| Project/Area Number |
10650865
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
高分子合成
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| Research Institution | Nagoya Institute of Technology |
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Principal Investigator |
YUKI Yasuo Nagoya Institute of Technology, Faculty of Engineering, Professor, 工学部, 教授 (20024292)
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| Project Period (FY) |
1998 – 2000
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| Project Status |
Completed (Fiscal Year 2000)
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| Budget Amount *help |
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2000: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 1999: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1998: ¥2,100,000 (Direct Cost: ¥2,100,000)
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| Keywords | Organic Selenium Compound / Living Radical Polymerization / Block Copolymer / End Functional Polymer / Macromonomer / Graft Copolymer / Hyperbranched Polymer / Photoiniferter / トリブロック共重合体 / p-(フェニルセレノメチル)スチレン / ジフェニルジセレニド / ベンジルフェニルセレニド / 片末端官能性高分子 / クラフト共重合体 / ジフェニルジテルリド / 二官能性イニファタ / 高分子光イニファタ / 両末端フェニルセレノ基 / テレケリック高分子 / ジおよびトリブロック共重合体 |
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| Research Abstract |
Organic selenium compounds are very useful in organic chemistry. We found that the organic selenium compounds (benzyl phenyl senide or diphenyl diselenide) works as a photoiniferter in radical polymerization of styrene and methyl methacrylate.
The carbon-selenium bond of benzyl phenyl selenide undergoes homolytic cleavage on photoirradiation to afford phenylseleno and benzyl radicals, and styrene monomer insert to these radicals to afford polymer with higher molecular weight. The resulting polystyrene having phenylseleno group at theω-end works also as a polymeric photoiniferter, and can apply to the synthesis of block copolymer. Further, the phenylseleno group at theω-end is eliminated by hydrogen peroxide to give carbon-carbon double bond and, followed the resulting polystyrene is converted to epoxy terminated polystyrene, and then macromonomer.
1, 4-Bis (p-tert-butylphenylselenomethyl) benzene was used as a bifunctional photoiniferter for the polymerization of styrene and methyl methacrylate. Photoirradiation of telechelic polystyrene having phenylseleno groups at both ends as polymeric photoiniferter in the presence of methyl methacrylarte afforded effectively corresponding to the ABA type triblock copolymers.
p-Phenylselenomethylstyrene was synthesized as a novel-selenium-containing vinyl monomer and polymerized with azobisisobutyronitrile to afford corresponding homopolymer. Photoirradiation of the copolymer of this monomer and styrene as a polymeric photoiniferter in the presence of methyl methacrylarte effectively afforded a graft copolymer. On the other hand, the homopolymerization of this monomer under UV irradiation gave a hyperbranched polystyrene.
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