Contribution of electrons, Ar(<sup>3</sup>P<sub>0,2</sub>), H<sub>2</sub>O<sup>+</sup>, and H<sub>3</sub>O<sup>+</sup>to production of OH(A<sup>2</sup>Σ<sup>+</sup>) in a micro-dielectric barrier discharge of Ar/H<sub>2</sub>O
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 54 (1S), 01AC03-, 2014-11-14
IOP Publishing
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Details
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- CRID
- 1360566399843170176
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- NII Article ID
- 210000144737
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- ISSN
- 13474065
- 00214922
- http://id.crossref.org/issn/13474065
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- Data Source
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- Crossref
- CiNii Articles
- KAKEN