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1988 Fiscal Year Final Research Report Summary

Theoretical and experimental studies on conducting transparent thin films to obtain highly trasparent films with low sheet resistance

Research Project

Project/Area Number 60550014
Research Category

Grant-in-Aid for General Scientific Research (C)

Allocation TypeSingle-year Grants
Research Field Applied materials
Research InstitutionKanazawa Institute of Technology

Principal Investigator

MINAMI Tadatsugu  Kanazawa Institute of Technology, Associate Professor, 工学部, 助教授 (70113032)

Co-Investigator(Kenkyū-buntansha) TAKATA Shinzo  Kanazawa Institute of Technology, Professor, 工学部, 教授 (70064467)
NANTO Hidehito  Kanazawa Institute of Technology, Associate Professor, 工学部, 助教授 (30133466)
Project Period (FY) 1985 – 1987
Keywordsconducting transparent film / zinc oxide / indium tin oxide / tin oxide / magnetron sputtering / transparent electrode
Research Abstract

At present, indium tin oxide (ITO) and tin oxide (TO) films have been widely used as transparent electrodes for display devices, transparent touch-switchs and solar cells. It has been also required to prepare a transparent conducting thin film with a sheet resistance below 1 / . It is generally known that the visible transmittance is reduced with decreasing the resistivity for transparent conducting thin films with the resistivity of the order of 10^<-4> cm. However, the theoretical relationship between electrical properties and optical properties of transparent conducting thin films are still poorly understood.
The purpose of this reseach project is to investigate the detail of the electrical and optical properties of various transparent conducting thin films, and to realize films with a low-sheet resistance below 1 / . Furthermore, the problem in the pratical use of transparent conducting thin films is also solved. In order to realize ITO, TO and impurity-doped ZnO films with the lowest resistivity, we prepared these films using rf magnetron sputtering in plasma foucsing magnetic field. Detailed measurements of electrical and optical properties were carried out for these films under various conditions, and then the theoretical relationship between these properties was discussed. As the method to obtain the sheet resistance below 1 / , the transparent conducting thin films with multilayer structures is also discussed.

  • Research Products

    (11 results)

All Other

All Publications (11 results)

  • [Publications] T.Minami;H.Nanto;S.Takata.: Japanese Journal of Applied Physics. 24. L605-L607 (1985)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Minami;H.Sato;H.Nanto;S.Takata.: Japanese Journal of Applied Physics. 24. L781-L784 (1985)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Minami;H.Sato;H.Nanto;S.Takata.: Japanese Journal of Applied Physics. 25. L776-L779 (1986)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Minami;H.Nanto,S.Takata.: Japanese Journal of Applied Physics. 27. L287-L289 (1988)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Nanto;T.Minami;S.Orito;S.Takata.: Journal of Applied Physics. 62. (1988)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Minami,H.Nanto,H.Sato,S.Takata.: Thin Solid Films. (1988)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T.Minami,;H.Nanto;S.Takata.: "Optical Properties of Aluminum Doped Zine Oxide Thin Films Prepared RF Magnetron sputtering" Japanese Journal of Applied Physics. 24. 605-607 (1985)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Minami,;H.Sato,;H.Nanto;S.Takata.: "Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering" Japanese Journal of Applied Physics. 24. 781-784 (1985)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Minami,;H.Sato,;H.Nanto;S.Takata.: "Highly conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering" Japanese Journal of Applied Physics. 25. 776-779 (1986)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Minami,;H.Nanto;S.Takata.: "Highly Conducting and Transparent SnO_2 Thin Films Prepared by RF Magnetron Sputtering" Japanese Journal of Applied Physics. 27. 287-289 (1988)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Nanto,;T.Minami,;S.Orito;S.Takata.: "Electrical and optical properties of indium thin oxide thin films prepared on low-temperature substrates by rf magnetron sputtering under an applied external magnetic field" Journal of Applied Physics. 62. 2711-2716 (1988)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1990-03-20  

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