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Development of toroidal plasma sputtering apparatus for depositing films with excellent properties

Research Project

Project/Area Number03555058
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 電子材料工学
Research InstitutionToyama university

Principal Investigator

TAKAHASHI Takakazu  Toyama university, Faculty of Engineering, Research Associate, 工学部, 助手 (80019223)

Co-Investigator(Kenkyū-buntansha) HIRATA Toyoaki  Osaka Vacuum Company, Manager, 開発本部, 開発課長代理
IKEDA Nagayasu  Toyama university, Faculty of Engineering Professor, 工学部, 教授 (10222895)
Project Period (FY) 1991 – 1992
Project Status Completed(Fiscal Year 1992)
Budget Amount *help
¥11,900,000 (Direct Cost : ¥11,900,000)
Fiscal Year 1992 : ¥3,000,000 (Direct Cost : ¥3,000,000)
Fiscal Year 1991 : ¥8,900,000 (Direct Cost : ¥8,900,000)
KeywordsToroidal plasma / Plasma-free / Sputtering apparatus / Thin films / Semiconductor electrode materials / Denseness and homogeneity / Electromigration / Stressmigration / プラズマフリ- / エレクトロマイグレ-ション / ストレスマイグレ-ション
Research Abstract

A New type of sputtering method which can form a stable toroidal plasma has been developed in order to prepare Al films with homogeneous and dense structure and excellent properties on the plasma-free substrates.
A toroidal plasma (TP) sputtering apparatus with a pair of targets has been developed in order to deposit the multilayers. The magnetic field was induced by the NdFeB permanent magnet.
At first, dc discharge and sputtering characteristics were investigated by using a planar ring target of Al with a purity of 99.999%. Ar gas was used as a sputtering gas. In the case of the permanent magnet attached behind the target, the applied voltage was lower to 300V at Ar gas pressure of 0.5mTorr.
The structure and the properties of Al films have been investigated. In the films with the thickness below 0.5 mum, the film surface was extremely smooth and its reflectivity was reached to 90%. The as-deposited films were composed of fcc phase crystallites with Al (111), Al (200) and Al (200) planes normal to the film plane.
The resistivity of the as-deposited films decreased from 5 to 2.5 muOMEGA.cm with increasing the film thickness from 0.07 to 1 mum. On the other hand, that increased from 2.5 to 5 muOMEGA.cm with increasing the Ar gas pressure from 0.5 to 10mTorr.
Accordingly, this method may be useful for depositing the aluminum with a smmoth Accordingly, this method may be useful for depositing the aluminum with a smooth and flat surface and homogeneous and dense structure.

Report

(3results)
  • 1992 Annual Research Report   Final Research Report Summary
  • 1991 Annual Research Report

Research Products

(15results)

All Other

All Publications

  • [Publications] Takakazu TAKAHASHI: "Dependence of Ar flow rate on structure and properties of Ni-Fe films sputtered under suppress of high energy electrons" Ferrites:The Proceedings of the 6th International Conference on Ferrites,. 1. (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] Takakazu TAKAHASHI: "Preparation of amorphous Co-Zr films by improved magnetron Sputtering with effective plasma confinement" Ferrites:The Proceedings of the 6th International Conference on Ferrites,. 1. (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] Takakazu TAKAHASHI: "A study of toroidal plasma sputtering method for mass production of Co-Cr films1" Ferrites:The Proceedings of the 6th International Conference on Ferrites,. 1. (1993)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Preparation of Amorphous Co-Zr Films by Improved Magnetron Sputtering with Effective Plasma Confinement" Ferrites: Proceedings of the Sixth International Conference on Ferrites. (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Dependence of Ar Flow Rate on Structure and Properties of Ni-Fe Films Sputtered under Suppress of High Energy Electrons" Ferrites: Proceedings of the Sixth International Conference on Ferrites. (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "A Study of Toroidal Plasma Sputtering Method for Mass Production of Co-Cr Films" Ferrites: Proceedings of the Sixth International Conference on Ferrites. (1993)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1992 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Preparation of amorphous Co-Zr films by improved magnetron Sputtering with effective plasma confinement" Ferrites:The Proceedings of the 6th International Conference on Ferrites,. 1. (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] Takakazu Takahashi: "Dependence of Ar flow rate on structure and properties of Ni-Fe films sputtered under suppress of high energy electrons" Ferrites:The Proceedings of the 6th International Conference on Ferrites,. 1. (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] Takakazu Takahashi: "A study of toroidal plasma sputtering method for mass production of Co-Cr films" Ferrites:The Proceedings of the 6th International Conference on Ferrites,. 1. (1993)

    • Related Report
      1992 Annual Research Report
  • [Publications] Takakazu TAKAHASHI: "Annealing Dependence of Coercivity.Anisotropy Field and Resistivity for Amorphous CoZrNb Films Deposited by DC Planar Magnetron Sputtering" Journal of Applied Physics. 69. 5011-5013 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] Takashi KAWANABE: "Preparation of Amorphous Carbon Films as Protective Layer by FTS System" Materials Science and Engineering. A134. 1296-1300 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] Takakazu TAKAHASHI: "Magnetic and Crystallographic Characteristics of Co-Cr Layers with Al Ultra-thin Interlayers" Journal of The Magnetics Society of Japan. 15,Suppl.,No.S2. 653-656 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] Takakazu TAKAHASHI: "Effectiveness of Magnetic Field Perpendicular to Co-Cr Target in TP Type Sputtering" Journal of The Magnetics Society of Japan. 15,Suppl.,No.S2. 921-925 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] Takakazu TAKAHASHI: "Dependence of Saturation Magnetization and Coercivity of Co-Cr/A1 Multilayered Films on Co-Cr Layer Thickness" Journal of Applied Physics. 70. 6056-6058 (1991)

    • Related Report
      1991 Annual Research Report
  • [Publications] Toyaaki HIRATA: "Kerr Rotation and Perpendicular Magnetic Anisotropy of Co-Cr Films with Al Ultra-thin Interlayers" Journal of Applied Physics. 70. 6392-6394 (1991)

    • Related Report
      1991 Annual Research Report

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Published : 1991-04-01   Modified : 2016-04-21  

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