1985 Fiscal Year Final Research Report Summary
High reslution and high intensity X-ray source
| Project/Area Number |
59840022
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| Research Category |
Grant-in-Aid for Developmental Scientific Research
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| Allocation Type | Single-year Grants |
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| Research Field |
鉱物学(含岩石・鉱床学)
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| Research Institution | The University of Tokyo |
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Principal Investigator |
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| Project Period (FY) |
1984 – 1985
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| Keywords | X-ray diffraction / High resolution / High intensity / X線源 |
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| Research Abstract |
The structural imperfection of a crystal, which is called to be a microstructure of a crystal, can be observed as diffuse streaks in the diffraction diagram. This microstructure is closely corelated to the thermal histories of the crystal. However, it is not easy to observe the diffuse streaks cause by microstructure by means of the usual X-ray source. If a X-ray source of high resolution and high intensity is attained in the usual experimental condition, this X-ray source can widely be applied to the scientific and industrial fields. The normal X-ray generator with a fine-focused X-ray tube was adopted to the present experiment and the adjustment base was also designed in order to make the alignment of the diffraction system easy. The high resolution X-ray source was obtained by introducing the Guinier-Johansonn type monochromator, by which the strictly monochromatized X-ray of CuK 1 , was focused on the film set by 210mm from the monochromator crystal. The high intensity was attained by means of Laue method. The weak point of Laue method is that the higher order reflections lie one upon another. However, if the strictly monochromatized X-ray source is used, only the first order reflection is recorded on the film and the merit of Laue method of high intensity can be kept on. The diffraction system above mentioned was applied to a plagioclase, which shows an exsolution microtexture, and the diffuse streaks by microdomains were clearly observed with high resolution.
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