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Development of insulating system with low dielectric constant, high dielectric strength a-C:F film coated conductor prepared by plasma CVD as alternatives to SF_6

Research Project

Project/Area Number 13555077
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field 電力工学・電気機器工学
Research InstitutionHOKKAIDO UNIVERSITY

Principal Investigator

SAKAI Yosuke  Hokkaido Univ., Grad. School of Eng., Prof., 大学院・工学研究科, 教授 (20002199)

Co-Investigator(Kenkyū-buntansha) SUDA Yoshiyuki  Hokkaido Univ., Grad. School of Eng., Res. Ass., 大学院・工学研究科, 助手 (70301942)
AKAZAWA Masamichi  Hokkaido Univ., Res. Cent. for Int. Quart. Electr., Ass. Prof., 量子集積エレクトロニクス研究センター, 助教授 (30212400)
SUGAWARA Hirotake  Hokkaido Univ., Grad. School of Eng., Ass. Prof., 大学院・工学研究科, 助教授 (90241356)
NAKAJIMA Masatoshi  Japan AE Power Systems Corp., Chief Researcher, 開閉装置事業部, 主任研究員
BRATESCU A. maria  Hokkaido Univ., Grad. School of Eng., Res. Ass., 大学院・工学研究科, 助手 (70312379)
Project Period (FY) 2001 – 2003
Project Status Completed (Fiscal Year 2003)
Budget Amount *help
¥13,700,000 (Direct Cost: ¥13,700,000)
Fiscal Year 2003: ¥2,600,000 (Direct Cost: ¥2,600,000)
Fiscal Year 2002: ¥2,600,000 (Direct Cost: ¥2,600,000)
Fiscal Year 2001: ¥8,500,000 (Direct Cost: ¥8,500,000)
Keywordselectric insulation / amorphous CF film / per-fluorocarbon / Paschen curve / enhancement of dielectric strength / 絶縁体力向上 / 非平衡プラズマ / フルオロカーボン / 薄膜推積 / 薄膜堆積
Research Abstract

In order to reduce the usage of SFs insulation gas, which has high GWP (global warming potential), the present project proposed to use a-C:F film coated conductor prepared by RF plasma CVD method for insulation of electric power systems as alternatives of SF_6. This project was motivated because we had experienced very high deposition rates in RF plasma if per-fluorocarbon vapors were used. The main results are listed as follows.
l. The deposition rate on Si and A1 substrates was > 100-200nm/min, which is a few tens times higher than those obtained by conventional CF_4 and C_2F_6 gases.
2. The a-C:F film, which is composed of C-C and C-F bonds, was excellent insulation properties (dielectric constant 【approximately equal】 2) with high density and good thermal strength.
3. The breakdown voltage V_s of N_2, Ar and He between the a-C:F film coated Al electrodes were 3 times larger than that between Al ones in low p(pressure)d(gap length) region. For pd<20 Torr/cm the V_s was rather higher than that of SFs.
4. Reason of the enhancement of V_s was explained by the fact that secondary electron emission rate was reduced significantly by this film coating.
5. Effect of decomposed species in the plasma on the a-C:F film properties was tried to examine, but in this project term it was not really cleared.

Report

(4 results)
  • 2003 Annual Research Report   Final Research Report Summary
  • 2002 Annual Research Report
  • 2001 Annual Research Report
  • Research Products

    (35 results)

All Other

All Publications (35 results)

  • [Publications] Y.Sakai, M.Akazawa, H.Sugawara, M.Tabata, C.P.Lungu, A.M.Lungu: "CxFy Polymer Film Deposition in rf and dc C_7F_<16> Vapor Plasma"Korean Institute of Electrical and Electronic Material Engineers, Transaction on Electrical and Electronic Materials. 2. 1-6 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 鉾井耕司, 赤澤正道, 菅原広剛, 須田善行, 酒井洋輔: "C_7F_<16>を用いたC:F膜の堆積とその評価-ガス圧依存性および気体混合による効果-"電気学会放電研究会資料. ED-01-113. 1-9 (2001)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Sakai: "Database in low temperature plasma modeling"Applied Surface Sciences. 192. 327-338 (2002)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai.Y.Suda, M.Nakajima: "Enhancement of Nitrogen Gas Breakdown Voltage between Coated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C_8F_<18> Vapor RF Plasma"Jpn.J.Appl.Phys.. 42(2,2B). L201-L203 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] 太田章嗣, C.Biloiu, 酒井洋輔, M.A.Bratescu, 須田善行: "C_8F_<18>プラズマCVDを用いたa-C:F膜の生成とその特性の評価"電気学会放電研究会資料. ED-03-115. 49-54 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, A.Ohta: "Amorphous fluorocarbon polymer films prepared in perfluorooctane (C_8F_<18>) vapor plasma CVD for an application of electrical insulation"Proc.of Int.Sym.on Plasma Chemistry. 500-505 (2003)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Sakai, M.Akazawa, H.Sugawara, M.Tabata, C.P.Lungu, A.M.Lungu: "CxFy Polymer Film Deposition in rf and dc G_7F_<16> Vapor Plasma"Korean Institute of Electrical and Electronic Material Engineers, Transaction on Electrical and Electronic Materials. 2. 1-6 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] K.Hokoi, M.Akazawa, H.Sugawara, Y.Suda, Y.Sakai: "Deposition and Characterization of C:F Films Using C_7F_<16> -Effect of Material Gas Pressure and Gas Additions -"Papers of Technical Committee for Electrical Discharges (IEEJ). ED-01-113. 1-9 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Sakai: "Database in low temperature plasma modeling"Applied Surface Sciences. 192. 327-338 (2002)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, M.Nakajima: "Enhancement of Nitrogen Gas Breakdown Voltage between Goated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C_8F_<18> Vapor RF Plasma"Jpn.J.Appl.Phys.. 42(2,2B). L201-L203 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] A.Ohta, C.Biloiu, Y.Sakai, M.A.Bratescu, Y.Suda: "Deposition of a-C : F films by C_8F_<18> plasma CVD and their properties"Papers of Technical Committee for Electrical Discharges (IEEJ). ED-03-115. 49-54 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, A.Ohta: "Amorphous fluorocarbon polymer films prepared in perfluorooctane (C_8F_<18>) vapor plasma CVD for an appllication of electrical insulation"Proc.of Int.Sym.on Plasma Chemistry. 500-505 (2003)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, A.Ohta: "Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluorooctane (C_8F_<18>) vapor I : deposition, morphology, structural and chemical properties"J.Vac.Sci.Technol.. 22. 13-19 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] A.Ohta, S.Tazawa, Y.Sakai, M.A.Bratescu: "Relationship between the C_8F_<18> plasma and a-C:F film properties by PECVD"Proceedings of the 21st Sym.on Plasma Processing. 32-33 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] S.Tazawa, A.Ohta, Y.Sakai, M.A.Bratescu: "Enhancement of Breakdown Voltages between a-C:F Film Coated Electrodes in N_2, Ar and Ne Gases"Proceedings of the 21^<st> Sym.on Plasma Processing. 32-33 (2004)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] Y.Sakai: "Application of fluorocarbon vapor to electrical insulation"Gaseous Dielectrics IX (Edited By L.G.Christophorou & J.K.Olthoff) (Plenum Publishers). 285-294 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2003 Final Research Report Summary
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, M.Nakajima: "Enhancement of Nitrogen Gas Breakdown Voltage between Coated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C_8F_<18> Vapor RF Plasma"Jpn.J.Appl.Phys.. 42(2,2B). L201-L203 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] 太田章嗣, C.Biloiu, 酒井洋輔, M.A.Bratescu, 須田善行: "C_8F_<18>プラズマCVDを用いたa-C:F膜の生成とその特性の評価"電気学会放電研究会資料. ED-03-115. 49-54 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, A.Ohta: "Amorphous fluorocarbon polymer films prepared in perfluorooctane (C_8F_<18>) vapor plasma CVD for an application of electrical insulation"Proc.of Int.Sym.on Plasma Chemistry. 500-505 (2003)

    • Related Report
      2003 Annual Research Report
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, A.Ohta: "Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluorooctane (C_8F_<18>) vapor I : deposition, morphology, structural and chemical properties"J.Vac.Sci.Technol.. 22. 13-19 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] A.Ohta, S.Tazawa, Y.Sakai, M.A.Bratescu: "Relationship between the C_8F_<18> plasma and a-C:F film properties by PECVD"第21回プラズマプロセシング研究会論文集. 32-33 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] S.Tazawa, A.Ohta, Y.Sakai, M.A.Bratescu: "Enhancement of Breakdown Voltages between a-C:F Film Coated Electrodes in N_2, Ar and He Gases"第21回プラズマプロセシング研究会論文集. 154-155 (2004)

    • Related Report
      2003 Annual Research Report
  • [Publications] Y.Sakai: "Database in low temperature plasma modeling"Applied Surface Sciences. 192. 327-338 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] C.Biloiu, I.A.Biloiu, Y.Sakai, Y.Suda, M.Nakajima: "Enhancement of Nitrogen Gas Breakdown Voltage between Coated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C8F18 Vapor RF Plasma"Jpn. J. Appl. Phys.. 42・(2,2B). L201-L203 (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.Sakai, C.Biloiu, I.A.Biloiu, Y.Suda: "Fluorocarbon-film preparation in C_8F_<18> vapor rf plasma and its electrical properties"Int. Conf. on Plasma Sciences, Banff, Canada. 6D08 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Y.Sakai, C.Biloiu, I.A.Biloiu, Y.Suda: "Breakdown Voltage and Secondary Electron Emission Coefficient of Fluorocarbon Polymer Film Coated Electrode Deposited in C_8F_<18> Vapor RF Plasma in Nitrogen Gas"Proc. 2002 Joint Conference of ACED & Korea-Japan Symp. on Electrical Discharge and High Voltage Eng., Soongsil. Univ. Seoul, Korea. 379-382 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] 太田章嗣, C.Biloiu, 須田善行, 菅原広剛, 酒井洋輔: "C_8F_<18>プラズマプロセスによるa-C : F膜の堆積とその特性"2002年度電気関係学会北海道支部連合大会. 86-86 (2002)

    • Related Report
      2002 Annual Research Report
  • [Publications] Costel Biloiu, Ioana Arabela Biloiu, 酒井洋輔, 太田章嗣, 須田善行: "High speed deposition of amorphous fluorocarbon polymer (a-C : F) films using perfuorocarbon vapor RF plasma CVD"第20回プラズマプロセシング研究会(SPP-20). 285-286 (2003)

    • Related Report
      2002 Annual Research Report
  • [Publications] 鉾井 耕司: "C_7F_<16>を用いたC:F膜の堆積とその評価 -ガス圧依存性および気体混合による効果-"電気学会放電研究会 ED-01-113. 1-6 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] 鉾井 耕司: "プラズマCVDにより堆積したフロロカーボン膜の電気的特性"第37回応用物理学会北海道支部/第7回レーザー学会 東北・北海道支部 合同学術講演会. A24 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] C. Biloiu: "Effect of Fluorocarbon Polymer Film Deposition on Electrodes Breakdown Voltage in a N_2 Gas"The XXV-th Intenational Conference on Physics of Ionised Gases. 2. 129-130 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] C. Biloiu: "Influence of fluorocarbon polymer film deposited on aluminum electrodes on breakdown voltage of nitrogen"The 54-th Ann. Gaseous Electronics Conf.. 40 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] C. Biloiu: "PECVD of fluorocarbon polymer films and their proprieties as electrical insulators"平成13年度電気関係学会北海道支部大会. 77 (2001)

    • Related Report
      2001 Annual Research Report
  • [Publications] C. Biloiu: "Electrical Proprieties of Fluorocarbon Polymer Films Obtained by Plasma Enhanced Chemical Vapor Deposition"平成14年電気学会全国大会. (発表予定). (2002)

    • Related Report
      2001 Annual Research Report
  • [Publications] Yosuke Sakai: ""Application of fluorocarbon vapor to electrical insulation" in "Gaseous Dielectrics IX" (分筆)"Plenum Publishers. 10 (2001)

    • Related Report
      2001 Annual Research Report

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Published: 2001-04-01   Modified: 2021-04-07  

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