• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Studies of Electron Behavior in Magnetic Neutral-Loop Discharge (NLD) Plasmas for Processing Applications

Research Project

Project/Area Number 08558045
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section展開研究
Research Field プラズマ理工学
Research InstitutionKYUSHU UNIVERSITY

Principal Investigator

MURAOKA Katsunori  Interdisciplinary Graduate School of Engineering Science, Kyushu University, Professor, 大学院・総合理工学研究科, 教授 (80038546)

Co-Investigator(Kenkyū-buntansha) ITOH Masahiro  ULVAC Japan, Ltd., Manager, 技術開発部, 室長(研究職)
HAYASHI Toshio  ULVAC Japan, Ltd., Director, 技術開発部, 部長(研究職)
UCHIDA Taijiro  ULVAC Japan, Ltd., Vice-President, 副社長(研究職)
BOWDEN Mark  Interdisciplinary Graduate School of Engineering Science, Kyushu University, Ass, 大学院・総合理工学研究科, 助教授 (10260720)
UCHINO Kiichiro  Interdisciplinary Graduate School of Engineering Science, Kyushu University, Pro, 大学院・総合理工学研究科, 教授 (10160285)
Project Period (FY) 1996 – 1998
Project Status Completed (Fiscal Year 1998)
Budget Amount *help
¥13,300,000 (Direct Cost: ¥13,300,000)
Fiscal Year 1998: ¥1,700,000 (Direct Cost: ¥1,700,000)
Fiscal Year 1997: ¥2,100,000 (Direct Cost: ¥2,100,000)
Fiscal Year 1996: ¥9,500,000 (Direct Cost: ¥9,500,000)
Keywordsmagnetic neutral-loop discharge / processing plasma / chaos / electron behavior / laser aided diagnostics / etching / capacitive coupling / sputtering / 電子密度・温度 / レーザートムソン散乱法 / レーザー誘起蛍光法 / 誘導結合方式 / 磁気中性線 / 電子温度 / 電子密度 / 電子速度分布関数 / 換算電界 / プロセスプラズマ / RF放電 / 磁場強度 / 磁場こう配
Research Abstract

In this project, the formation mechanism of a magnetic neutral-loop discharge (NLD) plasma was studied theoretically and experimentally. Also, application possibilities of the NLD plasma were studied.
Electron behavior in the NLD plasma was theoretically modeled using a two-dimensional electromagnetic field configuration. The model predicted that the electron motion around the neutral loop (NL) became chaotic, and electrons could be effectively heated by the rf electric field in the collisionless low pressure regime. Then, the electron behavior was examined experimentally. The experimental results showed that the energy deposition to electrons in the vicinity of the NL played an essential role in the formation of the NLD plasma. This result was consistent with the prediction of the two-dimensional model. However, the dependence of the plasma production efficiency on the gradient of the magnetic field strength showed disagreement between the experiment and the model. The model predicted … More that plasma production became more efficient for a smaller magnetic field gradient. On the other hand, the experimental results showed the existence of an optimum value of the magnetic field gradient. In order to improve the situation, a new model which included effects of the three-dimensional electromagnetic field configuration, a spatially varied rf electric field and electron collisions with neutral particles was proposed. The model gave optimum values of the magnetic field strength for given discharge conditions, and those predictions were found to be consistent with experimental results. In conclusion, the model gives a guideline for the design of NLD plasma devices.
NLD plasmas were successfully applied to a high-rate etch process with satisfactory uniformity. In the application to the SiO_2 etch process, an etch rate of about 1 mum/min was obtained. When the hole pattern was etched, the etched profile was almost vertical. These results were found to be superior to the etching results using an inductively coupled plasma. In order to open sputtering applications, an NLD plasma based on capacitive coupling was proposed and a prototype device was designed. Less

Report

(4 results)
  • 1998 Annual Research Report   Final Research Report Summary
  • 1997 Annual Research Report
  • 1996 Annual Research Report
  • Research Products

    (24 results)

All Other

All Publications (24 results)

  • [Publications] T.Sakoda, H.Iwamiya, K.Uchino, K.Muraoka, M.Itoh, T.Uchida: "Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma" Japanese Journal of Applied Physics. 36・1A/B. 67-69 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Sakoda, T.Miyao, K.Uchino and K.Muraoka: "Studies of a Magnetic Neutral Loop Discharge Based on Laser Diagnostics of Electron Behavior and Atomic Processes" Japanese Journal of Applied Physics. 36・11. 6981-6985 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Tsuboi, T.Hayashi and T.Uchida: "Observation of Induction Power Dependence on the Magnetic Neutral Loop Discharge Plasma Thermalization Phenomena" Japanese Journal of Applied Physics. 36・10. 6540-6544 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] W.Chen, M.Itoh, T.Hayashi and T.Uchida: "Dry Etch Process in Magnetic Neutral Loop Discharge. Plasma" Japanese Journal of Applied Physics. 37・1. 332-336 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Uchida: "Magnetically Neutral Loop Discharged Plasma Sources and System" Journal of Vacuum Science & Technology A. 16・3. 1529-1536 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] W.Chen, M.Itoh, T.Hayashi and T.Uchida: "SiO_n Etching in Magnetic Neutral Loop Dischage Plasma" Journal of Vacuum Science & Technology A. 16・3. 1594-1599 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 陳 巍,林 俊雄,伊藤正博,坪井秀夫,内田岱二郎: "4.磁気中性線放電(NLD)プラズマ" プラズマ核融合学会誌. 74・3. 258-265 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Z.Yoshida, H.Asakura, H.Kakuno, J.Morikawa, K.Takemura, S.Takizawa and T.Uchida: "Anomalous Resistance Induced by Chaos of Electron Motion and its Application to Plasma Production" Physical Review Letters. 81・12. 2458-2461 (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Sakoda, H.Iwamiya, K.Uchino, K.Muraoka, M.Itoh and T.Uchida: "Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma" Japanese Journal of Applied Physics. Vol.36, No.1A/B. 67-69 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Sakoda, T.Miyao, K.Uchino and K.Muraoka: "Studies of a Magnetic Neutral Loop Discharge Based on Laser Diagnostics of Electron Behavior and Atomic Processes" Japanese Journal of Applied Physics. Vol.36, No.11. 6981-6985 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] H.Tsuboi, T.Hayashi and T.Uchida: "Observation of Induction Power Dependence on the Magnetic Neutral Loop Discharge Plasma Thermalization Phenomena" Japanese Journal of Applied Physics. Vol.36, No.10. 6540-6544 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] W.Chen, M.Itoh, T.Hayashi and T.Uchida: "Dry Etch Process in Magnetic Neutral Loop Discharge Plasma" Japanese Journal of Applied Physics. Vol.37, No.1. 332-336 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] T.Uchida: "Magnetically Neutral Loop Discharged Plasma Sources and System" Journal of Vacum Science & Technology A. Vol.16, No.3. 1529-1536 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] W.Chen, M.Itoh, T.Hayashi and T.Uchida: "SiO_2 Etching in Magnetic Neutral Loop Discharge Plasma" Journal of Vacum Science & Technology A. Vol.16, No.3. 1594-1599 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] W.Chen, T.Hayashi, M.Itoh, H.Tsuboi and T.Uchida: "Magnetic Neutral Loop Discharge (NLD) Plasma" Journal of Plasma and Fusion Research. Vol.74, No.3. 258-265 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] Z.Yoshida, H.Asakura, H.Kakuno, J.Morikawa, K.Takemura, S.Takizawa and T.Uchida: "Anomalous Resistance Induced by Chaos of Electron Motion and its Applcation to Plasma Production" Physical Review Letters. Vol.81, No.12. 2458-2461 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1998 Final Research Report Summary
  • [Publications] 陳巍,林俊雄,他: "4.磁気中性線放電(NLD)プラズマ" プラズマ・核融合学会誌. 74・3. 258-265 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] W.Chen,M.Itoh,他: "Dry Etch Process in Magnetic Neutral Loop Discharge Plasma" Japanese Journal of Applied Physics. 37・1. 332-336 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Uchida: "Magnetically Natural Loop Discharge Plasma Sources and System" Jounal of Vacuum Science and Technology A. 16・3. 1529-1536 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] W.Chen,M.Itoh,他: "Sio_2 Etching in Magnetic Neutral Loop Discharge Plasma" Jounal of Vacuum Science and Technology A. 16・3. 1594-1598 (1998)

    • Related Report
      1998 Annual Research Report
  • [Publications] T.Sakoda,H.Iwamiya,K.Uchino,K.Muraoka,M.Itoh and T.Uchida: "Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma" Japanese Journal of Applied Physics. Vol.36 No.1A/B. L67-L69 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Sakoda,T.Miyao,K.Uchino and K.Muraoka: "Studies of a Magnetic Neutral Loop Discharge Based on Laser Diagnostics of Electron Behavior and Atomic Processes" Japanese Journal of Applied Physics. Vol.36 No.11. 6981-6985 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] 迫田達也、川上 真、宮尾貴幸、内野喜一郎、村岡克紀: "磁気中性線放電プラズマの生成条件に関する研究" 九州大学大学院総合理工学研究科報告. 第19巻 第3号. 323-329 (1997)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Sakoda,H.Iwamiya,K.Uchino,K.Muraoka,M.Itoh and T.Ochida: "Electron Temperature and Density Profiles in a Neutral Loop Discharge Plasma" Japanese Journal of Applied Physics. Vol.36 No.1A/B. L67-L69 (1997)

    • Related Report
      1996 Annual Research Report

URL: 

Published: 1996-04-01   Modified: 2021-04-07  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi