Development of next generation mist CVD enabling atomic level control & development of oxide quantum devices

• Project/Area Number: 15H05421
• Research Category: Grant-in-Aid for Young Scientists (A)
• Allocation Type: Single-year Grants
• Research Field: Crystal engineering
• Research Institution: Kochi University of Technology
• Principal Investigator: Kawaharamura Toshiyuki 高知工科大学, システム工学群, 教授 (00512021)
• Project Period (FY): 2015-04-01 – 2019-03-31
• Project Status: Completed (Fiscal Year 2018)
• Budget Amount: ¥21,190,000 (Direct Cost: ¥16,300,000、Indirect Cost: ¥4,890,000); Fiscal Year 2017: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000); Fiscal Year 2016: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000); Fiscal Year 2015: ¥14,820,000 (Direct Cost: ¥11,400,000、Indirect Cost: ¥3,420,000)
• Keywords: ミストCVD / 機能膜 / 環境負荷低減 / グリーンプロセス / 金属酸化物 / 酸化物量子デバイス / 酸化亜鉛 / 酸化ガリウム / 酸化物量子素子 / 高度な反応制御技術 / 低環境負荷 / 反応活性 / 酸化物量子発光デバイス / 組成制御 / 反応メカニズム / α-Ga2O3 / コランダム型 / コランダム型結晶構造金属酸化物薄膜物性値特定 / 溶媒雰囲気反応場における反応解析

Outline of Final Research Achievements

I have developed mist CVD, which is a thin film fabrication method using liquid droplets similar to spray pyrolysis and aerosol assisted CVD. In this budget, mist CVD had demonstrated its capability of accurately controlling thin film characteristics by the precise control of flow, which was made possible by focusing on the fact that the mist droplets were in the gas-liquid multiphase. Also, we succeeded in cathode-luminescence of Ga2O3 based materials fabricated by mist CVD, and it was a world first result.

Academic Significance and Societal Importance of the Research Achievements

我々の身の回りには様々な光・電子デバイスが存在する。現在それらのデバイスの多くは多岐に亘る要望に応えるため特性の高性能化が優先されており、真空などの特殊な環境が必要な機能膜作製技術や有毒物質・不安定材料などが利用され、環境への負荷が考慮されることは後回しにされがちである。本申請はデバイス作製技術の省エネ化や材料の安定性を担保しながら次世代に必要とされる量子デバイスの作製を可能とする技術の開発に焦点を当てている。

Research Products

• [Int'l Joint Research] University of California Los Angeles(米国)
• [Int'l Joint Research] University of Canterbury(New Zealand)
• [Journal Article] Incorporation of yttrium to yttrium iron garnet thin films fabricated by mist CVD (2017)
  • Author(s): Li Liu, Yuta Suwa, Shota Sato, Yoshiaki Nakasone, Misaki Nishi, Giang T. Dang, Ellawala K. C. Pradeep, and Toshiyuki Kawaharamura
  • Journal Title: Jpn. J. Appl. Phys. Volume: 56 Issue: 4S Pages: 04CJ02-04CJ02
  • DOI: 10.7567/jjap.56.04cj02
  • NAID: 210000147625
  • Peer Reviewed
• [Journal Article] Zinc tin oxide metal semiconductor field effect transistors and their improvement under negative bias (illumination) temperature stress (2017)
  • Author(s): G. T. Dang, T. Kawaharamura, M. Furuta, and M. W. Allen
  • Journal Title: Appl. Phys. Lett. Volume: 110 Issue: 7 Pages: 073502-073502
  • DOI: 10.1063/1.4976196
  • Peer Reviewed / Int'l Joint Research
• [Journal Article] Single-step simple solvothermal synthetic approach to ultra-fine MgO nanocrystals using high-temperature and high-pressure acetonitrile (2017)
  • Author(s): Ellawala K. C. Pradeep, Masataka Ohtani, Toshiyuki Kawaharamura, and Kazuya Kobiro
  • Journal Title: Chem. Lett. Volume: 46 Issue: 7 Pages: 940-943
  • DOI: 10.1246/cl.170185
  • NAID: 130005709513
  • Peer Reviewed
• [Journal Article] Atmospheric-Pressure Epitaxial Growth Technique of a Multiple Quantum Well by Mist Chemical Vapor Deposition based on Leidenfrost droplets (2016)
  • Author(s): Toshiyuki Kawaharamura, Giang T. Dang, Noriko Nitta
  • Journal Title: Appl. Phys. Lett. Volume: 109 Issue: 15 Pages: 151603-151603
  • DOI: 10.1063/1.4964647
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Atmospheric growth of hybrid ZnO thin films for inverted polymer solar cells (2016)
  • Author(s): Chandan Biswas, Zhu Ma, Xiaodan Zhu, Toshiyuki Kawaharamura, Kang L. Wang
  • Journal Title: Solar Energy Materials and Solar Cells Volume: 157 Pages: 1048-1056
  • DOI: 10.1016/j.solmat.2016.08.022
  • Peer Reviewed / Int'l Joint Research
• [Journal Article] Silver Oxide Schottky Contacts and Metal Semiconductor Field-Effect Transistors on SnO2 thin films (2016)
  • Author(s): Giang T. Dang, Takayuki Uchida, Toshiyuki Kawaharamura, Mamoru Furuta, Adam R. Hyndman, Rodrigo Martinez, Shizuo Fujita, Roger J. Reeves, Martin W. Allen
  • Journal Title: Applied Physics Express Volume: 9 Issue: 4 Pages: 041101-041101
  • DOI: 10.7567/apex.9.041101
  • NAID: 210000137840
  • Peer Reviewed / Int'l Joint Research
• [Journal Article] Transparent conductive zinc-oxide-based films grown at low temperature by mist chemical vapor deposition (2015)
  • Author(s): Shirahata Takahiro, Kawaharamura Toshiyuki, Fujita Shizuo, Orita Hiroyuki
  • Journal Title: Thin Solid Films Volume: 597 Pages: 30-38
  • DOI: 10.1016/j.tsf.2015.11.006
  • Peer Reviewed
• [Journal Article] Atmospheric and Aqueous Deposition of Polycrystalline Metal Oxides Using Mist-CVD for Highly Efficient Inverted Polymer Solar Cells (2015)
  • Author(s): Xiaodan Zhu, Toshiyuki Kawaharamura, Adam Z Stieg, Chandan Biswas, Lu Li, Zhu Ma, Mark A. Zurbuchen, Qibing Pei, Kang L Wang
  • Journal Title: Nano Letters Volume: 15 Issue: 8 Pages: 4948-4954
  • DOI: 10.1021/acs.nanolett.5b01157
  • Peer Reviewed / Int'l Joint Research
• [Journal Article] Stability of In-Ga-Zn-O metal-semiconductor field-effect-transistors under bias, illumination, and temperature stress (2015)
  • Author(s): Giang T. Dang, Toshiyuki Kawaharamura, Mamoru Furuta, Saurabh Saxena, Martin W. Allen
  • Journal Title: Appl. Phys. Lett. Volume: 107 Issue: 14 Pages: 143504-143504
  • DOI: 10.1063/1.4931960
  • Peer Reviewed / Int'l Joint Research
• [Journal Article] Metal-Semiconductor Field-Effect Transistors With In-Ga-Zn-O Channel Grown by Nonvacuum-Processed Mist Chemical Vapor Deposition (2015)
  • Author(s): Giang T. Dang, Toshiyuki Kawaharamura, Mamoru Furuta, Martin W. Allen
  • Journal Title: IEEE Electron Device Letters Volume: 36 Issue: 5 Pages: 463-465
  • DOI: 10.1109/led.2015.2412124
  • Peer Reviewed / Int'l Joint Research
• [Journal Article] Mist-CVD Grown Sn-Doped α-Ga2O3 MESFETs (2015)
  • Author(s): Giang T. Dang, Toshiyuki Kawaharamura, Mamoru Furuta, Martin W. Allen
  • Journal Title: IEEE Transactions on Electron Devices Volume: 62 Issue: 11 Pages: 3640-3644
  • DOI: 10.1109/ted.2015.2477438
  • Peer Reviewed / Int'l Joint Research
• [Presentation] 時間的・空間的隔たり産み出すミスト流を用いた新反応制御技術の開発 (2017)
  • Author(s): 川原村 敏幸, 鄧 太 江, 劉 麗;, E.K.C. プラディープ, 龍田 宗孝, 古田 守, 須和 祐太, 佐藤 翔太, 中曽根 義晃, 山沖 駿友, 西 美咲, 小林 勇亮, 坂本 雅仁, ルトンジャン ピモンパン
  • Organizer: 第64回応用物理学会春季学術講演会
  • Place of Presentation: 横浜パシフィコ, 横浜市, 神奈川
  • Year and Date: 2017-03-17
• [Presentation] ミストCVD法における高品質金属酸化物薄膜作製を目的とした反応メカニズム解析(Ⅰ) (2017)
  • Author(s): 西 美咲, 須和 祐太, 劉 麗, ルトンジャン ピモンパン, ジャン ダン, 川原村 敏幸
  • Organizer: 第64回応用物理学会春季学術講演会
  • Place of Presentation: 横浜パシフィコ, 横浜市, 神奈川
  • Year and Date: 2017-03-14
• [Presentation] Properties of corundum structure α-(CrxGa1-x)2O3 and α-(AlxGa1-x)2O3 thin films grown via Mist CVD (2017)
  • Author(s): G. T. Dang, T. Kawaharamura
  • Organizer: The 8th International Conference on Advanced Materials & Nanotechnology
  • Place of Presentation: Queenstown, New Zealand
  • Year and Date: 2017-02-12
  • Int'l Joint Research
• [Presentation] A Fine Channel Reactor as Novel Multi-Purpose Tool for Continuous Uniform Nano-Fabrication (2017)
  • Author(s): Ellawala K. C. Pradeep, Phimolphan Rutthongjan, Shota Sato, Masahito Sakamoto, Li Liu, Giang T. Dang, Toshiyuki Kawaharamura
  • Organizer: The 4th International Conference on Nanoscience and Nanotechnology -2017 (ICNSNT-2017)
  • Int'l Joint Research
• [Presentation] Study on the Effect of Solvents on Fabricating ZnO Thin Films by Solution-Based Mist Chemical Vapor Deposition (2017)
  • Author(s): Misaki Nishi, Li Liu, Phimolphan Rutthongjan, Shota Sato, Masahito Sakamoto, Yusuke Kobayashi, Mariko Ueda, Ellawala K. C. Pradeep, Giang T. Dang, Toshiyuki Kawaharamura
  • Organizer: 2017 MRS Fall Meeting & Exhibit
  • Int'l Joint Research
• [Presentation] Fabrication on Yttrium Oixde Thin Film with High Dielectric Constant by Solution-Based Mist Chemical Vapor Deposition (2017)
  • Author(s): Li Liu, Misaki Nishi, Phimolphan Rutthongjan, Shota Sato, Masahito Sakamoto, Yusuke Kobayashi, Ellawala K. C. Pradeep, Giang T. Dang, Toshiyuki Kawaharamura
  • Organizer: 2017 MRS Fall Meeting & Exhibit
  • Int'l Joint Research
• [Presentation] Development of α-Ga2O3-based high power devices (2017)
  • Author(s): Giang T. Dang, Toshiyuki Kawaharamura,
  • Organizer: 6th International Symposium on Frontier Technology (ISFT 2017)
  • Int'l Joint Research
• [Presentation] The effect of Mist CVD growth temperature to ZnMgO thin-film properties on ZnO buffer layer (2017)
  • Author(s): Phimolphan Rutthongjan, Li Liu, Nishi Misaki, Masahito Sakamoto, Shota Sato, Ellawala K. C. Pradeep, Giang T. Dang, Toshiyuki Kawaharamura
  • Organizer: 6th International Symposium on Frontier Technology (ISFT 2017)
  • Int'l Joint Research
• [Presentation] Composition Control of ZnMgO Thin-films by Mist Chemical Vapor Deposition (2017)
  • Author(s): P. Rutthongjan, L. Liu, M. Nishi, M. Sakamoto, S. Sato, E. K. C. Pradeep, G. T. Dang, T. Kawaharamura,
  • Organizer: Solid State Devices and Materials (SSDM 2017)
  • Int'l Joint Research
• [Presentation] Study on Fabrication of Yttrium Oxide Thin Films Using Mist CVD (2017)
  • Author(s): L. Liu, M. Nishi, S. Sato, P. Rutthongjan, M. Sakamoto, Y. Kobayashi, G. T. Dang, E. K. C. Pradeep, T. Kawaharamura
  • Organizer: Solid State Devices and Materials (SSDM 2017)
  • Int'l Joint Research
• [Presentation] Study on the Influence Factors of Antimony Doped Tin Oxide Thin Films With High Conductivity Deposited via Mist CVD (2017)
  • Author(s): L. Liu, T. Kawaharamura, T. Uchida, S. Fujita, H. Orita, H. Kobayashi,
  • Organizer: Solid State Devices and Materials (SSDM 2017)
  • Int'l Joint Research
• [Presentation] 時間的・空間的隔たり産み出すミスト流を用いた新反応制御技術の開発3 (2017)
  • Author(s): 川原村 敏幸, ルトンジャン ピモンパン, 劉 麗, 西 美咲, 坂本 雅仁, 佐藤 翔太, 上田 真理子, E.K.C. プラディープ, 鄧 太 江
  • Organizer: 第65回応用物理学会春季学術講演会
• [Presentation] FC式ミストCVDにおける高品質金属酸化物薄膜作製を目的とした反応メカニズム解析(Ⅱ) (2017)
  • Author(s): 西 美咲, 劉 麗, 佐藤 翔太, ルトンジャン ピモンパン, 坂本 雅仁, 上田 真理子, E.K.C. プラディープ, 鄧 太 江, 川原村 敏幸
  • Organizer: 第65回応用物理学会春季学術講演会
• [Presentation] ミストCVD法における金属化合物と反応場雰囲気の影響 (2017)
  • Author(s): 坂本 雅仁, 川原村 敏幸
  • Organizer: 第65回応用物理学会春季学術講演会
• [Presentation] ミストCVDにより作製した二硫化モリブデン(MoS2)薄膜の特性評価 (2017)
  • Author(s): 佐藤 翔太, 坂本 雅仁, 新田 紀子, 劉 麗, E. K. C. プラディープ, 鄧 太 江, 川原村 敏幸
  • Organizer: 第65回応用物理学会春季学術講演会
• [Presentation] Water-Supporting Fabrication of Yttrium Oxide (YOx) Thin Films by Mist CVD (2017)
  • Author(s): Li Liu, Misaki Nishi, Masahito Sakamoto, Shota Sato, Phimolphan Rutthongjan, Yusuke Kobayashi, Ellawala K. C. Pradeep, Giang Thai Dang, and Toshiyuki Kawaharamura
  • Organizer: ナノテク研シンポジウム
• [Presentation] Investigation on the composition ratio via ZnMgO thin film fabrication by mist CVD (2017)
  • Author(s): Phimolphan Rutthongjan, Li Liu, Misaki Nishi, Masahito Sakamoto, Shota Sato, Ellawala K.C. Pradeep, Giang Thai Dang, and Toshiyuki Kawaharamura
  • Organizer: ナノテク研シンポジウム
• [Presentation] 金属化合物の熱分解時における水の効果 (2017)
  • Author(s): Masahito Sakamoto, Li Liu, Shota Sato, Phimolphan Rutthongjan, Misaki Nishi, Yusuke Kobayashi, Mariko ueda, Ellawala K. C. Pradeep, Giang Thai Dang and Toshiyuki Kawaharamura
  • Organizer: ナノテク研シンポジウム
• [Presentation] ミストCVDにおける高品質金属酸化物薄膜作製を目的とした反応メカニズム解析 (2017)
  • Author(s): 西 美咲, Li Liu, Phimolphan Rutthongjan, 佐藤 翔太, 坂本 雅仁, 小林 勇亮, 上田 真理子, Ellawala K. C. Pradeep, Giang Thai Dang, 川原村 敏幸
  • Organizer: ナノテク研シンポジウム
• [Presentation] ミストCVDによるSn系透明導電膜の作製 (2017)
  • Author(s): 上田 真理子, 劉 麗, 佐藤 翔太, Phimolphan Rutthongjan, 西 美咲, 坂本 雅仁, 小林 勇亮, Ellawala K. C. Pradeep, Giang Thai Dang, 川原村 敏幸
  • Organizer: ナノテク研シンポジウム
• [Presentation] 気相中を流動する微小液滴の挙動観測 (2017)
  • Author(s): 宮地 啓太, 秦 暦, 岡田 雄哉, 中村 衛典, 西村 一宏, 佐藤 翔太, 川原村 敏幸
  • Organizer: ナノテク研シンポジウム
• [Presentation] 高温壁近傍における液滴挙動を表すモデル式の再検討 (2017)
  • Author(s): 秦 暦, 宮地 啓太, 岡田 雄哉, 中村 衛典, 西村 一宏, 佐藤 翔太, 川原村 敏幸
  • Organizer: ナノテク研シンポジウム
• [Presentation] 時間的・空間的隔たり産み出すミスト流を用いた新反応制御技術の開発2 (2017)
  • Author(s): 川原村 敏幸, ルトンジャン ピモンパン, 劉 麗, 西 美咲, 坂本 雅仁, 小林 勇亮, E.K.C. プラディープ, 鄧 太江, 佐藤 翔太, 山沖 駿友, 中曽根 義晃, 上田 真理子
  • Organizer: 第78回応用物理学会秋季学術講演会
• [Presentation] Study on the Effect of Solvents on Fabricating ZnO Thin Films By Solution-based Mist Chemical Vapor Deposition (2017)
  • Author(s): Misaki Nishi, Li Liu, Phimolphan Rutthongjan, Shota Sato, Masahito Sakamoto, Yusuke Kobayashi, Mariko Ueda, Ellawala K. C. Pradeep, Giang Thai Dang, Toshiyuki Kawaharamura
  • Organizer: 第36回電子材料シンポジウム, 36th Electronic Materials Symposium (EMS-36)
• [Presentation] The Effect of Mist on the Fabrication of Metal Oxide thin films (2017)
  • Author(s): Masahito Sakamoto, Li Liu, Shota Sato, Phimolphan Rutthongjan, Misaki Nishi, Yusuke Kobayashi, Mariko ueda, Ellawala K. C. Pradeep, Giang Thai Dang, Toshiyuki Kawaharamura
  • Organizer: 第36回電子材料シンポジウム, 36th Electronic Materials Symposium (EMS-37)
• [Presentation] Properties of Molybdenum Disulfide (MoS2) Thin Film Fabricated by Mist CVD (2017)
  • Author(s): Shota Sato, Masahito Sakamoto, Dang T. Giang, E. K. C. Pradeep, Liu Li, Phimolphan Rutthongjan, Yusuke Kobayashi, Mariko Ueda, Toshiyuki Kawaharamura
  • Organizer: 第36回電子材料シンポジウム, 36th Electronic Materials Symposium (EMS-38)
• [Presentation] ミストCVD法による高品質なZnO成膜への挑戦 (2016)
  • Author(s): 西美咲, 劉 麗;, 須和 祐太, 鄧 太 江, 川原村 敏幸
  • Organizer: ナノテク研シンポジウム2016
  • Place of Presentation: 高知工科大学 永国寺キャンパス, 高知市, 高知
  • Year and Date: 2016-11-12
• [Presentation] Fabrication of Y2O3 thin film by mist CVD (2016)
  • Author(s): Li Liu, M. Nishi, E.K.C. Pradeep, G.T. Dang, Y. Suwa, T. Kawaharamura
  • Organizer: ナノテク研シンポジウム2016
  • Place of Presentation: 高知工科大学 永国寺キャンパス, 高知市, 高知
  • Year and Date: 2016-11-12
• [Presentation] Synthesis of morphology controlled mixed metal oxide nanomaterials (2016)
  • Author(s): Ellawala K. C. Pradeep, M. Ohtani, T. Kawaharamura, K. Kobiro
  • Organizer: ナノテク研シンポジウム2016
  • Place of Presentation: 高知工科大学 永国寺キャンパス, 高知市, 高知
  • Year and Date: 2016-11-12
• [Presentation] ミストCVD法による二硫化モリブデン(MoS2)薄膜の作製と特性評価 (2016)
  • Author(s): 佐藤翔太, G.T. Dang, 坂本雅仁, 川原村 敏幸
  • Organizer: ナノテク研シンポジウム2016
  • Place of Presentation: 高知工科大学 永国寺キャンパス, 高知市, 高知
  • Year and Date: 2016-11-12
• [Presentation] ミストCVD法による酸化インジウム亜鉛薄膜の成膜速度制御制の向上 (2016)
  • Author(s): 龍田宗孝, 川原村 敏幸, 古田守
  • Organizer: ナノテク研シンポジウム2016
  • Place of Presentation: 高知工科大学 永国寺キャンパス, 高知市, 高知
  • Year and Date: 2016-11-12
• [Presentation] Fabrication of MoS2 Thin Film at Low Temperature By Atmospheric-Pressure Solution Based (2016)
  • Author(s): S. Sato, T. Kawaharamura
  • Organizer: PRiME 2016
  • Place of Presentation: the Hilton Hawaiian Village and the Hawaii Convention Center, Honolulu, Hawaii, USA
  • Year and Date: 2016-10-05
  • Int'l Joint Research
• [Presentation] Preparation of IGZO Thin Layer by a Low-temperature Non-vacuum Technique (2016)
  • Author(s): E.K.C. Pradeep, G.T. Dang, M. Ohtani, K. Kobiro, T. Kawaharamura
  • Organizer: Solid State Devices and Materials (SSDM 2016)
  • Place of Presentation: Tsukuba International Congress Center, Tsukuba, Ibaraki, Japan
  • Year and Date: 2016-09-28
  • Int'l Joint Research
• [Presentation] Fabricating High Quality YIG Thin Film by Mist CVD under Open-Air Atmospheric Pressure (2016)
  • Author(s): L. Liu, Y. Suwa, Y. Nakasone, M. Nishi, E.K.C. Pradeep, T. Kawaharamura
  • Organizer: Solid State Devices and Materials (SSDM 2016)
  • Place of Presentation: Tsukuba International Congress Center, Tsukuba, Ibaraki, Japan
  • Year and Date: 2016-09-28
  • Int'l Joint Research
• [Presentation] 狭差二平板間における微小液滴の挙動II (2016)
  • Author(s): 松崎俊介, 太田垣知輝, 高木耕平, 川原村敏幸
  • Organizer: 日本機械学会2016年度年次大会
  • Place of Presentation: 九州大学 伊都キャンパス, 福岡市, 福岡
  • Year and Date: 2016-09-14
• [Presentation] ミストを用いた大気圧下で大面積に亘り高品質な機能薄膜を作製する技術の開発 (2016)
  • Author(s): 川原村 敏幸, G.T. Dang, 須和 祐太, 佐藤 翔太, 松﨑 俊祐
  • Organizer: 化学工学会 第48回秋季大会
  • Place of Presentation: 徳島大学, 徳島市, 徳島
  • Year and Date: 2016-09-06
  • Invited
• [Presentation] Fabrication of cuprate superconductor thin film by mist CVD (2016)
  • Author(s): Y. Nakasnone, Y. Suwa, Toshiyuki Kawaharamura
  • Organizer: 35th Electronic Materials Symposium (EMS-35)
  • Place of Presentation: ラフォーレ琵琶湖, 守山, 滋賀
  • Year and Date: 2016-07-08
• [Presentation] Simple solvothermal synthetic approach to spherical Al2O3-TiO2 and ZnO-TiO2 composite nanoassemblies (2016)
  • Author(s): E. K. C. Pradeep, M. Ohtani, T. Kawaharamura, K. Kobiro
  • Organizer: 35th Electronic Materials Symposium (EMS-35)
  • Place of Presentation: ラフォーレ琵琶湖, 守山, 滋賀
  • Year and Date: 2016-07-08
• [Presentation] Fabricating high quality YIG thin film by mist CVD under open-air atmospheric pressure (2016)
  • Author(s): L. Liu, Y. Suwa, Y. Nakasone, M. Nishi, E. K. C. Pradeep and T. Kawaharamura
  • Organizer: 35th Electronic Materials Symposium (EMS-35)
  • Place of Presentation: ラフォーレ琵琶湖, 守山, 滋賀
  • Year and Date: 2016-07-08
• [Presentation] Fabrication of molybdenum disulfide (MoS2) thin film at low temperature under atmospheric pressure by mist CVD (2016)
  • Author(s): Shota Sato, Toshiyuki Kawaharamura
  • Organizer: 35th Electronic Materials Symposium (EMS-35)
  • Place of Presentation: ラフォーレ琵琶湖, 守山, 滋賀
  • Year and Date: 2016-07-06
• [Presentation] Development of Innovative Atmospheric-Pressure Epitaxial Growth Technique “Mist Chemical Vapor Deposition (2016)
  • Author(s): T. Kawaharamura
  • Organizer: Gloval Forum on Advanced Materials and Technologies for Sustainable Development 2016
  • Place of Presentation: the Toronto Marriott Downtown Eaton Centre Hotel, Toronto, Canada
  • Year and Date: 2016-06-28
  • Int'l Joint Research / Invited
• [Presentation] 大気圧下における高品質薄膜作製のための高度制御技術 (2016)
  • Author(s): 川原村 敏幸
  • Organizer: エネルギー・環境新技術先導プログラム「高品質/高均質薄膜を実現する非真空成膜プロセスの研究開発」シンポジウム ～ミストデポジション法の科学と応用～
  • Place of Presentation: 京都リサーチパーク, 京都市, 京都
  • Year and Date: 2016-01-18
  • Invited
• [Presentation] High-Crystalline Corundum In2O3 Thin Film Fabricated by Mist Chemical Vapor Deposition (2015)
  • Author(s): Yuta Suwa, Toshiyuki Kawaharamura
  • Organizer: 2015 MRS Fall Meeting & Exhibit
  • Place of Presentation: Hynes Convention Center, Boston, Massachusetts, USA
  • Year and Date: 2015-12-02
  • Int'l Joint Research
• [Presentation] Physics on development of open-air atmospheric pressure thin film fabrication technique using mist droplets: Control of precursor flow (2015)
  • Author(s): 川原村 敏幸
  • Organizer: 第76回応用物理学会秋季学術講演会
  • Place of Presentation: 名古屋国際会議場
  • Year and Date: 2015-09-15
  • Invited
• [Presentation] Fabrication Challenge of Quantum Devices by Mist CVD with Highly-Controlled Fluid Technology under Atmospheric Pressure (2015)
  • Author(s): Tosihyuki Kawaharamura
  • Organizer: The 2nd Annual International Conference on Nanoscience and Nanotechnology -2015 (ICNSNT-2015)
  • Place of Presentation: Hotel Garadari, Colombo, Sri Lanka
  • Year and Date: 2015-09-04
  • Int'l Joint Research
• [Presentation] Fabrication and Characterization of Corundum-type Indium Oxide (rh-In2O3) thin film by Mist Chemical Vapor Deposition (2015)
  • Author(s): Yuta Suwa, Toshiyuki Kawaharamura
  • Organizer: 第34回電子材料シンポジウム, 34th Electronic Materials Symposium (EMS-34)
  • Place of Presentation: ラフォーレ琵琶湖, 守山, 滋賀
  • Year and Date: 2015-07-15
• [Presentation] Fabrication of Functional Thin Films and Electrical Devices by Mist CVD Equipping Highly Accurate Flow Control Technology under Atmospheric Pressure (2015)
  • Author(s): Toshiyuki Kawaharamura, Giang T. Dang, Takayuki Uchida, Mamoru Furuta, Noriko Nitta, Tadahiro Kaida, Yuta Suwa, Munetaka Tatsuda, Martin W. Allen, and Shizuo Fujita
  • Organizer: 2015 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD 2015)
  • Place of Presentation: Jeju, Korea
  • Year and Date: 2015-06-30
  • Int'l Joint Research / Invited
• [Remarks] 高品質な機能性薄膜の作製を実現する 非真空プロセスの開発
  • URL: https://www.kochi-tech.ac.jp/power/research/post_14.html
• [Remarks] 川原村 敏幸 准教授の研究が日経テクノロジーonlineに取り上げられました
  • URL: https://www.kochi-tech.ac.jp/news/2017/003283.html
• [Remarks] 非真空IGZO成膜の実現なるか、ミストCVDの可能性
  • URL: http://techon.nikkeibp.co.jp/atcl/column/15/040400109/040900002/?rt=nocnt
• [Remarks]
  • URL: http://www.nano.kochi-tech.ac.jp/tosiyuki/index.html
• [Patent(Industrial Property Rights)] 深紫外発光素子およびその製造方法 (2017)
  • Inventor(s): 川原村 敏幸、鄧 太 江、須和 祐太、小島 一信、秩父 重英
  • Industrial Property Rights Holder: 高知工科大学
  • Industrial Property Rights Type: 特許
  • Filing Date: 2017