Project/Area Number |
16560286
|
Research Category |
Grant-in-Aid for Scientific Research (C)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Electronic materials/Electric materials
|
Research Institution | Kochi University of Technology |
Principal Investigator |
KISHIMOTO Seiichi Kochi University of Technology, 総合研究所, 助教授 (90177816)
|
Co-Investigator(Kenkyū-buntansha) |
YAMAMOTO Tetsuya Kochi University of Technology, 工学部, 教授 (30320120)
|
Project Period (FY) |
2004 – 2005
|
Project Status |
Completed (Fiscal Year 2005)
|
Budget Amount *help |
¥3,000,000 (Direct Cost: ¥3,000,000)
Fiscal Year 2005: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 2004: ¥1,400,000 (Direct Cost: ¥1,400,000)
|
Keywords | vapor phase epitaxy / zinc sulfide / Hall effect measurement / doping / co-doping / epitaxial growth / エピタキシャル成長 / 気相成長法 |
Research Abstract |
In order to realize the blue-light-emitting devices, we have investigated the influence of systematically varying of temperature of In source in the range from 550 to 800℃ on N incorporation, microstructures and electrical properties of triple-codoped ZnS thin films. A series of vapor-phase epitaxial ZnS : (Ag,In, and N) films were prepared on semi-insulating GaAs (100) substrates with H_2+NH_3 gas flow. The amount of NH_3 flow varied from 100 to 500 ccm. The Ag source temperature was kept at 950℃. On the basis of the analysis of N profiles obtained by SIMS measurements, an increase in N concentrations with increasing an incorporation of In acceptors and In-reactive donors was deduced. Hall measurements using the Van der Pauws method at room temperature revealed that free hole concentrations and Hall mobility range (1.31-8.76)×10^<18> cm^<-3> and 58.4-80.5 cm^2/Vs, respectively. It was established that the growth conditions with the amount of NH_3 flow varying from 200 to 300 ccm and In source about 650 to 750℃ in temperature are very effective for the realization of good p-type ZnS : (Ag,In,N) with high Hall mobility.
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