• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

高真空環境下プラズマ源の開発とプラズマ援用型集束荷電粒子ビーム誘起蒸着法への応用

Research Project

Project/Area Number 08J08114
Research Category

Grant-in-Aid for JSPS Fellows

Allocation TypeSingle-year Grants
Section国内
Research Field Material processing/treatments
Research InstitutionThe University of Tokyo

Principal Investigator

宮副 裕之  The University of Tokyo, 大学院・新領域創成科学研究科, 特別研究員(PD)

Project Period (FY) 2008 – 2009
Project Status Completed (Fiscal Year 2009)
Budget Amount *help
¥1,200,000 (Direct Cost: ¥1,200,000)
Fiscal Year 2009: ¥600,000 (Direct Cost: ¥600,000)
Fiscal Year 2008: ¥600,000 (Direct Cost: ¥600,000)
Keywordsマイクロプラズマ / 集束電子ビーム誘起プロセス / 集束電子ビーム / 誘導結合型プラズマ / 集束電子ビーム誘起蒸着法 / 銅 / 還元 / 原子状水素 / 集束電子ビーム誘起堆積法
Research Abstract

昨年度までに、マイクロプラズマ技術と、電子ビームをもちいた直接描画プロセスのひとつである集束電子ビーム技術を融合し、水素-アルゴンマイクロプラズマをもちいた従来の電子ビームによる堆積物への後処理に加え、本研究で開発したマイクロプラズマ援用型集束電子ビーム誘起蒸着法により直径1.5μm程度のコーン型の銅の堆積に成功した。一方でプラズマによる厚さ200nm程度の広範囲(径数百μm程度)の堆積物が同時に基板上に確認された。今後、プロセスを最適化し、直接描画技術による3次元ナノ構造物質の作製する際には、以上のようなプラズマによる堆積物は堆積されず、電子ビームの照射部分のみに堆積プロセスがおこなわれなければならない。今年度は基板上に到達する原料ガスとプラズマによるガス流のシミュレーションをおこない、プラズマによる堆積物の堆積課程をモデリングにより考察した。その結果、プラズマによる熱の影響は少なく(プラズマ照射部の局所的な基板温度は50℃以下)、基板上に吸着した原料ガスに対する、プラズマ中の原子状水素による水素ラジカルの影響が支配的となることが確認され、堆積速度に関するモデリングの結果は実験結果と非常に良い一致を得た。以上の結果を踏まえて、今後プロセスを最適化するためには水素ラジカルを適用した本法の場合、原料ガスの再選定等が必要となると考えられるが、電子ビーム誘起蒸着法の反応性を向上させた本研究は今後のプロセス制御において有効な手段のひとつとなると考えられる。

Report

(2 results)
  • 2009 Annual Research Report
  • 2008 Annual Research Report
  • Research Products

    (18 results)

All 2010 2009 2008 Other

All Journal Article (5 results) (of which Peer Reviewed: 4 results) Presentation (11 results) Remarks (2 results)

  • [Journal Article] Localized high-rate deposition of zinc oxide films at atmospheric pressure using inductively coupled microplasma2010

    • Author(s)
      S.Stauss, Y Imanishi, H.Miyazoe, K.Terashima
    • Journal Title

      Thin Solid Films (In press(掲載確定))

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] High rate deposition of ZnO thin films by a small-scale inductively coupled argon plasma generated in open air2010

    • Author(s)
      S.Stauss, Y.Imanishi, H.Miyazoe, K.Terashima
    • Journal Title

      Journal of Physics D : Applied Physics (In press(掲載確定))

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Development of a dielectric-barrier discharge enhanced microplasma jet2009

    • Author(s)
      S.Kiriu, H.Miyazoe, F.Takamine, M.Sai, J.H.Choi, T.Tomai, K.Terashima
    • Journal Title

      Applied Physics Letters 94

      Pages: 1915021-3

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Ultrahigh-frequency microplasma jet as a low-power, high-density, and localized ions/radicals source2009

    • Author(s)
      H. Miyazoe, M. Sai, S. Stauss, K. Terashima
    • Journal Title

      J. Vac. Sci. Technol. A 27

      Pages: 9-12

    • Related Report
      2008 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Development of microplasma assisted focused electron beam-induced deposition2009

    • Author(s)
      H. Miyazoe, H. Kikuchi, S. Kiriu, I. Utke, J. Michler, K. Terashima
    • Journal Title

      Proceedings of Plasma Science Symposium 2009/The 26th Symposium on Plasma Processing

      Pages: 508-509

    • Related Report
      2008 Annual Research Report
  • [Presentation] Generation of large area dielectric barrier discharges in supercritical fluids and their application for the synthesis of sp^3 nanocarbon materials2010

    • Author(s)
      S.Stauss, H.Miyazoe, H.Kikuchi, T.Shizuno, K.Saito, K.Terashima
    • Organizer
      International Workshop on Plasmas with Liquids
    • Place of Presentation
      Ehime, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Nano-interface plasmas generated in supercritical fluids and their application to nanomaterials processing2010

    • Author(s)
      K.Terashima, S.Stauss, H.Miyazoe, H.Kikuchi, T.Shizuno, K., Saito
    • Organizer
      International Conference on Plasma-Nano Technology & Science
    • Place of Presentation
      Nagoya, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Large area dielectric barrier discharges generated in supercritical xenon and their application to sp^3 hybridized nanocarbon materials synthesis2010

    • Author(s)
      S.Stauss, H.Miyazoe, Hirokazu Kikuchi, Tomoki Shizuno, Koya Saito, K.Terashima
    • Organizer
      Symposium of the Japan Society of Applied Physics
    • Place of Presentation
      Hiratsuka, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] High-rate localized deposition of ZnO films by an inductively coupled argon microplasma in open air2010

    • Author(s)
      S.Stauss, Y.Imanishi, H.Miyazoe, K.Terashima
    • Organizer
      The 27^<th> Symposium on Plasma Processing
    • Place of Presentation
      Yokohama, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Time-resolved characterization of dielectric barrier discharge enhanced microplasma jet2009

    • Author(s)
      S.Kiriu, H.Miyazoe, J.H.Choi, T.Tomai, K.Terashima
    • Organizer
      The 22^<nd> Symposium on Plasma Science for Materials
    • Place of Presentation
      Tokyo, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Direct fabrication of copper containing materials by microplasma-assisted focused electron beam-induced deposition2009

    • Author(s)
      H.Miyazoe, H.Kikuchi, S.Kiriu, I.Utke, J.Michler, K.Terashima
    • Organizer
      The 22^<nd> Symposium on Plasma Science for Materials
    • Place of Presentation
      Tokyo, Japan
    • Related Report
      2009 Annual Research Report
  • [Presentation] Microplasma assisted focused electron beam nano patterning2009

    • Author(s)
      H. Miyazoe, H. Kikuchi, S. Kiriu, I. Utke, J. Michler, K. Terashima
    • Organizer
      Fundamentals and Applications of Microplasmas
    • Place of Presentation
      San Diego, USA
    • Related Report
      2008 Annual Research Report
  • [Presentation] Development of microplasma assisted focused electron beam-induced deposition2009

    • Author(s)
      H. Miyazoe, H. Kikuchi, S. Kiriu, I. Utke, J. Michler, K. Terashima
    • Organizer
      Proceedings of Plasma Science Symposium 2009/The 26^<th> Symposium on Plasma Processing
    • Place of Presentation
      Nagoya, Japan
    • Related Report
      2008 Annual Research Report
  • [Presentation] Development of microplasma assisted focused electron beam-induced deposition2008

    • Author(s)
      S. Kiriu, H. Miyazoe, I. Utke, K. Terashima
    • Organizer
      2^<nd> Japanese-German Student Workshop on Plasma Science and Technology
    • Place of Presentation
      Bochum, Germany
    • Year and Date
      2008-10-11
    • Related Report
      2008 Annual Research Report
  • [Presentation] Fabrication of sub-beam size nanoholes by controlled focused electron beam-induced etching2008

    • Author(s)
      H. Miyazoe, I. Utke, J. Michler, K. Terashima
    • Organizer
      2^<nd> Focused Electron Beam-Induced Processing Workshop
    • Place of Presentation
      Thun, Switzerland
    • Related Report
      2008 Annual Research Report
  • [Presentation] Hydrogen microplasma treatment of focused electron-beam induced deposits2008

    • Author(s)
      H. Miyazoe, S. Kiriu, S. Stauss, I. Utke, J. Michler, K. Terashima
    • Organizer
      2^<nd> Focused Electron Beam-Induced Processing Workshop
    • Place of Presentation
      Thun, Switzerland
    • Related Report
      2008 Annual Research Report
  • [Remarks]

    • URL

      http://plasma.k.u-tokyo.ac.jp/

    • Related Report
      2009 Annual Research Report
  • [Remarks]

    • URL

      http://plasma.k.u-tokyo.ac.jp/

    • Related Report
      2008 Annual Research Report

URL: 

Published: 2008-04-01   Modified: 2024-03-26  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi