化学気相堆積法によって作製したヘテロ接合界面のin-situXPSによる評価

• Project/Area Number: 01790420
• Research Category: Grant-in-Aid for Encouragement of Young Scientists (A)
• Allocation Type: Single-year Grants
• Research Field: 無機工業化学
• Research Institution: Tokyo Institute of Technology
• Principal Investigator: 川崎 雅司 東京工業大学, 特別研究員PD
• Project Period (FY): 1989
• Project Status: Completed (Fiscal Year 1989)
• Budget Amount: ¥700,000 (Direct Cost: ¥700,000); Fiscal Year 1989: ¥700,000 (Direct Cost: ¥700,000)