|Budget Amount *help
¥6,800,000 (Direct Cost : ¥6,800,000)
Fiscal Year 1993 : ¥1,800,000 (Direct Cost : ¥1,800,000)
Fiscal Year 1992 : ¥5,000,000 (Direct Cost : ¥5,000,000)
Aim of this project is to develop soft-x-ray multilayrs of short period thickness of less than 6nm and also to develop novel multilayr optics, with fundamental study of growth process.
We have established the reflectance vs. angle of incidence method and collected optical contants of C, Mo, Ru, Rh, W, Pt, Au, BK7 glass, and fused silica at several photon energies between 60 to 900eV.Correlation between reflectance and special frequency spectrum of surface roughness was olso studied.
In-situ, ellipsometry was found useful for growth phase study including roughness smoothing and compound formation at boundaries.
Multilayrs of Ru/B4C and Mo/B4C of 4.70 to 5.34nm period, fabricated by magnetron sputtering, were found to have 16 to 18% reflectance at 45ﾟ angle of incidence with 167.3 to 186.2eV soft-x-ray.
By soft-x-ray ellipsometry, realized with high performance polarizers of >98% polarizance and phase shifters developped, relative amplitude attenuation Rp/Rs=tanPSIexp(iDELTA) of a thin Mo layr was measured for the first time.