Establishment of a CMOS image sensor with photon countable sensitivity, linear response and high full well capacity
Project/Area Number |
15H02245
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Research Category |
Grant-in-Aid for Scientific Research (A)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Electron device/Electronic equipment
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Research Institution | Tohoku University |
Principal Investigator |
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Co-Investigator(Kenkyū-buntansha) |
黒田 理人 東北大学, 工学研究科, 准教授 (40581294)
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Project Period (FY) |
2015-04-01 – 2018-03-31
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Project Status |
Completed (Fiscal Year 2017)
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Budget Amount *help |
¥44,330,000 (Direct Cost: ¥34,100,000、Indirect Cost: ¥10,230,000)
Fiscal Year 2017: ¥11,830,000 (Direct Cost: ¥9,100,000、Indirect Cost: ¥2,730,000)
Fiscal Year 2016: ¥13,130,000 (Direct Cost: ¥10,100,000、Indirect Cost: ¥3,030,000)
Fiscal Year 2015: ¥19,370,000 (Direct Cost: ¥14,900,000、Indirect Cost: ¥4,470,000)
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Keywords | 電子デバイス・機器 / センシングデバイス / 撮像素子 / フォトンカウンティング / 1光子検出 |
Outline of Final Research Achievements |
Toward the establishment of a CMOS image sensor with photon countable sensitivity and high full well capacity with linear response, capable of clearly capturing image shooting targets over 5 decade of light illumination conditions, an ultra-high sensitivity signal readout technology was developed in this research based on formerly developed CMOS image sensors with lateral overflow integration capacitor (LOFIC). By the minimization of capacitance of floating diffusion that convert photo-electrons to voltage signal and the introduction of multiple gain column parallel amplifiers, a very low input-referred noise performance of 0.47 electrons was achieved. Moreover, signal readout noise of input-referred 0.2 electron and full well capacity of 50,000 electrons are estimated to be obtained by introducing multi sampling readout scheme of pixel signals and lowering thermal noise of signal readout chain.
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Report
(4 results)
Research Products
(81 results)
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[Journal Article] Introduction of Atomically Flattening of Si Surface to Large-Scale Integration Process Employing Shallow Trench Isolation2016
Author(s)
Tetsuya Goto, Rihito Kuroda, Naoya Akagawa, Tomoyuki Suwa, Akinobu Teramoto, Xiang Li, Toshiki Obara, Daiki Kimoto, Shigetoshi Sugawa, Yutaka Kamata, Yuki Kumagai, and Katsuhiko Shibusawa
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Journal Title
ECS Journal of Solid State Science and Technology
Volume: 5
Issue: 2
Pages: P67-P72
DOI
Related Report
Peer Reviewed / Acknowledgement Compliant
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[Journal Article] Low Temperature Atomically Flattening of Si Surface of Shallow Trench Isolation Pattern2015
Author(s)
T. Goto, R. Kuroda, T. Suwa, A. Teramoto, N. Akagawa, D. Kimoto, S. Sugawa, T. Ohmi, Y. Kamata, Y. Kumagai, and K. Shibusawa
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Journal Title
ECS Transactions
Volume: 66
Issue: 5
Pages: 285-292
DOI
Related Report
Peer Reviewed / Acknowledgement Compliant
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[Presentation] High-speed multi-bandpass liquid-crystal filter using dual-frequency liquid crystal for real-time spectral imaging system2018
Author(s)
Takahiro Ishinabe, Kohei Terashima, Kazuhiro Wako, Yasuyuki Fujihara, Yusuke Aoyagi, Maasa Murata, Satoshi Nasuno, Shunichi Wakashima, Rihito Kuroda, Yosei Shibata, Shigetoshi Sugawa, Hideo Fujikake
Organizer
SPIE PHOTONICS WEST 2018
Related Report
Int'l Joint Research
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[Presentation] Narrow-Bandpass Liquid Crystal Filter for Real-Time Multi Spectral Imaging Systems2017
Author(s)
Kohei Terashima, Takahiro Ishinabe, Kazuo Wako, Yasuyuki Fujihara, Yusuke Aoyagi, Maasa Murata, Satoshi Nasuno, Shunichi Wakashima, Rihito Kuroda, Yosei Shibata, Shigetoshi Sugawa, Hideo Fujikake
Organizer
International Display Workshops
Related Report
Int'l Joint Research
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[Presentation] SNR 70dB超のCMOSイメージセンサと半値幅10nmのチューナブルマルチバンドパスフィルタを用いた分光イメージングシステム2017
Author(s)
青柳雄介, 藤原康行, 村田真麻, 那須野悟史, 若嶋駿一, 黒田理人, 寺島康平, 石鍋隆宏, 藤掛英夫, 若生一広, 須川成利
Organizer
映像情報メディア学会技術報告・情報センシング研究会
Related Report
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[Presentation] リアルタイム分光イメージングシステム用の高速ナローバンドパス液晶フィルタ2017
Author(s)
寺島康平, 石鍋隆宏, 若生一広, 藤原康行, 青柳雄介, 村田真麻, 那須野悟史, 若嶋駿一, 黒田理人, 柴田陽生, 須川成利, 藤掛英夫
Organizer
Optics & Photonics Japan 2017
Related Report
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[Presentation] Low Temperature Atomically Flattening of Si Surface of Shallow Trench Isolation Pattern2015
Author(s)
Tetsuya Goto, Rihito Kuroda, Tomoyuki Suwa, Akinobu Teramoto, Naoya Akagawa, Daiki Kimoto, Shigetoshi Sugawa, Tadahiro Ohmi, Yutaka Kamata, Yuki Kumagai and Katsuhiko Shibusawa
Organizer
227th Meeting of The Electrochemical Society
Place of Presentation
Chicago, USA
Year and Date
2015-05-24
Related Report
Int'l Joint Research
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[Presentation] Effect of Process Temperature of Al2O3 Atomic Layer Deposition Using Accurate Process Gasses Supply System2015
Author(s)
Hisaya Sugita, Yasukasa Koda, Tomoyuki Suwa, Rihito Kuroda, Tetsuya Goto, Hidekazu Ishii, Satoru Yamashita, Akinobu Teramoto, Shigetoshi Sugawa, and Tadahiro Ohmi
Organizer
227th Meeting of The Electrochemical Society
Place of Presentation
Chicago, USA
Year and Date
2015-05-24
Related Report
Int'l Joint Research
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