| Project/Area Number |
14102022
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| Research Category |
Grant-in-Aid for Scientific Research (S)
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| Allocation Type | Single-year Grants |
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| Research Field |
電子デバイス・機器工学
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| Research Institution | Tohoku University |
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Principal Investigator |
HANE Kazuhiro Tohoku University, Graduate School of Engineering, Professor, 大学院工学研究科, 教授 (50164893)
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| Co-Investigator(Kenkyū-buntansha) |
SASAKI Minoru Tohoku University, Graduate School of Engineering, Associate professor, 大学院工学研究科, 助教授 (70282100)
KANAMORI Yoshiaki Tohoku University, Graduate School of Engineering, Research associate, 大学院工学研究科, 助手 (10333858)
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| Project Period (FY) |
2002 – 2006
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| Project Status |
Completed (Fiscal Year 2006)
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| Budget Amount *help |
¥107,250,000 (Direct Cost: ¥82,500,000、Indirect Cost: ¥24,750,000)
Fiscal Year 2006: ¥17,290,000 (Direct Cost: ¥13,300,000、Indirect Cost: ¥3,990,000)
Fiscal Year 2005: ¥20,540,000 (Direct Cost: ¥15,800,000、Indirect Cost: ¥4,740,000)
Fiscal Year 2004: ¥21,580,000 (Direct Cost: ¥16,600,000、Indirect Cost: ¥4,980,000)
Fiscal Year 2003: ¥23,790,000 (Direct Cost: ¥18,300,000、Indirect Cost: ¥5,490,000)
Fiscal Year 2002: ¥24,050,000 (Direct Cost: ¥18,500,000、Indirect Cost: ¥5,550,000)
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| Keywords | Micromachining / Photonic crystal / Micro-actuator / Filter / Optical switch / シリコン / 光通信 |
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| Research Abstract |
Introducing MEMS into photonic crystal structure, the light wave was controlled. Photonic crystal waveguide switch was fabricated, and the characteristics were measured. In the proposed structure, the photonic crystal slabs were divided into three parts. The waveguides were connected to a micro electrostatic actuator. The proposed structures were investigated theoretically using FDTD method. The optimum conditions of the gap between the fixed and movable waveguides were obtained. Using SOI wafer, two-dimensional photonic crystal waveguides were fabricated. Using electron beam drawing machine, the hole patterns having 400nm period and 300nm diameter were transferred to the top silicon layer of the SOI wafer. Using the fast atom beam and deep reactive ion etching machines, the crystal holes were etched with a high aspect ratio. In order to remove the sacrificial silicon dioxide layer underneath the silicon layer, the hydrogen fluoride vapor etching machine was improved. Parallel plate and comb electrostatic micro-actuators were fabricated. By improving the designs and the micromachining techniques, the photonic crystal structure with MEMS were successfully fabricated. In the case of the switch with the parallel plate actuator. observing the device with an infrared camera, it was confirmed that the fabricated devices operated well. With the application of a voltage, the light scattering from gap of the photonic crystal waveguides was modulated. The light transmitted through the photonic crystal switch was measured as a function of the voltage applied to the micro-actuator. At the voltage of 180V, minimum transmission was obtained, which corresponded to the 'switch-off" condition. Further increasing the voltage, the light leaked directly through the gap between the input and output waveguides. The photonic crystal waevguide switches with the lateral comb actuator were also fabricated, and the optical properties were evaluated.
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