低温凝縮層制御によるストイキオメトリック窒化ホウ素膜の形成

• Project/Area Number: 01750267
• Research Category: Grant-in-Aid for Encouragement of Young Scientists (A)
• Allocation Type: Single-year Grants
• Research Field: 電子材料工学
• Research Institution: Hiroshima University
• Principal Investigator: 宮崎 誠一 広島大学, 工学部, 助手
• Project Period (FY): 1989
• Project Status: Completed (Fiscal Year 1989)
• Budget Amount: ¥900,000 (Direct Cost: ¥900,000); Fiscal Year 1989: ¥900,000 (Direct Cost: ¥900,000)