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Fabrication of ferromagnetic-semiconductor heteroepitaxial structures using ferromagnetic Ba ferrite films

Research Project

Project/Area Number 08650373
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionJapan Advanced Institute of Science and Technology

Principal Investigator

GOMI Manabu  Japan Advanced Inst.of Sci.and Tech., Dept.of Mater.Sci., Associate Prof., 材料科学研究科, 助教授 (80126276)

Project Period (FY) 1996 – 1997
Project Status Completed (Fiscal Year 1997)
Budget Amount *help
¥2,200,000 (Direct Cost: ¥2,200,000)
Fiscal Year 1997: ¥400,000 (Direct Cost: ¥400,000)
Fiscal Year 1996: ¥1,800,000 (Direct Cost: ¥1,800,000)
KeywordsMagnetic film / Ba ferrite film / Ferromagnetic-semiconductor structure / Epitaxial growth / sulphur-termination / Surface oxidization / Spinel ferrite film / フェライト薄膜 / ヘテロエピタキシャル成長 / 強磁性体半導体接合 / 硫黄終端化 / バリウムフェライト / スピネルフェライト / ガリウムヒ素 / ヘテロエピタキシ- / MOCVD / 半導体 / Baフェライト
Research Abstract

In order to realize ferromagnetic-semiconductor structures with high quality, growth conditions of magnetic oxide layrs on semiconductors were investigated. The results are as follows :
1.It was found for the first time that ferromagnetic Fe_3O_4 (100) thin films are epitaxially grown on GaAs (100) substrates at 200゚C by electron beam evaporation, when the subtrates were sulphur-terminated using an (NH_3) _4S_x solution. The thin films deposited at substrate temperatures above 200゚C were polycrystalline. This is associated with desorption of sulphur and resultant oxidization of the GaAs surface. The Fe_3O_4 (100) epitaxial thin films with higher quaslity were grown at 450゚C on the above thin films, with the in-plane alignment of Fe_3O_4 [100]//GaAs [100]. Atomic force microscopy and X-ray photoelectron spectroscopy showed that the crystalline quality and morphology of the epitaxial thin films primarily depend on the lattice mismatch between the film and the substrate. No epitaxial growth of Fe_3O_4 thin films and alpha-Fe_2O_3 thin films coccurred on hydrogen-terminated Si (100) and (111) havinb a lattice constant similar to that of GaAs. These results indicate the effectiveness of surface-termination using ions stable to oxygen, for preventing the semiconductor surface from oxidizing in the early stage of the deposition.
2. It was found that the (0001) single crystalline thin films of ferromagnetic Ba hexaferrite are epitaxially grown on the buffer layrs of alpha-Fe_2O_3 and alpha-Al_2O_3 (0001) by sputtering.
The above results indicate that the heteroepitaxial structure system of a semiconductor and a ferromagnetic oxide with strong magnetic anisotropy which is a goal of this research may be achieved using Co-substituted Fe_3O_4 instead of Ba hexaferrite as a ferromagnetic layr and GaAs as a semiconductor.

Report

(3 results)
  • 1997 Annual Research Report   Final Research Report Summary
  • 1996 Annual Research Report
  • Research Products

    (12 results)

All Other

All Publications (12 results)

  • [Publications] T.Kiyomura: "Quality of Fe_3O_4 Films Prepared by Plasma Assisted MOCVD" J.de Phys.7. C1-611-C1-612 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi: "Epitaxial Growth of α-Fe_2O_3 and Cr_2O_3 Sputtered Films on Garnet" J.de Phys.7. C1-481-C1-482 (1997)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi: "Epitaxial Growth of Ba Hexaferrite Films on (111) GGG" J.Magn.Soc.Jpn.(1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi: "Low-Pressure MOCVD of Fe_3O_4 Epitaxial Thin Films,and Their Surface Reaction Process" J.Magn.Soc.Jpn.22. (1998)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] T.Kiyomura and M.Gomi: "Quality of Fe_3O_4 Films Prepared by Plasma Assisted MOCVD" J.de Phys.7. C1-611-C1-612 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi, H.Toyoshima and T.Yamada: "Epitaxial Growth of alpha-Fe_2O_3 and Cr_2O_3 Sputtered Films on Garnet" J.de Phys.7. C1-481-C1-482 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi and T.Yamada: "Epitaxial Growth of Ba Hexaferrite Films on (111) GGG" J.Magn.Soc.Jpn.(to be published). (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi and T.Toba: "Low-Pressure MOCVD of Fe_3O_4 Epitaxial Thin Films, and Their Surface Reaction Process" J.Magn.Soc.Jpn.22 (4-2) (to be published). (1998)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      1997 Final Research Report Summary
  • [Publications] M.Gomi: "Low Pressure MOCVD of Fe_3O_4 Epitaxial Thin Films and Surface Reaction Process" J.Magn.Soc.Jpn.22・4-2. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] M.Gomi: "Epitaxial Growth of Ba Hexaferrite Films on(111)GGG" J.Magn.Soc.Jpn.22. (1998)

    • Related Report
      1997 Annual Research Report
  • [Publications] T.Kiyomura: "Quality of Fe 304 films prepared by plasma assisted MOCVD" J.de Physique. (1997)

    • Related Report
      1996 Annual Research Report
  • [Publications] M.Gomi: "Epitaxial growth of α-Fe_2O_3 and Cr_2O_3 sputtered films on garnet" J.de Physique. (1997)

    • Related Report
      1996 Annual Research Report

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Published: 1996-04-01   Modified: 2016-04-21  

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