Micro and nano-machining of polymer and glass materials using proton beamwriting

• Project/Area Number: 17310085
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Microdevices/Nanodevices
• Research Institution: Shibaura Institute of Technology
• Principal Investigator: NISHIKAWA Hiroyuki Shibaura Institute of Technology, Department of Electrical Engineering, Associate Professor (40247226)
• Co-Investigator(Kenkyū-buntansha): MATSUMURA Kazunari Shibaura Institute of Technology, Department of Materials Science, Lecturer (10348899) ; KAMIYA Tomihiro Japan Atomic Energy Agency, Takasaki Advanced Radiation Research Institute, Assistant Principal Researcher (70370385) ; SATO Takahiro Japan Atomic Energy Agency, Takasaki Advanced Radiation Research Institute, Researcher (10370404) ; ISHII Yasuyuki Japan Atomic Energy Agency, Takasaki Advanced Radiation Research Institute, Assistant Principal Researcher (00343905) ; 酒井 卓郎 日本原子力研究機構, 高崎量子ビーム応用研究所(旧:日本原子力研究所・高崎研究所), 副主任研究員 (70370400)
• Project Period (FY): 2005 – 2007
• Project Status: Completed (Fiscal Year 2007)
• Budget Amount: ¥15,670,000 (Direct Cost: ¥14,500,000、Indirect Cost: ¥1,170,000); Fiscal Year 2007: ¥5,070,000 (Direct Cost: ¥3,900,000、Indirect Cost: ¥1,170,000); Fiscal Year 2006: ¥4,200,000 (Direct Cost: ¥4,200,000); Fiscal Year 2005: ¥6,400,000 (Direct Cost: ¥6,400,000)
• Keywords: proton / polymer / glass / high-aspect-ratio structures / resist / micro, nanostructures / pillar / dielectrophoretic device / 集束プロトンビーム / 微細加工 / マイクロフォトニクス / 導波路 / ナノバイオロジー / バイオセンサー / プロトンビーム / 集束イオン線 / 高速プロトタイピング / ナノバイオセンサ

Research Abstract

Microelectronic and photonics industries need a manufacturing system with flexibility, high precision and a fast prototyping capability. In order to fulfill these requirements, proton beam writing (PBW) will be pursued in the research project. The purpose of this research is to explore the PBW-based flexible micromachining system to demonstrate a fast prototyping capability and its application to t he fabrication of optical, electronic and bio and chemical sensor devices, etc. The technological challenges in this research are three folds. The first challenge is the search for an optimal operation condition of ion source and a focusing system for PBW. Second is the study of materials and processing using PBW. The third challenge is to demonstrate device applications.
We have established the PBW-based lithography techniques on organic and inorganic films for resists by demonstrating the high-as pect-ratio structures as high as 〜20. By the development of the hardware and software involved in the PBW system, 100-nm class be am focusing was achieved. Also, trials to achieve increased beam current, wide area beam scan as large as 10 mm squared area using stages were made. Device applications of high-aspect-ratio microstructures by the PBW to dielectrophoretic devices were demonstrat ed. We have confirmed the functionality of the high-aspect-ratio pillar arrays as electric-micro filters in capturing microbes with a size of several micrometers such as E call and yeast. For applications in the area of micro-photonics, organic and inorganic siloxane films were successfully micro-patterned by PBW.

Research Products

• [Journal Article] Ni electroplating on a resist micro-machined by proton beam writing (2008)
  • Author(s): N.Uchiya, Y.Furuta, H.Nishikawa, T.Watanabe, J.Haga, T.Satoh, M.Oikawa, Y.Ishii, T.Kamiya
  • Journal Title: Microsystem Technologiesオンライン版(Published online:29 January 2008)
  • Description: 「研究成果報告書概要(和文)」より
  • Peer Reviewed
• [Journal Article] Ni electroplating on a resist micro-machined by proton beam writing (2008)
  • Author(s): N., Uchiya, Y., Furuta, H., Nishikawa, T., Watanabe, J., Haga, T., Satoh, M., Oikawa, Y., Ishii, T., Kamiya
  • Journal Title: Microsystem Technologies Published online
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] Ni electroplating on a resist micro-machined by proton beam writing (2008)
  • Author(s): N. Uchiya, Y. Furuta, H. Nishikawa, T. Watanabe, J. Haga, T. Satoh, M. Oikawa, Y. Ishii, T. Kamiya
  • Journal Title: Microsystem Technologiesオンライン版(Published online:29 Janualy 2008)
  • Peer Reviewed
• [Journal Article] Fabrication of three-dimensional structures of resist by proton beam writing (2007)
  • Author(s): Y.Furuta, N.Uchiya, H.Nishikawa, J.Haga, T.Sato, M.Oikawa, Y.Ishii, T.Kamiya
  • Journal Title: Journal of Vacuum Science&Technology B:Microelectronics and Nanometer Structures 25 Pages: 2171-2174
  • Description: 「研究成果報告書概要(和文)」より
  • Peer Reviewed
• [Journal Article] Micro-machining of resists on silicon by proton beam writing (2007)
  • Author(s): N.Uchiya, T.Harada, M.Murai, H.Nishikawa, J.Haga, T.Sato, Y.Ishii and T.Kamiya
  • Journal Title: Nuclear Instruments and Methods in Physics Research B260 Pages: 405-408
  • Description: 「研究成果報告書概要(和文)」より
  • Peer Reviewed
• [Journal Article] Modification of structural and optical properties of silica glass induced by ion microbeam (2007)
  • Author(s): H.Nishikawa, M.Murai, T.Nakamura, Y.Ohki, M.Oikawa, T.Sato, T.Sakai, Y.Ishii, M.Fukuda
  • Journal Title: Surface and Coatings Technology 201 Pages: 8185-8189
  • Description: 「研究成果報告書概要(和文)」より
  • Peer Reviewed
• [Journal Article] Micro-photoluminescence study on defects induced by ion microbeam in silica glass (2007)
  • Author(s): M.Murai, H.Nishikawa, T.Nakamura, H.Aiba, Y.Ohki, M.Oikawa, T.Sato, T.Kamiya
  • Journal Title: Journal of Non-Crystalline Solids 353 Pages: 537-541
  • Description: 「研究成果報告書概要(和文)」より
  • Peer Reviewed
• [Journal Article] 集束プロトンビーム描画による微細加工と型加工への応用(解説) (2007)
  • Author(s): 西川 宏之, 打矢 直之, 古田 祐介, 吉田 栄治, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Journal Title: 成形加工(プラスチック成形加工学会誌) 19 Pages: 276-281
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] 量子ビーム応用最前線,PBWで三次元微細加工の新地平を拓く(解説) (2007)
  • Author(s): 打矢 直之, 古田 祐介, 西川 宏之, 吉田 栄治, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Journal Title: 原子力eye(日刊工業新聞社) 53 Pages: 48-51
  • Description: 「研究成果報告書概要(和文)」より
• [Journal Article] Fabrication of three-dimensional structures of resist by proton beam writing (2007)
  • Author(s): Y., Furuta, N., Uchiya, H., Nishikawa, J., Haga, T., Sato, M., Oikawa, Y., Ishii, T., Kamiya
  • Journal Title: Journal of Vacuum Science & Technology B : Microelectronics and Nanometer Structures 25 Pages: 2171-2174
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] Micro-machining of resists on silicon by proton beam writing (2007)
  • Author(s): N., Uchiya, T., Harada, M., Murai, H., Nishikawa, J., Haga, T., Sato, Y., Ishii, T., Kamiya
  • Journal Title: Nuclear Instruments and Methods in Physics Research B260 Pages: 405-408
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] Micro-photoluminescence study on defects induced by ion microbeam in silica glass (2007)
  • Author(s): H., Nishikavva, M., Murai, T., Nakamura, Y., Ohki, M., Oikawa, T., Sato, T., Sakai, Y., Ishii, M., Fukuda
  • Journal Title: Journal of Non-Crystalline Solids 353 Pages: 537-541
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] Fabrication of three-dimensional structures of resist by proton beam writing (2007)
  • Author(s): Y. Furuta, N. Uchiya, H. Nishikawa, J. Haga, T Sato, M. Oikawa, Y. Ishii, T Kamiya
  • Journal Title: Journal of Vacuum Science&Technology B:Microelectronics and Nanometer Structures 25 Pages: 2171-2174
  • Peer Reviewed
• [Journal Article] Micro-machining of resists on silicon by proton beam writing (2007)
  • Author(s): N. Uchiya, T. Harada, M. Murai, H. Nishikawa, J. Haga, T. Sato, Y. Ishii, T. Kamiya
  • Journal Title: Nuclear Instruments and Methods in Physics Research Section B:Beam Interactions with Materials and Atoms 260 Pages: 405-408
  • Peer Reviewed
• [Journal Article] Modification of structural and optical properties of silica glass induced byion microbeam (2007)
  • Author(s): H. Nishikawa, M. Murai, T. Nakamura, Y. Ohki, M. Oikawa, T. Sato, T. Sakai, Y. Ishii, M. Fukuda
  • Journal Title: Surface and Coatings Technology 201 Pages: 8185-8189
  • Peer Reviewed
• [Journal Article] Micro-photoluminescence study on defects induced by ion microbeam insilica glass (2007)
  • Author(s): M. Murai, H. Nishikawa, T. Nakamura, H. Aiba, Y. Obki, M. Oikawa, T. Sato, T Kamiya
  • Journal Title: Journal of Non-Clystalline Solids 353 Pages: 537-541
  • Peer Reviewed
• [Journal Article] 集束プロトンビーム描画による微細加工と型加工への応用(解説) (2007)
  • Author(s): 西川 宏之、打矢 直之、古田 祐介、吉田 栄治、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕
  • Journal Title: 成形加工(プラスチック成形加工学会誌) 19 Pages: 276-281
• [Journal Article] 量子ビーム応用最前線、PBWで三次元微細加工の新地平を拓く(解説) (2007)
  • Author(s): 打矢 直之、古田 祐介、西川 宏之、吉田 栄治、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕
  • Journal Title: 原子力eye 53 Pages: 48-51
• [Journal Article] Micro-photoluminescence study on defects induced by ion microbeam in silica glass (2007)
  • Author(s): Nasato Murai, Hiroyuki Nishikawa, Tomoharu Nakamura, Hirohiko Aiba, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Tomihiro Kamiya
  • Journal Title: Journal of Non-Crystalline Solids 353・Nos.5-7 Pages: 537-541
• [Journal Article] 集束プロトンビ-ム描画による3次元構造体の作製 (2007)
  • Author(s): 古田 祐介, 打矢 直之, 西川 宏之, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Journal Title: 第54回応用物理学関係連合講演会、講演予稿集論文番号29p-SH-14 No.2 Pages: 780-780
• [Journal Article] Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam (2006)
  • Author(s): H.Nishikawa, K.Fukagawa, T.Nakamura, Y.Ohki, M.Oikawa, T.Kamiya, K.Arakawa
  • Journal Title: Nuclear Instruments and Methods in Physics Research B242 Pages: 437-440
  • Description: 「研究成果報告書概要(和文)」より
  • Peer Reviewed
• [Journal Article] Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam (2006)
  • Author(s): H., Nishikawa, K., Fukagawa, T., Nakamura, Y., Ohki, M., Oikawa, T., Kamiya, K., Arakawa
  • Journal Title: Nuclear Instruments and Methods in Physics Research B242 Pages: 437-440
  • Description: 「研究成果報告書概要(欧文)」より
• [Journal Article] Micro-machining of Resists on Silicon by Proton Beam Writing (2006)
  • Author(s): Naoyuki Uchiya, Takuya Harada, Masato Murai, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Yasuyuki Ishii, Tomihiro Kamiya
  • Journal Title: Abstracts of the 10th International Conference on Nuclear Microprobe Technology and Applications Pages: 189-189
• [Journal Article] Accurate Measurements of Beam Energy Spreads Using a Combination of Nuclear Resonance Reaction and a 0-degree Beam-Line analyzing method (2006)
  • Author(s): Y.Ishii, A.Chiba, J.Haga, K.Mizuhashi, T.Kamiya
  • Journal Title: Abstracts of the 10th International Conference on Nuclear Microprobe Technology and Applications Pages: 213-213
• [Journal Article] 集束プロトンビ-ム描画による厚膜レジストの微細加工 (2006)
  • Author(s): 打矢 直之, 古田 祐介, 西川 宏之, 芳賀 潤二, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Journal Title: 第67回応用物理学会学術講i演会、講演予稿集論文番号31a-RC-9 No.2 Pages: 649-649
• [Journal Article] 集束プロトンビ-ム描画による高アスペクト比微細型加工 (2006)
  • Author(s): 吉田 栄治, 西川 宏之, 打矢 直之, 古田 祐介, 神谷 富裕, 石井 保行, 佐藤 隆博, 及川 将一, 芳賀 潤二
  • Journal Title: 成形加工シンポジア'06第14回プラスチック成形加工学会秋季大会予稿集 Pages: 33-44
  • NAID: 130005028414
• [Journal Article] プロトンマイクロビーム描画によるレジストの微細加工 (2006)
  • Author(s): 打矢直之, 原田卓弥, 西川宏之, 芳賀潤二, 酒井卓郎, 佐藤隆博, 石井保行, 神谷富裕
  • Journal Title: 第53回応用物理学関係連合講演会講演予稿集 論文番号26a-ZB-10 No.2 Pages: 770-770
• [Journal Article] 25p-ZA-10シリカガラスに生じたイオンマイクロビーム誘起変形の熱的安定性 (2006)
  • Author(s): 相場洋彦, 中村知晴, 大木義路, 村井将人, 西川宏之, 及川将一, 佐藤隆博, 荒川和夫
  • Journal Title: 第53回応用物理学関係連合講演会講演予稿集 論文番号25p-ZA-10 No.2 Pages: 962-962
• [Journal Article] Irradiation Effects on Silica Glass by Ion Microbeam for Fabrication of Optical Elements (2005)
  • Author(s): Masato Murai, Kazunari Fukagawa, Hiroyuki Nishikawa, Tomoharu Nakamura, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Kazuo Arakawa
  • Journal Title: Proceedings of 2005 International Symposium on Electrical Insulating Materials, Paper No.B3-7 Pages: 210-213
• [Journal Article] Modification of structural and optical properties of silica glass induced by ion microbeam, (2005)
  • Author(s): H.Nishikawa, M.Murai, T.Nakamura, Y.Ohki, M.Oikawa, T.Sato, T.Sakai, Y.Ishii, M.Fukuda
  • Journal Title: International Conference on Surface Modification of Materials by Ion Beams (SMMIB'05), Paper No.MP-08 Pages: 85-85
• [Journal Article] プロトンマイクロビーム照射によるポリマーの微細加工 (2005)
  • Author(s): 原田卓弥, 打矢直之, 村井将人, 西川宏之, 酒井卓郎, 佐藤隆博, 石井保行, 福田光宏
  • Journal Title: 第66回応用物理学会学術講演会講演予稿集 論文番号9a-ZD-11 No.2 Pages: 629-629
• [Journal Article] プロトンマイクロビーム描画によるレジストの微細加工 (2005)
  • Author(s): 打矢直之, 原田卓弥, 西川宏之, 芳賀潤二, 酒井卓郎, 佐藤隆博, 石井保行, 神谷富裕
  • Journal Title: 2005年放電学会年次大会講演論文集 (CD-ROM)
• [Presentation] シロキサン系薄膜の集束イオンビーム描画による微細加工 (2008)
  • Author(s): 土屋 龍太郎, 古田 祐介, 打矢 直之, 西川 宏之, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.2, 30p-ZL-2, p.750
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-30
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] シロキサン系薄膜の集束イオンビーム描画による微細加工 (2008)
  • Author(s): 土屋 竜太郎、古田 祐介、打矢 直之、西川 宏之、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.2(30p-ZL-2, p.750)
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-30
• [Presentation] 三次元構造誘電泳動デバイスにおける微生物の捕集特性 (2008)
  • Author(s): 中尾 亮太, 内田 諭, 古田 祐介, 西川 宏之
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.3, 29p-R-9, p.1371
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-29
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束陽子線による微細構造のPDMSによる転写 (2008)
  • Author(s): 関 佳裕, 西川 宏之, 打矢 直之, 古田 祐介, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.2, 29a-ZL-19, p.732
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-29
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 三次元構造誘電泳動デバイスにおける微生物の捕集特性 (2008)
  • Author(s): 中尾 亮太、内田 諭、古田 祐介、西川 宏之
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.3(29p-R-9, p.1371)
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-29
• [Presentation] 集束陽子線による微細構造のPDMSによる転写 (2008)
  • Author(s): 関 佳裕、西川 宏之、打矢 直之、古田 祐介、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.2(29a-ZL-19, p.732)
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-29
• [Presentation] 集束プロトンビーム微細加工を応用した微生物濃縮セルの作製と評価 (2008)
  • Author(s): 古田 祐介, 打矢 直之, 西川 宏之, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕, 中尾 亮太, 内田 諭
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.3, 27a-ZL-1, p.714
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-27
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束プロトンビーム微細加工を応用した微生物濃縮セルの作製と評 (2008)
  • Author(s): 古田 祐介、打矢 直之、西川 宏之、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕、中尾 亮太、内田 諭
  • Organizer: 第55回応用物理学関係連合講演会講演予稿集No.3(27a-ZL-1, p.714)
  • Place of Presentation: 日本大学理工学部(千葉)
  • Year and Date: 2008-03-27
• [Presentation] Proton Beam Writingによる3次元微細加工 (2007)
  • Author(s): 打矢 直之, 西川 宏之, 古田 祐介, 吉田 栄治, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 第12回放射線プロセスシンポジウム要旨集pp.95-98
  • Place of Presentation: 日本科学未来館(東京)
  • Year and Date: 2007-11-30
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Proton Beam Writingによる3次元微細加工 (2007)
  • Author(s): 打矢 直之、西川 宏之、古田 祐介、吉田 栄治、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕
  • Organizer: 第12回放射線プロセスシンポジウム講演要旨・ポスター発表要旨集(pp.95-98)
  • Place of Presentation: 日本科学未来館(東京)
  • Year and Date: 2007-11-30
• [Presentation] Lithography Using Focused High-Energy Proton Beam for Fabrication of High-Aspect-Ratio Microstructures (2007)
  • Author(s): H.Nishikawa, Y.Furuta, N.Uchiya, J.Haga, M.Oikawa, T.Satoh, Y.Ishii, T.Kamiya
  • Organizer: 20th Microprocesses and Nanotechnology Conference, pp.66-67, Paper No.6A-4-12
  • Place of Presentation: 京都
  • Year and Date: 2007-11-06
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Electroplating of Metal Micro-Structure Using a Resist Micro-Machined by Proton Beam Writing (2007)
  • Author(s): N.Uchiya, Y.Furuta, H.Nishikawa, T.Watanabe, J.Haga, T.Satoh, M.Oikawa, T.Ohkubo, Y.Ishii, T.Kamiya
  • Organizer: 20th Microprocesses and Nanotechnology Conference, pp.288-289, Paper No.6A-4-113
  • Place of Presentation: 京都国際会館(京都)
  • Year and Date: 2007-11-06
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Fabrication of High-Aspect-Ratio Pillars by Proton Beam Writing and Application to DEP-Devices (2007)
  • Author(s): Y.Furuta, N.Uchiya, H.Nishikawa, J.Haga, M.Oikawa, T.Satoh, Y.Ishii, T.Kamiya, R.Nakao, S.Uchida
  • Organizer: 20th Microprocesses and Nanotechnology Conference, pp.340-341, Paper No.6A-4-139
  • Place of Presentation: 京都国際会館(京都)
  • Year and Date: 2007-11-06
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Lithography Using Focused High-Energy Proton Beam for Fabrication of High-Aspect-Ratio Microstructures (2007)
  • Author(s): H. Nishikawa, Y. Furuta, N. Uchiya, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya
  • Organizer: 20th Microprocesses and Nanotechnology Conference(pp.66-67, Paper No.6A-4-12)
  • Place of Presentation: Kyoto
  • Year and Date: 2007-11-06
• [Presentation] Electroplating of Metal Micro-Structure Using a Resist Micro-Machined by Proton Beam Writing (2007)
  • Author(s): N. Uchiya, Y. Furuta, H. Nishikawa, T. Watanabe, J. Haga, T. Satoh, M. Oikawa, T. Ohkubo, Y. Ishii, T. Kamiya
  • Organizer: 20th Microprocesses and Nanotechnology Conference(pp.288-289, Paper No.6A-4-113)
  • Place of Presentation: 京都国際会館(京都)
  • Year and Date: 2007-11-06
• [Presentation] Fabrication of High-Aspect-Ratio Pillars by Proton Beam Writing and Application to DEP-Devices (2007)
  • Author(s): Y. Furuta, N. Uchiya, H. Nishikawa, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya, R. Nakao, S. Uchida
  • Organizer: 20th Microprocesses and Nanotechnology Conference(pp.340-341, Paper No.6A-4-139)
  • Place of Presentation: 京都国際会館(京都)
  • Year and Date: 2007-11-06
• [Presentation] 集束プロトン線による高アスペクト比ピラー形成とデバイス応用 (2007)
  • Author(s): 古田 祐介, 打矢 直之, 西川 宏之, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕, 中尾 亮太, 内田 諭
  • Organizer: 第68回秋季応用物理学会学術講演会講演予稿集No.2, 5a-C-21, p.736
  • Place of Presentation: 北海道工業大学(北海道)
  • Year and Date: 2007-09-05
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束プロトン線による高アスペクト比ピラー形成とデバイス応用 (2007)
  • Author(s): 古田 祐介、打矢 直之、西川 宏之、芳賀 潤二、及川 将一、佐藤 隆博、石井 保行、神谷 富裕、中尾 亮太、内田 諭
  • Organizer: 第68回秋季応用物理学会学術講演会講演予稿集No.2(5a-C-21, p.736)
  • Place of Presentation: 北海道工業大学(北海道)
  • Year and Date: 2007-09-05
• [Presentation] Fabrication of 3-D Structures of Resist by Proton Beam Writing (2007)
  • Author(s): Y. Furuta, N. Uchiya, H. Nishikawa, J. Haga, T Satoh, M. Oikawa, Y. Ishii, T. Kamiya
  • Organizer: The 51st International Conference on Electron, Ion, and PhotonBeam Technology and Nanofabrication, Paper 7A.5
  • Place of Presentation: 米国コロラド州
  • Year and Date: 2007-06-11
• [Presentation] Fabrication of High-Aspect-Ratio Microstructures by Proton Beam Writing(PBW) (2007)
  • Author(s): N.Uchiya, Y.Furuta, H.Nishikawa, T.Watanabe, J.Haga, T.Sato, Y.Ishii, T.Kamiya
  • Organizer: 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology, Abstracts, pp.201-202
  • Place of Presentation: フランス
  • Year and Date: 2007-06-07
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Fabrication of High-Aspect-Ratio Microstructures by Proton Beam Writing(PBW) (2007)
  • Author(s): N. Uchiya, Y. Furuta, H. Nishikawa, T. Watanabe, J. Haga, T. Sato, Y. Ishii, T. Kamiya
  • Organizer: 7th International Workshop on High-Aspect-RatioMicro-Structure Technology, Abstracts(pp.201-202)
  • Place of Presentation: フランス
  • Year and Date: 2007-06-07
• [Presentation] Fabrication of 3-D Structures of Resist by Proton Beam Writing (2007)
  • Author(s): Y.Furuta, N.Uchiya, H.Nishikawa, J.Haga, T.Satoh, M.Oikawa, Y.Ishii, T.Kamiya
  • Organizer: The 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, Paper 7A.5
  • Place of Presentation: 米国コロラド州
  • Year and Date: 2007-06-01
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束プロトンビーム描画による3次元構造体の作製 (2007)
  • Author(s): 古田 祐介, 打矢 直之, 西川 宏之, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 第54回応用物理学関係連合講演会, 講演予稿集論文番号29p-SH-14
  • Place of Presentation: 青山学院大学
  • Year and Date: 2007-03-29
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束プロトンビーム描画による高アスペクト比微細型加工 (2007)
  • Author(s): 吉田 栄治, 古田 祐介, 打矢 直之, 西川 宏之, 芳賀 潤二, 及川 将一, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 2007年度精密工学会春季大会学術講演会講演論文集, 論文番号C47, pp.253-254
  • Place of Presentation: 芝浦工業大学
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Fabrication of High-Aspect-Ratio Microstructures by Proton Beam Writing(PBW) (2007)
  • Author(s): N., Uchiya, Y., Furuta, H., Nishikawa, T., Watanabe, J., Haga, T., Sato, Y., Ishii, T., Kamiya
  • Organizer: 7th International Workshop on High-Aspect-Ratio Micro-Structure Technology, Abstracts, 201-202
  • Place of Presentation: France
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Fabrication of 3-D Structures of Resist by Proton Beam Writing (2007)
  • Author(s): Y., Furuta, N., Uchiya, H., Nishikawa, J., Haga, T., Satoh, M., Oikawa, Y., Ishii, T., Kamiya
  • Organizer: The 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
  • Place of Presentation: USA
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Lithography Using Focused High-Energy Proton Beam for Fabrication of High-Aspect-Ratio Microstructures (2007)
  • Author(s): H., Nishikawa, Y., Furuta, N., Uchiya, J., Haga, M., Oikawa, T., Satoh, Y., Ishii, T., Kamiya
  • Organizer: 20th Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kyoto
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Electroplating of Metal Micro-Structure Using a Resist Micro-Machined by Proton Beam Writing (2007)
  • Author(s): N., Uchiya, Y., Furuta, H., Nishikawa, T., Watanabe, J., Haga, T., Satoh, M., Oikawa, T., Ohkubo, Y., Ishii, T., Kamiya
  • Organizer: 20th Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kyoto
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Fabrication of High-Aspect-Ratio Pillars by Proton Beam Writing and Application to DEP-Devices (2007)
  • Author(s): Y., Furuta, N., Uchiya, H., Nishikawa, J., Haga, M., Oikawa, T., Satoh, Y., Ishii, T., Kamiya, R., Nakao, S., Uchida
  • Organizer: 20th Microprocesses and Nanotechnology Conference
  • Place of Presentation: Kyoto
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] 集束プロトンビーム描画による厚膜レジストの微細加工 (2006)
  • Author(s): 打矢 直之, 古田 祐介, 西川 宏之, 芳賀 潤二, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 第67回応用物理学会学術講演会, 講i演予稿集論文番号31a-RC-9, p.694
  • Place of Presentation: 立命館大学
  • Year and Date: 2006-08-31
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Micro-photoluminescence study on defects induced by ion microbeam in silica glass (2006)
  • Author(s): M.Murai, H.Nishikawa, T.Nakamura, H.Aiba, Y.Ohki, M.Oikawa, T.Sato, T.Kamiya
  • Organizer: 6th Symposium, SiO_2 Advanced Dielectrics and Related Devices, Book of Abstracts, pp.96-97
  • Place of Presentation: Italy
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Micro-machining of Resists on Silicon by Proton Beam Writing (2006)
  • Author(s): Naoyuki Uchiya, Takuya Harada, Masato Murai, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Yasuyuki Ishii, Tomihiro Kamiya
  • Organizer: Abstracts of the 10th International Conference on Nuclear Microprobe Technology and Applications
  • Place of Presentation: Singapore
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Accurate Measurements of Beam Energy Spreads Using a Combination of Nuclear Resonance Reaction and a 0-degree Beam-Line analyzing method (2006)
  • Author(s): Y.Ishii, A.Chiba, J.Haga, K.Mizuhashi, T.Kamiya
  • Organizer: Abstracts of the 10th International Conference on Nuclear Microprobe Technology and Applications
  • Place of Presentation: Singapore
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] シリカガラスに生じたイオンマイクロビーム誘起変形の熱的安定性 (2006)
  • Author(s): 相場 洋彦, 中村 知晴, 大木 義路, 村井 将人, 西川 宏之, 及川 将一, 佐藤 隆博, 荒川 和夫
  • Organizer: 第53回応用物理学関係連合講演会講i演予稿集, No.2, 論文番号25p-ZA-10, p.962
  • Place of Presentation: 武蔵工業大学
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] シリカガラスに生じたイオンマイクロビーム誘起変形と屈折率変化の熱的特性 (2006)
  • Author(s): 相場 洋彦, 大木 義路, 中村 知晴, 西川 宏之, 村井 将人, 荒川 和夫, 福田 光宏, 酒井 卓郎, 及川 将一, 佐藤 隆博, 石井 保行, 山本 春也
  • Organizer: 第1回高崎量子応用研究シンポジウム, 1P-73
  • Place of Presentation: 高崎市民ギャラリー
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束プロトンビーム描画によるレジスト材料のマイクロマシニング (2006)
  • Author(s): 打矢 直之, 原田 卓也, 村井 将人, 西川 宏之, 芳賀 潤二, 酒井 卓郎, 佐藤 隆博, 及川 将一, 石井 保行, 福田 光宏, 山本 春也, 神谷 富裕
  • Organizer: 第1回高崎量子応用研究シンポジウム, 2P-68
  • Place of Presentation: 高崎市民ギャラリー
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] 集束プロトンビーム描画による高アスペクト比微細型加工 (2006)
  • Author(s): 吉田 栄治, 西川 宏之, 打矢 直之, 古田 祐介, 神谷 富裕, 石井 保行, 佐藤 隆博, 及川 将一, 芳賀 潤二
  • Organizer: 成形加エシンポジア'06第14回プラスチック成形加工学会秋季大会予稿集pp.33-34
  • Place of Presentation: 岐阜大学
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Micro-photoluminescence study on defects induced by ion microbeam in silica glass (2006)
  • Author(s): M., Murai, H., Nishikawa, T., Nakamura, H., Aiba, Y., Ohki, M., Oikawa, T., Sato, T., Kamiya
  • Organizer: 6th Symposium, SiO2 Advanced Dielectrics and Related Devices,(Book of Abstracts)
  • Place of Presentation: Palermo, Italy
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Micro-machining of Resists on Silicon by Proton Beam Writing (2006)
  • Author(s): Naoyuki, Uchiya, Takuya, Harada, Masato, Murai, Hiroyuki, Nishikawa, Junji, Haga, Takahiro, Sato, Yasuyuki, Ishii, Tomihiro, Kamiya
  • Organizer: 10th International Conference on Nuclear Microprobe Technology and Applications
  • Place of Presentation: Singapore
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Accurate Measurements of Beam Energy Spreads Using a Combination of Nuclear Resonance Reaction and a 0-degree Beam-Line analyzing method (2006)
  • Author(s): Y., Ishii, A., Chiba, J., Haga, K., Mizuhashi, T., Kamiya
  • Organizer: The 10th International Conference on Nuclear Microprobe Technology and Applications
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] プロトンマイクロビーム描画によるレジストの微細加工 (2005)
  • Author(s): 打矢 直之, 原田 卓弥, 西川 宏之, 芳賀 潤二, 酒井 卓郎, 佐藤 隆博, 石井 保行, 神谷 富裕
  • Organizer: 2005年放電学会年次大会講演論文集論文番号D-4-6
  • Place of Presentation: 芝浦工業大学
  • Year and Date: 2005-11-10
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] プロトンマイクロビーム照射によるポリマーの微細加工 (2005)
  • Author(s): 原田 卓弥, 打矢 直之, 村井 将人, 西川 宏之, 酒井 卓郎, 佐藤 隆博, 石井 保行, 福田 光宏
  • Organizer: 第66回応用物理学会学術講演会講演予稿集No.2, p.629, 9a-ZD-11
  • Place of Presentation: 徳島大学
  • Year and Date: 2005-09-09
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Irradiation Effects on Silica Glass by Ion Microbeam for Fabrication of Optical Elements (2005)
  • Author(s): Masato Murai, Kazunari Fukagawa, Hiroyuki Nishikawa, Tomoharu Nakamura, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Kazuo Arakawa
  • Organizer: Proceedings of 2005 International Symposium on Electrical Insulating Materials, B3-7, pp.210-213
  • Place of Presentation: Kitakyushu,Japan
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Modification of structural and optical properties of silica glass induced by ion microbeam (2005)
  • Author(s): H.Nishikawa, M.Murai, T.Nakamura, Y.Ohki, M.Oikawa, T.Sato, T.Sakai, Y.Ishii, and M.Fukuda
  • Organizer: International Conference on Surface Modification of Materials by Ion Beams(SMMIB'05), Paper No.MP-08, p.85
  • Place of Presentation: Turkey
  • Description: 「研究成果報告書概要(和文)」より
• [Presentation] Irradiation Effects on Silica Glass by Ion Microbeam for Fabrication of Optical Elements (2005)
  • Author(s): Masato, Murai, Kazunari, Fukagawa, Hiroyuki, Nishikawa, Tomoharu, Nakamura, Yoshimichi, Ohki, Masakazu, Oikawa, Takahiro, Sato, Kazuo, Arakawa
  • Organizer: International Symposium on Electrical In sulating Materials, B3-7
  • Place of Presentation: Kitakyushu, Japan
  • Description: 「研究成果報告書概要(欧文)」より
• [Presentation] Modification of structural and optical properties of silica glass induced by ion microbeam (2005)
  • Author(s): H., Nishikawa, M., Murai, T., Nakamura, Y., Ohki, M., Oikawa, T., Sato, T., Sakai, Y., Ishii, M., Fukuda
  • Organizer: International Conference on Surface Modification of Materials by Ion Beams(SMMIB'05), Paper, MP-O8
  • Place of Presentation: Turkey
  • Description: 「研究成果報告書概要(欧文)」より
• [Remarks] 「研究成果報告書概要(和文)」より
  • URL: http://www.cfm.ae.shibaura-it.ac.jp/
• [Remarks] フレキシブル微細加工研究センター
  • URL: http://www.cfm.ae.shibaura-it.ac.jp/