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Basic Research on Silicon Quantum Computation Based on Isotope Control and Neutron Irradiation

Research Project

Project/Area Number 13305025
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field 電子デバイス・機器工学
Research InstitutionKeio University

Principal Investigator

MATSUMOTO Satoru  Keio University, Faculty of Science and Technology, Professor, 理工学部, 教授 (00101999)

Co-Investigator(Kenkyū-buntansha) ETO Mikio  Keio University, Faculty of Science and Technology, Assistant Professor, 理工学部, 助教授 (00221812)
KURODA Tadahiro  Keio University, Faculty of Science and Technology, Professor, 理工学部, 教授 (50327681)
KUWANO Hiroshi  Keio University, Faculty of Science and Technology, Professor, 理工学部, 教授 (10051525)
Project Period (FY) 2001 – 2003
Project Status Completed (Fiscal Year 2003)
Budget Amount *help
¥53,690,000 (Direct Cost: ¥41,300,000、Indirect Cost: ¥12,390,000)
Fiscal Year 2003: ¥11,310,000 (Direct Cost: ¥8,700,000、Indirect Cost: ¥2,610,000)
Fiscal Year 2002: ¥17,680,000 (Direct Cost: ¥13,600,000、Indirect Cost: ¥4,080,000)
Fiscal Year 2001: ¥24,700,000 (Direct Cost: ¥19,000,000、Indirect Cost: ¥5,700,000)
Keywordsquntum computating / silicon / spin-free silicon / isotope control / ^<31>P nuclear spin / nuclear magnetic resonance / atomic layer doping / quantum dynamics
Research Abstract

In Si-based quantum computer, ^<31>P should be distributed in an array at a distance of about 20 nm in spin-free silicon (spin zero ^<28>Si or ^<30>Si) as a qubit. In the present work, in order to fabricate its basic device structure, we aim to perform the experiments on the epitaxial growth of isotopically controlled silicon layers and the transformation of ^<30>Si to ^<31>P by neutron irradiation. This method for distributing ^<31>P in Si is superior to the ion-implantation technique, which is inherently random to the depth. For this purpose, first, epitaxial growth technique of almost 100% ^<30>Si was developed by the gas source MBE method using enriched ^<30>SiH_4, which was purchased from Kurchatov laboratory, Russia. Thus this spin-free Si epitaxial layer can be available to the base for Si-based quantum computer. Using this technique, we succeeded to fabricate the natural Si/^<30>Si/natural Si (^<28>Si:^<29>Si:^<30>Si=92.2:4.7:3.1) isotope double hetero-structures by supplying alternately normal SiH_4 and enriched ^<30>SiH_4. Then, neutron irradiation was carried out to transform ^<30>Si to ^<31>P at Japan Atomic Energy Research Institute with thermal neutron flux of 1×10^<14> cm^<-2> s^<-1> for 16 h. By the precise secondary ion mass spectroscopy (CAMECA-SIMS) measurement, the formation of ^<31>P from ^<30>Si was confirmed. Its concentration was to be about 5×10^<16> cm^<-3>w, which was almost equal to the theoretically predicted value. If the neutron irradiation is performed to the ^<29>Si/^<30>Si/^<29>Si double hetero-structures, nuclear spin ^<31>P will be distributed in a spin-free silicon (^<31>Si ), which will be used as a basic structure of Si-based quantum computer.

Report

(4 results)
  • 2003 Annual Research Report   Final Research Report Summary
  • 2002 Annual Research Report
  • 2001 Annual Research Report
  • Research Products

    (53 results)

All Other

All Publications (53 results)

  • [Publications] Y.Nakabayashi: "Self-diffusion in Extrinsic Silicon Using Isotopically Enriched ^<30>Si"Jpn.J.Appl.Phys. 40. L181-L182 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Yanagawa: "Initial Growth of titanium germanosilicide on Ge/Si(111)"Appl.Surf.Sci.. 175-176. 90-95 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] H.Mori: "Formation of Ge quantum dots on boron-reconstructed surface /Si(111)"Materials Science and Engineering. B89. 188-190 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] H.I.Osman: "Effect of Vacancy double acceptor level on Si self diffusion under heavy doping condition"Electrochemical Society Proc. 2002-2. 248-253 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Nishimura: "Variation of silicon melt velocity with boron addition"Journal of Crystal growth. 237-239. 1667-1670 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi: "Fractional Contribution in Si Self-Diffusion : Dopant Concentration and temperature Dependence."Electrochemical Society Proc.. 2002-2. 241-247 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] N.Fujiwara: "Effect Nitrogen segregation on TED and loss of phosphorus in CZ-Si"Nuclear Instruments and Methods in Physics Research. B186. 313-317 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi: "Type and charge states of point defects in heavily As-and B-doped silicon"Material Science in Semiconductor Processing. 6. 15-19 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi: "Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure ^<30>Si/Natural Silicon Heterostructures"Jpn.J.Appl.Phys.. 42. 3304-3310 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Eto: "Multiparameter scaling of the kondo effect in quantum dots with an even number of electrons"Phys.Rev.. B66. 153319 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Hada: "Electronic states in silicon quantum dots multi vally artifical atoms"Phys.Rev.. B68. 155322 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Eto: "Current-Induced Entanglement of Nuclear Spins in Quantum Dots"J.Phys.Soc.Jpn. 73. 307-310 (2004)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] J.Seto: "Lateral Solid Phase Recrystallization from the Crystal Seed in Ge-Ion-Implanted Amorphous Silicon"Jpn.J.Appl.Phys.. 40. 2150-2154 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Jeong: "Effects of various Hydrogenation Processes on Bias-stress-Induced Degradation in in P-channel Poly TFT"Jpn.J.Appl.Phys.. 41. 5046-5064 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Yokoyama: "Solid-Phase Crystallization Behavior of in-situ Phosphorus-Doped Amorphous Silicon Films"J.Appl.Phys.. 94. 770-773 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Matsumoto: "Diffusion in Si"Encyclopedia of Materials : Science and Technology. (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 江藤 幹雄: "量子ドットにおける核スピンのエンタングルメント機構"固体物理. 38. 725-732 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 松本 智: "半導体デバイスの基礎"培風館. 236 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi, T.Segawa, O.Hirman, S.Matsumoto, J.Murota, K.Wada, T.Abe: "Self-diffusion in Extrinsic Silicon Using Isotopically Enriched ^<30>Si"Jpn.J.Appl.Phys.. Vol.40. L181-L182 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] T.Yanagawa, H.Nagai, K.Ishii, S.Matsumoto: "Initial Growth of titanium germanosilicide on Ge/Si(111)"Appl.Surf.Sci.. Vol.175-176. 90-95 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] H.Mori, H.Nagai, T.Yanagawa, S.Matsumoto: "Formation of Ge quantum dots on boron-reconstructed surface/ Si(111)"Materials Science and Engineering. Vol.B89. 188-190 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] H.I.Osman, Y.Nakabayashi, T.Sakaguchi, S.Matsumoto, J.Murota, K.Wada, T.Abe: "Effect of Vacancy double acceptor level on Si self-diffusion under heavy doping condition"Electrochemical Society Proc.. Vol.2002-2. 248-253 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Nishimura, S.Matsumoto, K.Terashima: "Variation of silicon melt viscosity with boron addition"Journal of Crystal Growth. Vol.237-239. 1667-1670 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi, Hirman Osman, K.Toyonaga, S.Matsumoto, J.Murota, K.Wada, T.Abe: "Fractional Contribution in Si Self-Diffusion Dopant Concentration and temperature Dependence on Si Self-Diffusion mechanism"Electrochemical Society Proc.. Vol.2002-2. 241-247 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] N.Fijiwara, K.Saito, Y.Nakabayashi, H.I.Osman, S.Matsumoto, Y.Sato: "Effect of Nitrogen segregation on TED and loss of phosphorus in CZ-Si"Nuclear Instruments and Methods in Physics Research. Vol.B186. 313-317 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi, H.I.Osman, K.Yokota, K.Toyonaga, S.Matsumoto, J.Murota, K.Wada, T.Abe: "Type and charge states of point defects in heavily As-and B-doped silicon"Materials Science in Semiconductor Processing. Vol.6. 15-19 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi, H.I.Osman, K.Yokota, K.Toyonaga, S.Matsumoto, J.Murota, K.Wada, T.Abe: "Self-diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure ^<30>Silicon/Natural Silicon Heterostructures"Jpn.J.Appl.Phys.. Vol.42. 3304-3310 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Eto, Y.Nazarov: "Multiparameter scaling of the Kondo effect in quantum dots with an even number of electrons"Phys.Rev.. Vol.B66. 153319 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Hada, M.Eto: "Electronic states in silicon quantum dots multivally artifical atoms"Phys.Rev.. Vol.B68. 155322 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Eto, T.Ashiwa, M.Murata: "Current-Induced Entanglement of Nuclear Spins in Quantum Dots"J.Phys.Soc.Jpn.. Vol.73. 307-310 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] J.Seto, Y.Kokubo, T.Nohda, H.Hamada, H.Kuwano: "Lateral Solid Phase Recrystallization from the Crystal Seed in Ge-Ion-Implanted Amorphous Silicon Films by Repetition Rapid Thermal Annealing"Jpn.J.Appl.Phys.. Vol.40. 2150-2154 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Jeong, D.Nagashima, H.Kuwano, T.Nohda: "Effects of various Hydrogenation Processes on Bias-Stress-Induced Degradation in p-Channel Polysilicon Thin Film Transistors"Jpn.J.Appl.Phys.. Vol.41. 5048-5064 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Yokoyama, H.Onizuka, Y.Yoshizawa, H.Kuwano: "Solid-Phase Crystallization Behavior of in-situ Phosphorus-Doped Amorphous Silicon Films Deposited Using Si_2H_6 and PH_3"J.Appl.Phys.. Vol.94. 770-773 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Matsumoto: "Diffusion in Si"Encyclopedia of Materials : Science and Technology (PERGAMON PRESS). (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] M.Eto: "Entanglment Mechanism of nuclear spin In quantum dots"Solid-State Physics. Vol.38. 725-732 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Nakabayashi: "Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure ^<30>Silicon/Natural Silicon Heterostructures"Jpn.J.Appl.Phys.. 42・6. 3304-3310 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.Nakabayashi: "Type and charge states of point defects in heavily As- and B-doped silicon"Materials Science in Semiconductor Processing. 6. 15-19 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] S.Yokoyama: "Solid-Phase Crystallization Behaviors of in-situ Phosphorus-Doped Amorphous Silicon Films Deposited Using Si_2H_6 and PH_3"J.Appl.Phys. 94・1. 770-773 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.Hoda: "Electronic states in silicon quantum dots : Multivalley artificial atoms"Phys.Rev.. 68・15. 155322-1-155322-7 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] 江藤 幹雄: "量子ドットにおける核スピンのエンタングルメント機構"固体物理. 38・11. 725-732 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] D.Mizoguchi: "A 1,2Gb/s/pin Wireless Superconnect based on Inductive Inter-chip Signaling"IEEE International Solid-State Circuits Conference, Dig.Tech Paper. 142-143 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.Nakabayashi: "Fractional Contribution in Si Self-Diffusion: Dopant Concentration and Temperature Dependence on Si Self-Diffusion Mechanism"Electrochemical Society Proceedings. 2002-2. 241-247 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Hirman I. Osman: "Effect of Vacancy Double Acceptor Level on Si Self-Diffusion under Heavy Doping Condition"Electrochemical Society Proceedings. 2002-2. 248-253 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.Nakabayashi: "Self-Diffusion in Intrinsic and Extrinsic Silicon Using Isotopically Pure ^<30>Silion/Natural Silicon Heterostructures"Jpn. J. Appl. Phys.. (in press). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.Nakabayashi: "Type and Charge States of Point Defects in Heavily As-and B-doped Silicon"Computational Matherials Science. (in press). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.Jeong: "Eeffect of various Hydrogenation Processes on Bias-Stress-Induced Degradation in P-Channel Polysilicon Thin Film Transistors"Jpn. J. Appl. Phys.. 41・8. 5048-5054 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] M.Eto: "Multiparameter scaling of the kondo effect in quatum dots with an even number of electrons"Phys. Rev.. B66. 153319-153322 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y Nakabayshi: "Self-Diffusion in Extrinsic Silicon Using Istopically Enriched ^<30>Si Layer"Jpn. J. Appl. Phys.. Vol.40(3). L181-L182 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Y Nakabayashi: "Epitaxial Growth of Pure ^<30>Si Layers on a Natural Si(100) Substrate Using Enriched ^<30>SiH4"First Int' Workshop on Now Group IV Semiconductors. VI25 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] H Mori: "Formation of Ge quantum dots on boron-reconstructed surface/Si(111)"Materials Science and Engineering. B89. 188-190 (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] T Yanagawa: "Initial Growth of titanium germanosilicide on Ge/Si(111)"Applied Surface Science. 175-176. 90-95 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Y.Hada: "Electronic States and Spin Configuration in Silicon Quantum Dots"Proc. of Int' Symposium on Mesoscopic Superconductivity and spintronics. (in press). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] J.Seto: "Lateral Solid Phase Recrystallization on from the crystal seed in Ge-Ion-Implanted Amorphous Si Films"Jpn. J. Appl. Phys.. Vol.40. 2150-2154 (2001)

    • Related Report
      2001 Annual Research Report

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Published: 2001-04-01   Modified: 2016-04-21  

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