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1987 Fiscal Year Final Research Report Summary

Chemical Engineering Study of Chemical Vapor Depositionto Produce Particles and Films

Research Project

Project/Area Number 60430026
Research Category

Grant-in-Aid for General Scientific Research (A)

Allocation TypeSingle-year Grants
Research Field 化学工学
Research InstitutionUniversity of Tokyo

Principal Investigator

INOUE Hakuai  Univ. of Tokyo, Facul. of Engineering, Prof., 工学部, 教授 (80010768)

Co-Investigator(Kenkyū-buntansha) KUNIO Yoshida  Univ. of Tokyo, Facul. og Engineering, Prof., 工学部, 教授 (70010808)
KOREKAZU Ueyama  Univ. of Tokyo, Facul. of Engineering, Assist. Prof., 工学部, 助教授 (10092149)
SHINTAROU Furusaki  Univ. of tokyo, Facul. of Engineering, Prof., 工学部, 教授 (40011209)
HIROHSI komiyama  Univ. of Tokyo, Facul. of Engineering, Assist. Prof., 工学部, 助教授 (80011188)
MOTOYUKI Suzuki  Univ. of Tokyo, Inst. of Industrial Sci. Prof., 生産技術研究所, 教授 (10011040)
Project Period (FY) 1985 – 1987
KeywordsCVD / 超微粒子 / 薄膜 / 流動層 / GaAs / TiO2 / Si, AlN
Research Abstract

Seven individucal research groups joined this project to study cooperatively the mechanism of the growth of particles and films by the chemical vapor deposition method and the development of novel applications of the method. The followings list the activities of each group.
Inoue, H. studied surface reactions occurring in CVD and applied CVD of tetra-ethoxysilane to reduce the pore size of porous silica membrane. Suzuki,M. studied the gas-phase mechanisms occurring in MOCVD to prepare GaAs thin films. Komiyama, H. studied the gas-phase mechanims to produce Tio _2 particles by CVD using titanium-tetra-isopropoxide for pyrolysis and hydrolysis. He also tried to develop a new CVD approach which is named 'Particle precipitation aided CVD' for the rapid growth of Films. Ueyama, K. and Furusaki, S. studied the two component CVD process to produce the amorphous mixed particles of SiO_2 and GeO_2. Suganuma, A. studied high temperature preparation of TiO_2 from TiCl_4 and O_2. Yoshida, K. developed a fluidized CVD process to apply coating of particles, specifically coating of power plant fuel particles with graphite. Furusawa, T. developed also fluidization process to produce poli-silicon particles from silane.
Key words: CVD, Particle, Film, Fluidization, GaAs, TiO_2,Si, AlN

  • Research Products

    (37 results)

All Other

All Publications (37 results)

  • [Publications] 佐藤 理夫: 化学工学. 51. 389-395 (1987)

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      「研究成果報告書概要(和文)」より
  • [Publications] Motoyuki Suzuki: J. Electrochem. Soc.132. 1684-1688 (1985)

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      「研究成果報告書概要(和文)」より
  • [Publications] Michio Sato: J. Electrochem. Soc. 134. 1540-1548 (1987)

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  • [Publications] Michio Sato: Jpn. J. Appl. Phys.25. 1890-1894 (1986)

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  • [Publications] Michio Sato: Jpn. J. Appl. Phys.26. 428-433 (1987)

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  • [Publications] 金井 貴詩: 化学工学論文集. 11. 317-323 (1985)

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  • [Publications] Fikret Kirkbir: Proceeding of World Congress 3 of Chemical Engineering. 69-72 (1986)

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  • [Publications] Fikret Kirkbir: Can. J. Chew. Eng.65. 759-766 (1987)

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  • [Publications] Fikret Kinkbir: J. Amer. Ceramics Soc.

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  • [Publications] Fikret Kirkbir: Chem. Lett.

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  • [Publications] Tatsuya Okubo: J. Membrane Sci.

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  • [Publications] 小島 紀徳: 化学工学. 51. 217-223 (1987)

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  • [Publications] Toshinori Kojima: Proc. of 4th APCCHE′87 SINGAPORE. (1987)

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  • [Publications] Takehiko Furusawa: Proc. of 10th Int. Symp. on chemical Reaction Engineering.

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  • [Publications] Hiroshi Komiyama: Jpn. J. Appl. Phys. 24. 795-797 (1985)

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      「研究成果報告書概要(和文)」より
  • [Publications] Yukihiro Shimogaki: Chem. Lett.267-268 (1986)

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      「研究成果報告書概要(和文)」より
  • [Publications] 霜垣 幸浩: Yogyo-Kyokai-Shi. 95. 70-75 (1987)

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  • [Publications] Hiroshi Komiyama: Proc. of High Tech Ceramics. 667-676 (1987)

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  • [Publications] Hiroshi Komiyama: Proc. of 10th Int. Conf. on CVD. 1119-1128 (1987)

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  • [Publications] 小宮山 宏: 膜. 12. 72-80 (1987)

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      「研究成果報告書概要(和文)」より
  • [Publications] Motoyuki Suzuki: "Diffusivity and Thermal Cracking Rate of Matalorganic Gases by Chromatography" J. Electrochem. Soc.132. 1684-1688 (1985)

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      「研究成果報告書概要(欧文)」より
  • [Publications] Michio Sato: "Growth Rate of GaAs Epitaxial Films Grown by MOCVD" J. Electrochem. Soc.134. 1540-1548 (1987)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Michio Sato: "Effect of Boundary Layer Thickness on the Photoluminescence Spectra of GaAs Grown by MOCVD" Jpn. J. Appl. Phys.25. 1890-1894 (1986)

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      「研究成果報告書概要(欧文)」より
  • [Publications] Michio Sato: "Numerical Analysis of Group-V Element Transport and Incorporation at a Growing Surface in MOCVD Reactor" Jpn. J. Appl. Phys.26. 428-433 (1987)

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      「研究成果報告書概要(欧文)」より
  • [Publications] Fikret Kirkbir: "Preparation of Porous, Amorphous, and Fine TiO_2 Particles by Chemical Vapor Deposition" Proceeding of World Congress III. of Chemical Engineering. 69-72 (1986)

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      「研究成果報告書概要(欧文)」より
  • [Publications] Fikret Kirkbir: "Formatio and Growth Mechanism of Porous, Amorphous, and Fine Particles Prepared by Chemical Vapor Deposition. Titania from Titanium Tetraisopropoxide" Can. J. Chem. Eng.65. 759-766 (1987)

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      「研究成果報告書概要(欧文)」より
  • [Publications] Fikret Kirkbir: "Continous Production of Fine TiO_2 Powders by Vapor-Phase Hydrolysis of Titanium Tetraisopropoxide" J. Amer. Ceramics Soc.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Fikret Kirkbir: "Low Temperature Synthesis of TiO_2 by Vapor-Phase Hydrolysis of Titanium TetraIsopropoxide" Chem. Lett.

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      「研究成果報告書概要(欧文)」より
  • [Publications] Tatsuya Okubo: "Intrduction of Specific Gas Selectivity to Porous Glass Membrane by Treatment with Tetraethoxysilane" J. Membrane Sci.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Toshinori Kojima: "Kinetic Study on Thermal Decomposition of Monosilane for Production of High Purity Silicon" Proc. of 4th APCCHE 87 SINGAPORE.(1987)

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      「研究成果報告書概要(欧文)」より
  • [Publications] Takehiro Furusawa: "Chemical Vapor Deposition and Homogeneous Nucleation in Monosilane Pyrolysis within Interparticle Spaces-Application of Fines Formation Analysis to Fluidized Bed CVD-" Proc. of 10th Int. Symp. on Chemical Reaction Engineering.

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroshi Komiyama: "Rapid Growth of AIN Films by Particle-Precipitation Aided Chemical Vapor Deposition" Jpn. J. Appl. Phys.24. 795-797 (1985)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Yukinori Shimogaki: "Preparation of Amorphous TiO_2 Films by Themophoresis-Aided Chemical Vapor Deposition" Chem. Lett.267-268 (1986)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Yukihiro Shimogaki: "Rapid Growth of TiO_2 Films by Particle-Precipitation Aided Chemical Vapor Deposition" Yogyo-Kyokai-Shi. 95. 70-75 (1987)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroshi Komiyma: "Rapid Growth of AIN Films by Particle Precipitation Aided Chemical Vapor Deposition" Proc. of High Tech Ceramics. 667-676 (1987)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroshi Komiyama: "Particle Precipitation Aided Chemical Vapor Deposition for Rapid Growth of Ceramic Films-Preparation of 1mm thick AIN, TiO_2 and ZrO_2 Films-" Proc. of 10th Int. Conf. on CVD. 1119-1128 (1987)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Hiroshi Komiyama: "Mechanism of Chemical Vapor Deposition and its Application to Preparation of Membranes" Membrane. 12. 72-80 (1987)

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      「研究成果報告書概要(欧文)」より

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Published: 1989-03-30  

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