| Project/Area Number |
13680562
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
プラズマ理工学
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| Research Institution | TOYAMA PREFECUTAL UNIVERSITY |
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Principal Investigator |
KATO Yushi TOYAMA PREF. UNIV., FACALUTY OF ENGINEERING, ASSOCIATE PROFESSOR, 工学部, 助教授 (40224547)
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| Co-Investigator(Kenkyū-buntansha) |
ISHI Shigeyuki TOYAMA PREF. UNIV., FACALUTY OF ENGINEERING, PROFESSOR, 工学部, 教授 (20222937)
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| Project Period (FY) |
2001 – 2002
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| Project Status |
Completed (Fiscal Year 2002)
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| Budget Amount *help |
¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 2002: ¥1,400,000 (Direct Cost: ¥1,400,000)
Fiscal Year 2001: ¥2,100,000 (Direct Cost: ¥2,100,000)
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| Keywords | ECR / MULTICHARGED ION / SOLID MATERIAL SOURCE / Fe / Si / ECOLOGICAL MATERIALS / ?-FeSi_2 / TiO_2 / 環境低負荷 / 半導体構成材料 |
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| Research Abstract |
Multiply charged ions of Fe and Si are produced from solid materials in a 2.45 GHz electron cyclotron resonance (ECR) ion source. The multicharged Fe ions have been produced by both directly sputtering the pure material and evaporating it in form of filament in the ECR plasma. The evaporator is mounted from the side wall. Argon gas is usually chosen for supporting gas, and the working pressure is about 10^<-4> 〜 10^<-3> Pa. The multicharged ions are extracted from the opposite side of mirror end against the target or the evaporator of the iron, occasionally, and then multicharged ion beam is formed. Extraction voltage is normally 10 kV, the sector magnet separates mass/charge, and the ion beams are collected by the Faraday cup. The ratio of total multicharged Fe ion to the total ion current attains to about 11% at the maximum.
The Faraday cup is removed off from the beam line, and the ion beams can be introduced to a newly constructed part for ion irradiation of the substrate installed on the beam line. The beam profiles can be measured both vertically and horizon tally by wire probes, and the current density and the required dose can be estimated.
We tried to from β-FeSi_2 and to enhance light catalytic performance of TiO_2 thin films by applying the multicharged Fe ion beams. The Si wafer is chosen for the substrate in the formation of silicides. As for TiO_2 substrate, we use thin films (350 〜 400mm) produced on the glasses or Si wafers by reactive sputtering in our different equipment. Therefore we recognized formation of β-FeSi_2 by x-ray diffractometer with thin-film optics in the high dose implantation. We also recognized enhancement of photo-catalytic performance, I. e., contact angle of the distilled water on TiO_2 thin films, in visible light region without degradation in UV light region.
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