| Budget Amount *help |
¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2005: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 2004: ¥500,000 (Direct Cost: ¥500,000)
Fiscal Year 2003: ¥2,700,000 (Direct Cost: ¥2,700,000)
|
|---|
| Research Abstract |
The purpose of this project was to develop new fabrication method of photonic crystals using interference recording and X-ray exposure as with the possibility of mass productivity and industrialization with its application for optical elements in mind. In 2003, we established the interferometric recording system, developed X-ray mask fabrication process using interferometric recording and electro-plating, implemented X-ray exposure experiments using the developed process. In 2004, we developed new simple calculation method for optical property of photonic crystals, fabricated photonic crystals by only four-beam interference. In 2005, we developed new method, which can fabricate all fourteen Bravais lattice structures, proposed new method to fabricate buried defect waveguide. We completed the expected purpose. The major results are as follows.
1.We proved theoretically that all photonic crystals with fourteen Bravais lattice structure could be fabricated by three exposures of X-ray with different incident angles through three different X-ray masks with slit array structure. This method can be extended to laser interferometric method, that is, all fourteen Bravais lattices can be fabricated by three exposures of two-beam interference.
2.We proposed new simple calculation method for the transmittance of photonic crystals using the effective medium method and the matrix method. The stop-band was calculated by this method and the validity of this method was verified.
3.We proposed new method to fabricate buried defect waveguide in three-dimensional photonic crystals fabricated by interferometric method, while it had been considered to be impossible.
|
