高周波スパッタリングとイオン注入の同時照射による多層膜の作成

• Project/Area Number: 01750062
• Research Category: Grant-in-Aid for Encouragement of Young Scientists (A)
• Allocation Type: Single-year Grants
• Research Field: 機械材料工学
• Research Institution: Mie University
• Principal Investigator: 鈴木 泰之 三重大学, 工学部, 助教授
• Project Period (FY): 1989
• Project Status: Completed (Fiscal Year 1989)
• Budget Amount: ¥800,000 (Direct Cost: ¥800,000); Fiscal Year 1989: ¥800,000 (Direct Cost: ¥800,000)