (70432101)
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Project Period (FY) |
2014-04-01 – 2016-03-31
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Keywords | 赤外フェムト秒レーザー / シリコン / 3D 加工 / 非線形吸収 / 湿式エッチング / レーザー誘起表面周期構造 |
Outline of Final Research Achievements |
Silicon (Si) is transparent for radiation longer than 1127 nm. Using tightly focused short laser pulses at infrared wavelength, 3D microfabrication via non-linear absorption processes would be possible on rare surface as well as inside the substrate. We tried to machine rare surface of a Si substrate for the first step of the 3D machining of Si. A problem was aberration of laser light due to high refractive index of Si. We tried to avoid the aberration by using an objective lens with a correction collar or using a spatial light modulator. Even using these equipment, machining of a groove on the rare surface is not achieved. Instead, fine periodic structures with 300 nm interval is formed with no change on lase-irradiated front surface. Properties and conditions where the structure is formed are elucidated. To machine the rare surface, laser-assisted wet etching using KOH solution was tried. Grooves with some micrometer deep are formed without any effect on the front surface.
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Free Research Field |
レーザー加工
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