Science and technology of glass nanoimprint and its industrial applications
| Project/Area Number |
17360320
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Inorganic materials/Physical properties
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| Research Institution | Tokyo Institute of Technology |
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Principal Investigator |
YOSHIMOTO Mamoru Tokyo Institute of Technology, Interdis ciplinary Graduate Scool of Science and Engineering, Professor (20174998)
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| Project Period (FY) |
2005 – 2007
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| Project Status |
Completed (Fiscal Year 2007)
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| Budget Amount *help |
¥12,260,000 (Direct Cost: ¥11,600,000、Indirect Cost: ¥660,000)
Fiscal Year 2007: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Fiscal Year 2006: ¥3,000,000 (Direct Cost: ¥3,000,000)
Fiscal Year 2005: ¥6,400,000 (Direct Cost: ¥6,400,000)
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| Keywords | glass / nano-imprint / surface / oxide / nano-structure / nano-pattern / crystal growth / epitaxial film / 薄膜 / 機能改質 / 構造 / ナノテクノロジー |
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| Research Abstract |
We investigated atomic-scale surface modifications of silicate glass by nanoimprint using an atomically stepped sapphire (α-Al_2O_3 single crystal) plate as nanopattern mold. The sapphire mold had regularly arranged straight atomic steps, with uniform height and terrace width of about 0.2 and 80 nm, respectively. During pressing, vertical positions of the sapphire mold and glass plate significantly affected the morphology of the imprinted glass surface. The nanopattern was transferred to the glass surface when the mold was set on the glass plate, while the nanowave pattern was formed on the glass surface when the glass plate was set on the mold. The Vickers hardness of the nanostriped glass was estimated to be higher than that of non-patterned glass, and the surface of the nanostriped glass was more hydrophobic than that of non-patterned glass. We fabricated indium tin oxide (ITO) thin films on nanoimprinted glass substrates using pulsed laser deposition (PLD). The surface of the ITO thin films well reflected the nanopattern of the glass substrate surface. The degree of crystalline orientation of the ITO thin films fabricated on the nanoimprinted glasses was more intense than that of the ITO thin films on the non-patterned commercial glass substrates. The resistivity of the ITO thin films deposited on the nanoimprinted glasses was lower by about 30% than that on the non-patterned commercial glasses, which was probably due to the higher crystal orientation of the films on the nanopatterned glass surfaces.
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Report
(4 results)
Research Products
(35 results)
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[Journal Article] Fabrication of Optically Active Er3+-Doped Bi203-Si02 Glass Thin Films by Pulsed Laser Depostion2006
Author(s)
S.Akiba, M.Takakura, A.Matsuda, W.Hara, T.Okada, T.Watanabe, Y.Kondo, S.Ito, P.Ahmet, T.Chikyo, S.Tanabe, T.Hanada, M.Yoshimoto
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Journal Title
Jpn. J. App. Phys. Vol.45, No.7
Pages: 5933-5935
Related Report
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