| Project/Area Number |
15H03582
|
|---|
| Research Category |
Grant-in-Aid for Scientific Research (B)
|
| Allocation Type | Single-year Grants |
|---|
| Section | 一般 |
|---|
| Research Field |
Plasma electronics
|
|---|
| Research Institution | Osaka University (2017)
Kyoto University (2015-2016) |
|---|
Principal Investigator |
ONO Kouichi 大阪大学, 接合科学研究所, 特任教授 (30311731)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
江利口 浩二 京都大学, 工学研究科, 教授 (70419448)
|
|---|
| Project Period (FY) |
2015-04-01 – 2018-03-31
|
| Project Status |
Completed (Fiscal Year 2017)
|
| Budget Amount *help |
¥17,420,000 (Direct Cost: ¥13,400,000、Indirect Cost: ¥4,020,000)
Fiscal Year 2017: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2016: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2015: ¥11,570,000 (Direct Cost: ¥8,900,000、Indirect Cost: ¥2,670,000)
|
|---|
| Keywords | プラズマ加工 / プラズマ化学 / 表面・界面物性 / 半導体超微細化 / 微細加工形状 / 反応粒子輸送 / プラズマエッチング / プラズマ・表面過程揺動 / 超微細加工形状 |
|---|
| Outline of Final Research Achievements |
Nanoscale surface roughening and ripple formation in response to ion incidence angle has been investigated during Si etching in Cl-based plasmas, by employing modeling and simulations of plasma-surface interactions and feature profile evolution: our own three-dimensional atomic-scale cellular model (ASCeM-3D) based on Monte Carlo algorithm, and a classical molecular dynamics (MD) simulation. Then, based on numerical results, we demonstrated experimentally the plasma-induced formation of well-defined periodic sawtooth-like ripples of wavelength on the order of several 10 nm, using sheath control plates to achieve the off-normal ion incidence on blank substrate surfaces. Moreover, a comparison of experiments with ASCeM-3D and MD simulations revealed the critical role of ion reflection from microstructural feature surfaces on incidence in plasma- and ion-induced surface roughening and rippling.
|
