Development of High Precision Profiler
Project/Area Number |
16360073
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Production engineering/Processing studies
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Research Institution | High Energy Accelerator Research Organization (KEK) |
Principal Investigator |
HIGASHI Yasuo High Energy Accelerator Organization, Assistant professor, 機械工学センター, 助教授 (70208742)
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Co-Investigator(Kenkyū-buntansha) |
UENO Kenji High Energy Accelerator Organization, Assistant Professor, 機械工学センター, 教授 (40370069)
KUME Tatsuya High Energy Accelerator Organization, Assistant Engineer, 機械工学センター, 助手 (40353362)
ENAMI Kazuhiro High Energy Accelerator Organization, Assistant Engineer, 機械工学センター, 助手 (00370073)
ENDO Katuyoshi Graduate of Osaka University, Assistant Professor, 大学院・工学研究科, 教授 (90152008)
YAMAUCHI Kazuto Graduate of Osaka University, Professor, 大学院・工学研究科, 教授 (10174575)
森 勇蔵 大阪大学, 大学院・工学研究科, 客員教授 (00029125)
山村 和也 大阪大学, 大学院・工学研究科, 助教授 (60240074)
佐野 恭久 大阪大学, 大学院・工学研究科, 助教授 (40252598)
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Project Period (FY) |
2004 – 2005
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Project Status |
Completed (Fiscal Year 2005)
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Budget Amount *help |
¥14,200,000 (Direct Cost: ¥14,200,000)
Fiscal Year 2005: ¥4,200,000 (Direct Cost: ¥4,200,000)
Fiscal Year 2004: ¥10,000,000 (Direct Cost: ¥10,000,000)
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Keywords | Synchrotron radiation optics / EUV / surface figuring / slope error / normal vector / goniometers / asymmetric aspheric figure / 放射光 / 集効用ミラー / 非球面形状 / 法線ベクトル計測 / 非基準面 / 大型ミラー / X線光学素子 / 非球面ミラー / 法線ベクトル測定 / 基準面 |
Research Abstract |
A new ultra-precision profiler has been developed in order to measure such as asymmetric and aspheric profiles. In the present study, the normal vectors at each points on the surface are determined by the reflected light beam goes back exactly on the same path as the incident beam. The surface gradients at each point are calculated from the normal vector and the surface profile is obtained by integrating the gradient. The measuring instrument was designed according to the above principle of the measuring method. In the design, four ultra-precision goniometers were applied to the adjustment of the light axis for the normal vector measurement. The angle positioning resolution and accuracy of each goniometer are respectively 0.018μrad and 0.2μrad. In the measuring instrument, the most important item is the measuring accuracy of the normal vectors by the goniometers. Therefore, the rotating angle positioning errors were measured and calibrated. A SiC flat mirror 25.4mm in diameter and an elliptical profile mirror for nanometer hard X-ray focusing were measured. and compared to the measured profile using a Zygo Mark IVxp phase-measuring interferometer. The absolute measurement accuracy of approximately 5 nm (peak-to-valley) was achieved. Then the measurement of a spherical shape and 460mm, 1m long plane mirrors were demonstrated.
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Report
(3 results)
Research Products
(16 results)
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[Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics -Calibration of the rotational angle error of the rotary encoders-2006
Author(s)
Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenii Ueno, Yuzo mori
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Journal Title
SR12006, Proc. of the Ninth International Conference on Synchrotron Radiation Instrumentation, May28-June2, 2006, DAEGU, EXCO, KOREA (In printing)
Description
「研究成果報告書概要(和文)」より
Related Report
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[Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics2006
Author(s)
Yasuo Higashi, Yuichi Takaie, Katsuyoshi Endo, Tatsuya Kume, Kazuhiro Enami, Kazuto Yamauchi, Kazuya Yamamura, Yasuhisa Sano, Kenii Ueno, Yuzo mori
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Journal Title
SR12006, Proc. of the Ninth International Conference on Synchrotron Radiation Instrumentation, May28-June2, 2006, DAEGU, EXCO, KOREA (In printing)
Description
「研究成果報告書概要(和文)」より
Related Report
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[Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics-Calibration of the rotational angle error of the rotary encoders-2006
Author(s)
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
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Journal Title
SR12006, Proc.of the Ninth International Conference on Synchrotron Radiation Instrumentation (May28-June2, 2006, DAEGU, EXCO, KOREA)
Description
「研究成果報告書概要(欧文)」より
Related Report
-
[Journal Article] Surface Gradient Integrated Profiler for X-ray and EUV Optics2006
Author(s)
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
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Journal Title
SR12006, Proc.of the Ninth International Conference on Synchrotron Radiation Instrumentation (May28-June2, 2006, DAEGU, EXCO, KOREA)
Description
「研究成果報告書概要(欧文)」より
Related Report
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[Journal Article] A New Designed Ultra-high Precision Profiler2006
Author(s)
Y.HIGASHI^a, Y.TAKAIE^b, K.ENDO^b, T.KUME^a, K.ENAMI^a, K.YAMAUCHI^c, K.YAMAMURA^c, H.SANO^c, K.UENO^a, Y.MORI^c
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Journal Title
Proc of SPIE : Advances in Mirror Technology for X-ray, EUV Lithography, laser, and Other Applications, 3 August 2005, Sandiego, CA, USA Vol.# 5921(In printing)
Related Report
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[Journal Article] A New Designed Ultra-high Precision Profiler - Study on Slope Error Measurement of a Mandrel for Wolter type-I mirror Fabrication -2006
Author(s)
Yasuo.HIGASHI^<*a>.Yuichi.TAKAIE^b, Katsuyoshi.ENDO^b, Tatsuya.KUME^a, Kazuhiro.ENAMI^a, Kazuto.YAMAUCHI^c, Kazuya.YAMAMURA^c, Toshihisa.SANO^c, Kenji.UENO^a, Yuzo.MORI^c
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Journal Title
Proc.Of the 8^<th> International Conference on X-ray Microscopy ; 26-30, July, at Egret Himeji 2006.6月発行(In printing)
Related Report
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[Journal Article] A new Designed High-Precision Profiler2005
Author(s)
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
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Journal Title
SPIE Annual Meeting (Opto photonics) Proceedings, San Diego, USA, in printing (2005) (In printing)
Description
「研究成果報告書概要(和文)」より
Related Report
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[Journal Article] A new Designed High-Precision Profiler - Study on Mandrel measurement-2005
Author(s)
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
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Journal Title
XRM2005 International Meeting Proceedings Hirneji, Japan, in printing (2005) (In printing)
Description
「研究成果報告書概要(和文)」より
Related Report
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[Journal Article] A new Designed High-Precision Profiler2005
Author(s)
Y.Higashi, Y.Takaie, K.Endo, T.Kume, K.Enami, K.Yamauchi, K.Yamamura, K.Ueno, Y.Mori
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Journal Title
SPIE Annual Meeting (Opto photonics) Proceedings, San Diego, USA (in printing)
Description
「研究成果報告書概要(欧文)」より
Related Report
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