Development of surface process technology with high speed and no damage by huge composite cluster
Project/Area Number |
15H04157
|
Research Category |
Grant-in-Aid for Scientific Research (B)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Material processing/Microstructural control engineering
|
Research Institution | Kyoto University |
Principal Investigator |
Seki Toshio 京都大学, 工学研究科, 講師 (00402975)
|
Project Period (FY) |
2015-04-01 – 2018-03-31
|
Project Status |
Completed (Fiscal Year 2017)
|
Budget Amount *help |
¥14,040,000 (Direct Cost: ¥10,800,000、Indirect Cost: ¥3,240,000)
Fiscal Year 2017: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2016: ¥5,720,000 (Direct Cost: ¥4,400,000、Indirect Cost: ¥1,320,000)
Fiscal Year 2015: ¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
|
Keywords | クラスター / イオンビーム / 中性ビーム / 反応性エッチング / ナノプロセス / 表面処理 / 複合ビーム |
Outline of Final Research Achievements |
We have used the gas cluster generation technology originating from Kyoto University to develop the formation of huge complex cluster ions and acceleration control technology by controlling the initial cluster velocity of large clusters by mixing He to material gas. As a result, we succeeded in developing a huge composite cluster beam forming technology with energy control in the range of 0.1 to 0.4 eV / atom.
|
Report
(2 results)
Research Products
(2 results)