development of ionic charge, electron density, and electron temperature measurement system for soft-X ray light sources

• Project/Area Number: 15H05472
• Research Category: Grant-in-Aid for Young Scientists (A)
• Allocation Type: Single-year Grants
• Research Field: Plasma science
• Research Institution: Kyushu University
• Principal Investigator: Tomita Kentaro 九州大学, 総合理工学研究院, 助教 (70452729)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Project Status: Completed (Fiscal Year 2017)
• Budget Amount: ¥22,620,000 (Direct Cost: ¥17,400,000、Indirect Cost: ¥5,220,000); Fiscal Year 2017: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000); Fiscal Year 2016: ¥5,720,000 (Direct Cost: ¥4,400,000、Indirect Cost: ¥1,320,000); Fiscal Year 2015: ¥13,650,000 (Direct Cost: ¥10,500,000、Indirect Cost: ¥3,150,000)
• Keywords: 軟X線光源用プラズマ / トムソン散乱 / レーザー生成プラズマ / 電子密度 / 電子温度 / 平均イオン価数 / 難X線光源用プラズマ / 協同トムソン散乱 / 電子密度・電子温度 / イオン価数 / 軟X線光源 / プラズマ軟X線光源 / イオン価数計測

Outline of Final Research Achievements

Soft X-ray light source have been used for various applications, such as extreme-ultraviolet(EUV) light sources (wavelength 13.5 nm) for next-generation semiconductor lithography system and water-window light sources (wavelength 2.3-4.4 nm), Laser-produced plasma is an attractive candidate for the Sof X-ray light source, because the plasma can be easily produced by table-top laser system. In order to optimize the plasma as the soft-X-ray light sources, to measure and control fundamental plasma parameters, such as averaged ionic charge state (Z), electron density (ne), and electron temperature (Te) are prerequisite. We have developed a new measurement system to obtain these plasma parameters. In our system, both ion and electron feature spectra of collective Thomson scattering have been observed simultaneously. From these spectra, it is possible to determine Z, ne, and Te.

Research Products

• [Presentation] Two-dimensional profiles of electron density and temperature of laser-produced tin microplasmas for extreme-ultraviolet lithography light sources (2017)
  • Author(s): K. Tomita, Y. Sato, S. Tsukiyama, R. Fukada, K. Uchino, T. Yanagida, H. Tomuro, K. Kouge, Y. Wada, M. Kunishima, T. Kodama, H. Mizoguchi
  • Organizer: International Workshop on Microplasmas (IWM2017), Garmisch-Partenkirchen, Germany
  • Int'l Joint Research / Invited
• [Presentation] Two-dimensional electron density and temperature profiles of EUV light sources with 4.0% CE (2017)
  • Author(s): K. Tomita, Y. Sato, S. Tsukiyama, R. Fukada, K. Uchino, T. Yanagida, H. Tomuro, K. Kouge, Y. Wada, M. Kunishima, T. Kodama, H. Mizoguchi
  • Organizer: nternational workshop on EUV and Soft X-ray sources (2017 source workshop), Dublin, Ireland
  • Int'l Joint Research / Invited
• [Presentation] Diagnostics of extreme-ultraviolet (EUV) light source plasmas for next generation semiconductor lithography (2017)
  • Author(s): K. Tomita, Y. Sato, S. Tsukiyama, R. Fukada, K. Uchino, T. Yanagida, H. Tomuro, K. Kouge, Y. Wada, M. Kunishima, T. Kodama, H. Mizoguchi
  • Organizer: International Symposiumu in 27th Annual Meeting of MRS-J, Yokohama
  • Int'l Joint Research / Invited
• [Presentation] 軟X線光源用多価電離プラズマの協同トムソン散乱計測 (2017)
  • Author(s): 佐藤 祐太、江口 寿明、築山 昌一、深田 来夢、富田 健太郎、内野 喜一郎
  • Organizer: 応用物理学会春季学術講演会
  • Place of Presentation: パシフィコ横浜、神奈川
• [Presentation] 協同的トムソン散乱によるレーザー生成EUV光源プラズマの電子密度・電子温度・イオン価数計測 (2016)
  • Author(s): 富田 健太郎，佐藤 祐太，江口寿明，内野 喜一郎，柳田 達哉，戸室 弘明，和田 靖典，國島 正人， 児玉 健，溝口 計
  • Organizer: 第３６回レーザー学会年次大会
  • Place of Presentation: 名城大学、愛知
  • Year and Date: 2016-01-09
  • Invited
• [Presentation] Studies of Laser-produced Tin plasmas for EUV Light Sources using Collective Thomson Scattering (2015)
  • Author(s): K. Tomita, Y. Sato, T. Eguchi, S. Tsukiyama, K. Uchino, T. Yanagida, H. Tomuro, Y. Wada, M. Kunishima, T. Kodama, H. Mizoguchi
  • Organizer: 2015 International workshop on EUV and Soft X-ray sources
  • Place of Presentation: Dublin, Ireland
  • Year and Date: 2015-11-10
  • Int'l Joint Research / Invited