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Deposition of photocatalytic sputtered films for responding to visible light region

Research Project

Project/Area Number 13480176
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field 環境保全
Research InstitutionToyama University

Principal Investigator

TAKAHASHI Takakaza  Toyama University, Faculty of Eng., Associate Professor, 工学部, 助教授 (80019223)

Co-Investigator(Kenkyū-buntansha) MASUGATA Katsumi  Toyama University, Faculty of Eng., Professor, 工学部, 教授 (80157198)
Project Period (FY) 2001 – 2002
Project Status Completed (Fiscal Year 2002)
Budget Amount *help
¥6,900,000 (Direct Cost: ¥6,900,000)
Fiscal Year 2002: ¥2,300,000 (Direct Cost: ¥2,300,000)
Fiscal Year 2001: ¥4,600,000 (Direct Cost: ¥4,600,000)
KeywordsSputtering / Double-layered film / Photocatalyst / Environmental material / Visible light reaction / Photo semiconductor / Electrochemistry / Disinfecting action / 薄膜
Research Abstract

The TiO_2 films had anatase crystal structure from the X-ray diffraction patterns and the Raman spectra. The (101), (112), (211) and (220) peaks were observed. With increasing plasma exposure, though the X-ray peak intensities of A(220) increased, the transmittance spectra of the TiO_2 films significantly depended on the wavelength because the TiO_2 films showed semitransparency due to the dim surface. It was found that the crystal structure, the surface morphology and the optical properties of the TiO_2 films were strongly affected by plasma exposure during film deposition.
The WO_3 films with yellow color have been deposited by an rf magnetron sputtering. The film color changed to pale yellow depends on the higher sputtering gas pressure. From the X-ray diffraction patterns, the as-deposited films were polycrystalline crystallizing in the monoclinic crystal structure with high c-axis orientation perpendicular to the film plane. The wavelength at absorption edge is longer than that in TiO_2 and comes in the visible region. The WO_3 films may be used for the underlayer of TiO_2 photocatalyst.
As it has expected that the double layer can adsorb much visible light as compared with TiO_2 single layers, the TiO_2/WO_3 double layers composed of the TiO_2, and WO_3 films were deposited using reactive sputtering in order to study the decomposition of methyl alcohol (CH_3OH) by a photocatalytic reaction. From the measurement of FT-IR transmittance spectra, the CH_3OH can strongly be decomposed into the CO_2 and H_2O molecules as compared to the TiO_2 single layer. When the TiO_2/WO_3 bilayer was irradiated with the artificial sunrays for 130 min, the formation rate of the CO_2 molecules are about two times as fast as that in the TiO_2 single layer. It has been found that the activity of the decomposition of CH_3OH depends on the crystallinity and optical properties of WO_3 underlayers.

Report

(3 results)
  • 2002 Annual Research Report   Final Research Report Summary
  • 2001 Annual Research Report
  • Research Products

    (22 results)

All Other

All Publications (22 results)

  • [Publications] Takakazu Takahashi: "Atomic Force Microscopy Observation of TiO_2 Films Deposited by dc Reactive Sputtering"Journal of Vacuum Science and Technology A. Vol.20 No.4. 1205-1209 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Effects of Plasma Exposure on Structural and Optical Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Journal of Vacuum Science and Technology A. Vol.20 No.6. 1916-1920 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Dependence of Working Gas Pressure and Ratio of Ar to O_2 On Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Thin Solid Films. Vol.420-421. 433-437 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Influence of Working gas presure on Structure and Optical Properties of WO_3 Films Reactively Deposited by RF Magnetron Sputtering"Journal of Vacuum Science and Technology A. (to be published). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Photocatalytic Properties of TiO_2/WO_3 Bilayers Deposited by Reactive Sputtering"Journal of Vacuum Science and Technology A. (to be published). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Raman Spectroscopy Measurement of TiO_2 Sputtered Films Changing Degree of Plasma Exposure"Journal of Vacuum Science and Technology A. (to be published). (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] T.Takahashi, H.Nakabayashi, T.Terasawa and K.Masugata: "Atomic Force Microscopy Observation of TiO_2 Films Deposited by dc Reactive Sputtering."Journal of Vacuum Science and Technology A. 20, No.4. 1205-1209 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] T.Takahashi, H.Nakabayashi and W.Mizuno: "Effects of Plasma Exposure on Structural and Optical Properties of TiO_2 Films Deposited by Off-axis Target Sputtering."Journal of Vacuum Science and Technology A. 20, No.6. 1916-1920 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] T.Takahashi and H.Nakabayashi: "Dependence of Working Gas Pressure and Ratio of Ar to O_2 On Properties of TiO_2 Films Deposited by Facing Targets Sputtering."Thin Solid Films. 420-421. 433-437 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] T.Takahashi, J.Tanabe, H.Nakabayashi and N.Yamada: "Influence of Working gas presure on Structure and Optical Properties of WO_3 Films Reactively Deposited by RF Magnetron Sputtering."Journal of Vacuum Science and Technology A, to be published. (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] T.Takahashi, H.Nakabayashi, J.Tanabe and N.Yamada: "PhotocataJytic Properties of TiO_2/WO_3 Bilayers Deposited by Reactive Sputtering."Journal of Vacuum Science and Technology A, to be published. (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] T.Takahashi, H.Nakabayashi, J.Tanabe, N. Yamada and W.Mizuno: "Raman Spectroscopy Measurement of TiO_2 Sputtered Films Changing Degree of Plasma Exposure."Journal of Vacuum Science and Technology A, to be published. (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2002 Final Research Report Summary
  • [Publications] Takakazu Takahashi: "Atomic Force Microscopy Observation of TiO_2 Films Deposited by dc Reactive Sputtering"Journal of Vacuum Science and Technology A. Vol.20 No.4. 1205-1209 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Takakazu Takahashi: "Effects of Plasma Exposure on Structural and Optical Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Journal of Vacuum Science and Technology A. Vol.20 No.6. 1916-1920 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Takakazu Takahashi: "Dependence of Working Gas Pressure and Ratio of Ar to O_2 On Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Thin Solid Films. Vol.420-421. 433-437 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Takakazu Takahashi: "Influence of Working gas presure on Structure and Optical Properties of WO_3 Films Reactively Deposited by RF Magnetron Sputtering"Journal of Vacuum Science and Technology A. (to be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Takakazu Takahashi: "Photocatalytic Properties of TiO_2/WO_3 Bilayers Deposited by Reactive Sputtering"Journal of Vacuum Science and Technology A. (to be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Takakazu Takahashi: "Raman Spectroscopy Measurement of TiO_2 Sputtered Films Changing Degree of Plasma Exposure"Journal of Vacuum Science and Technology A. (to be published). (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Takakazu Takahashi: "Atomic Force Microscopy Observation of TiO_2 Films Deposited by dc Reactive Sputtering"Abstracts of IUVSTA 15th International Vacuum Congress-11^<th> International Conference on Solid Surfaces(AVS 48th International Symposium). 64 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Takakazu Takahashi: "Effects of Plasma Exposure on Structural and Optical Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Abstracts of IUVSTA 15th International Vacuum Congress-11^<th> International Conference on Solid Surfaces(AVS 48th International Symposium). 264 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Kazuhito Takao: "Characteristics of Ion Beams Produced in a Plasma Focus Device"Japanese Journal of Applied Physics. Vol.40, No.2B. 1013-1015 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] Takakazu Takahashi: "Dependence of Working Gas Pressure and Ratio of Ar to O_2 on Properties of TiO_2 Films Deposited by Facing Targets Sputtering,"The International Conference On Metallurgical Coatings And Thin Films (ICMCTF 2002). (to be presented). (2002)

    • Related Report
      2001 Annual Research Report

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Published: 2001-04-01   Modified: 2016-04-21  

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