1987 Fiscal Year Final Research Report Summary
Application of Multilayer Reflectors to Spectroscopic and Instruments for Cosmic X-Ray Observation
| Project/Area Number |
60420004
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| Research Category |
Grant-in-Aid for General Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Research Field |
Astronomy
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| Research Institution | Osaka University |
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Principal Investigator |
YAMASHITA Koujun Faculty of Science, Osaka University, 理学部, 助教授 (80022622)
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| Co-Investigator(Kenkyū-buntansha) |
KITAMOTO Shunji Faculty of Science, Osaka University, 理学部, 助手 (70177872)
TSUNEMI Hiroshi Faculty of Science, Osaka University, 理学部, 助手 (90116062)
MIYAMOTO Shigenori Faculty of Science, Osaka University, 理学部, 教授 (70013638)
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| Project Period (FY) |
1985 – 1987
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| Keywords | Multilayer-Reflector / Normal Incidence X-Ray Telescope / Grazing Incidence X-Ray Telescope / X-Ray Spectrometer / X線偏光子 / X線光学系 / 薄膜物性 |
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| Research Abstract |
Development of multilayer reflectors makes it possible to apply to the grazing and normal incidence X-ray optic system for the comsic X-ray observation in 0.1 - 10keV region. For the grazing incidence X-ray telescope, multilayer reflectors have an advantage to make larger the glancing angle and to extend the energy range up to 10keV in the fixed geometrical configuration. The normal incidence X-ray telescope is attainable in the energy range below 0.4keV, though the sensitive energy hand is limited by Bragg condition estimated form the layer thickness and the number of layer pairs. Multilayers are also useful optical elements to fabricate the X-ray spectrometer and polarimeter.
We are fabricating multilayer reflectors with an electro beam evaporation in method ultrahigh vacuum. Material combinations are Mo/C, Mo/Si and Ni/C with 5-20 layer pairs and the layer thickness of 36-100A. They are deposited on flat and figured substrates of float glass and superpolished glass with the surface roughness of 2-3A(rms).
Multilayers thus fabricated are evaluated by measuring the reflectivity, the wavelength resolution and the Bragg angle of the reflection order with four characteristic X-rays of Cu-K<alpha>(1.54A), Si-K<alpha> (7.13A), Al-K<alpha>(8.34A), C-K<alpha>(44.7A). Further investigations are carried out with the monochromatized synchrotron radiation in 14-250A band at Photon Factory, National Laboratory for High Energy Physics, and at UVSOR, Institute for Molecular Science. The peak reflectivity of Cu-K<alpha> is obtained to be 80% for Mo/C in the grazing incidence and that of <lambda>160A to be more than 30% for Mo/Si in the near normal incidence.
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