Production of large-diameter plasmas for plasma processing
Grant-in-Aid for International Scientific Research.
|Allocation Type||Single-year Grants|
|Research Institution||Tohoku University|
SATO Noriyoshi Dept of Electronic Eng. Tohoku University Professor, 工学部, 教授 (40005252)
CHOI Duk-In Korean Basic Science Institute, 教授
CHANG HongーY 韓国先端科学技術研究所(KAIST), 助教授
李 雲龍 東北大学, 工学部, 助手 (50260419)
ANDO Akira Dept of Electric Eng, Tohoku University, 工学部, 助教授 (90182998)
IIZUKA Satoru Dept of Electronic Eng. Tohoku University, 工学部, 助教授 (20151227)
HATAKEYAMA Rikizo Dept of Electronic Eng. Tohoku University, 工学部, 助教授 (00108474)
INUTAKE Masaaki Dept of Electric Eng. Tohoku University, 工学部, 教授 (90023738)
CHUNG Hong-Young Korean Advanced Institute of Science and Technology
|Project Period (FY)
Completed(Fiscal Year 1995)
|Keywords||Plasma / Uniform Plasma / ECR Plasma / RF Plasma / Magnetron-Typed Plasma / Helicon Wave / Inductively Coupled Plasma / Radical / Plasma processing|
Development of large-diameter uniform plasma sources is of crucial importance for performing a wide-area plasma processing.
In order to produce such a uniform plasma a plane-slotted antenna with permanent magnets has been developed to produce an electron cyclotron resonance (ECR) plasma at Tohoku University. This method successfully provides a large-diameter ECR plasma with a uniformity of (]SY.+-.])(3-5)% over a diameter of 40-50 cm. Moreover, a modified magnetron typed plasma source developed at Tohoku University also provides large-diameter uniform radio-frequency (RF) plasmas.
On the other hand, high density plasma sources are studied at the Korean Advanced Institute of Science and Technology (Kaist) by using helicon wave heating and inductively coupled plasma production methods at the RF frequency. The diagnostic method employing optical probe has also been developed to evaluate the radical density and its profile in reactive plasmas.
The main purpose of this project is to combine such results obtained at Tohoku University and the KAIST to develop a large-diameter uniform plasma source for the wide-area plasma processing. During the project we had two seminars at the KAIST to discuss about the problems and techniques for detecting the uniformity of radical density supplied from the plane ECR antenna plasma source at Tohoku University. The experiments show the importance of radial profile of plasma parameters.
Research Output (24results)