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Development of positive tone resist polymers possible to make a sub-half-micron pattern

Research Project

Project/Area Number 02555181
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 高分子物性・高分子材料(含機械材料)
Research InstitutionTohoku University

Principal Investigator

MATSUDA Minoru  Institute for Chemical Reaction Science Tohoku University, Professor, 反応化学研究所, 教授 (90006297)

Co-Investigator(Kenkyū-buntansha) ITO Seiki  ibid., Member of Research Staff, 横浜研究所, 研究員
ONO Hiroshi  ibid., Team Reader of R & D Group, 横浜研究所, 主席研究員
HIGASHI Hiromi  Chisso Corp., Group Reader, 横浜研究所, グループリーダー
WATANABE Akira  Institute for Chemical Reaction Science Tohoku University, Research Associate, 反応化学研究所, 助手 (40182901)
Project Period (FY) 1990 – 1992
Project Status Completed (Fiscal Year 1991)
Budget Amount *help
¥8,200,000 (Direct Cost: ¥8,200,000)
Fiscal Year 1991: ¥1,200,000 (Direct Cost: ¥1,200,000)
Fiscal Year 1990: ¥7,000,000 (Direct Cost: ¥7,000,000)
KeywordsResist Polymers / Polysulfones / EB Resists / Photo Resists / O_2 RIE / Si-containing Polymers / ケイ素ポリマ- / 耐ドライエッチング
Research Abstract

Soluble 1 : 1 alternating copolymers of p-trimethylsilylstyrene (1) and p-pentamethyldisilylstyrene (2) with sulfur dioxide have been synthesized by free-radical copolymerization at T < -50゚C. Both coplymes had very high molecular weights and exhibited good film-forming properties. Their thermal stability in nitrogen (5 % wt loss) was ca. 210-230゚C. The etch rate under O_2 RIE conditions (15 mTorr O_2, -400 V) was 3.4 and 2.5 nm/min, and their electron beam sensitivity was 3 and 6mu C/cm^2 at 20 and 50 kV, respectively, using a 40/60 v/v toluene/2-propanol solution as the developer. 200-nm-pitch gratings for advanced optoelectronic devices were fabricated n various planarizing materials and InP using poly (1 sulfone)(P1S) sa a top imaging layer.
Photodegradation and electron-beam-induced degradation of poly[(pentamethyldisilyl) styrene sulfone]s were investigated by flash and pulse radiolysis techniques. The transient absorption spectra obtained by the flash photolysis for the solution … More of nonalternationg poly[(pentamethyldisilyl) styrene sulfone]s in THF (tetrahydrofuran) showed the formation of benzyl radical as a transient intermediate. On the other hand, the transient absorption spectra for an alternating poly[(pentamethyldisilyl) styrene sulfone] did not show the absorption of benzyl radical but showed that of p-(pentamethyldisilyl) styrenemonomer. The decay curve for an alternating poly[(pentamethyldisilyl) styrene sulfone] exhibited fast depropagation after the under electron-beam irradiation. The transient absorption spectra of a radical anion of the sulfonyl group was observed by pulse radiolysis for the solution of poly[(pentamethyldisilyl) styrene sulfone]s in THF.
Poly (P-tert-butylstyrene), poly (p-tert-butylstyrene sulfone), poly (p-trimethylsilylstyrene), and poly (p-trimethylsilylstyrene sulfone) films were ablated with a 248nm excimer laser. Emission Spectra of decomposed species such as Si atom and C_2 as well as CN molecules were observed, while no information of S atom was obtained. The effects of contained Si and S atoms upon laser ablation were examined, and the ablation mechanism was discussed. Less

Report

(3 results)
  • 1991 Annual Research Report   Final Research Report Summary
  • 1990 Annual Research Report
  • Research Products

    (13 results)

All Other

All Publications (13 results)

  • [Publications] A.S.Gozdz,小野 浩,伊藤 清樹,J.A.Shelburne III,松田 実: "Evaluation of Poly(p-trimethylsilylstyrene and p-pentamethylsilylstyrene Sulfone)s as High-Resolution Electron-Beam Resists" Proceedings of Advances in Resist Technology and Proceedings. VIII. 200-205 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 渡辺 明,榊原 太郎,伊藤 清樹,小野 浩,吉田 陽一,田川 精一,松田 実: "Photo-Degradation and Electron Beam-Induced Degradation of Poly(Pentamethyldisilylstyrene Sulfone)s" Journal of Photopolymer Science and Technology. 4. 165-168 (1991)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 渡辺 明,榊原 太郎,伊藤 清樹,小野 浩,吉田 陽一,田川 精一,松田 実: "Photodegradation and Electron-Beam-Induced Degradation of Poly [(Pentamethyldisilyl)styrene sulfone)]s" Macromolecules. 25. 692-697 (1992)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] 福村 裕司,浜野 浩司,増原 宏,伊藤 広宣,榊原 太郎,松田 実: "Laser Ablation Dynamics of Siliconーand/or SulfurーContaining Polymers Revealed by TimeーResolved Luminescence Spectroscopy" Physical Chemistry Letters.

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] S. Gozdz, H. Ono, S. Ito, A. Shelburne III, and M. Matsuda: "Evaluation of Poly (p-trimethylsilylstyrene and p-pentamethyldisilyl-styrene)s as High-resolution Electron-Beam Resists" Proceedings of Advances in Resist Technology and Proceedings. VIII. 200-205 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] A. Watanabe, T. Sakakibara, S. Ito, H. Ono, Y. Yoshida, S. Tagawa, and M. Matsuda: "Photo-degradation and electron Beam-induced Degradation of Poly (pentamethyldisilylstyrene sulfone)s" Journal of Photopolymer Science and Technology. 4. 165-168 (1991)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] A. Watanabe, T. Sakakibara, S. Ito, H. Ono, Y. Yoshida, S. Tagawa, and M. Matsuda: "Photo-degradation and electron Beam-induced Degradation of Poly[ (pentamethyldisilyl) styrene]s" Macromolecules. 25. 692-697 (1992)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] H. Fukumura, K. Hamano, S. H. Masuhara, H. Ito, T. Sakakibara and M. Matsuda: "Laser Ablation Dynamics of Silicon-and/or Sulfur-containing Polymers revealed by Time-resolved Luminescence Spectroscopy" Chemical Physics Letters.

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1991 Final Research Report Summary
  • [Publications] A.S.Gozdz,小野 浩,伊藤 清樹,J.A.Shelburne III,松田 実: "Evaluation of Poly(p-trimethylsilylstyrene and p-pentamethylsilylstyrene Sulfone)s as High-Resolution Electron-Beam Resists" Proceedings of Advances in Resist Technology and Proceedings. VIII. 200-205 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] 渡辺 明,榊原 太郎,伊藤 清樹,小野 浩,吉田 陽一,田川 精一,松田 実: "Photo-Degradation and Electron Beam-Induced Degradation of Poly(Pentamethyldisilylstyrene Sulfone)s" Journal of Photopolymer Science and Technology. 4. 165-168 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] 渡辺 明,榊原 太郎,伊藤 清樹,小野 浩,吉田 陽一,田川 精一,松田 実: "Photodegradation and Electron-Beam-Induced Degradation of Poly[(pentamethyldisilyl)styrene sulfone)]s" Macromolecules. 25. 692-697 (1992)

    • Related Report
      1991 Annual Research Report
  • [Publications] 福村 裕司,浜野 浩司,増原 宏, 伊藤 広宣,榊原 太郎,松田 実: "Laser Ablation Dynamics of Silicon-and/or Sulfur-Containing Polymers Revealed by Time-Resolved Luminescence Spectroscopy" Physical Chemistry Letters.

    • Related Report
      1991 Annual Research Report
  • [Publications] A.S.Gozdz,H.Ono,S.Ito,J.A.Shelburne III,and M.Matsuda: "Evaluation of Poly(ρーtrimethylsilylstyrene and ρーpentamethyldisilylstrene sulfone)s as High Resoluttion Electron Beam Resists" SPlE's 1991 Symposium on Microlithography. 165 (1991)

    • Related Report
      1990 Annual Research Report

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Published: 1990-04-01   Modified: 2016-04-21  

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