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MOCVD/ゾルーゲル新規プロセス開発によるFeRAM用のPZT薄膜の合成とその特性

Research Project

Project/Area Number 00F00082
Research Category

Grant-in-Aid for JSPS Fellows

Allocation TypeSingle-year Grants
Section外国
Research Field Inorganic materials/Physical properties
Research InstitutionTokyo Institute of Technology
Host Researcher 水谷 惟恭  
Foreign Research Fellow BAO D.  
Project Period (FY) 2000 – 2001
Project Status Completed (Fiscal Year 2001)
Budget Amount *help
¥2,000,000 (Direct Cost: ¥2,000,000)
Fiscal Year 2001: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 2000: ¥1,000,000 (Direct Cost: ¥1,000,000)

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Published: 2000-03-31   Modified: 2016-04-21  

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