CVD法による酸化リチウム-酸化ホウ素系化合物薄膜の合成

• Project/Area Number: 04750658
• Research Category: Grant-in-Aid for Encouragement of Young Scientists (A)
• Allocation Type: Single-year Grants
• Research Field: 無機工業化学・無機材料工学
• Research Institution: Tohoku University
• Principal Investigator: 山根 久典 東北大学, 金属材料研究所, 助手
• Project Period (FY): 1992
• Project Status: Completed (Fiscal Year 1992)
• Budget Amount: ¥900,000 (Direct Cost: ¥900,000); Fiscal Year 1992: ¥900,000 (Direct Cost: ¥900,000)