Development of next-generation electronic devices using carbon nanowalls
Project/Area Number |
17510101
|
Research Category |
Grant-in-Aid for Scientific Research (C)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Nanomaterials/Nanobioscience
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Research Institution | Meijo University |
Principal Investigator |
HIRAMATSU Mineo Meijo University, Faculty of Science and Technology, Professor, 理工学部, 教授 (50199098)
|
Project Period (FY) |
2005 – 2006
|
Project Status |
Completed (Fiscal Year 2006)
|
Budget Amount *help |
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2006: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 2005: ¥2,800,000 (Direct Cost: ¥2,800,000)
|
Keywords | Carbon nanowalls / Plasma-enhanced CVD / Carbon nanostructures / Radical injection / Electron field emission / Nanoimprint / Catalyst support / グラファイト / 電子放出 / 白金坦持 / 超臨界 |
Research Abstract |
Carbon nanowalls, two-dimensional carbon nanostructure, are the graphite nanostructure with edges, which comprise the stacks of plane graphene sheets standing almost vertically on the substrate, forming a unique nanostructure similar to a maze with high aspect ratio. The large surface area and sharp edges of carbon nanowalls are useful as templates for the fabrication of other types of nanostructured materials, which have potential various applications such as in energy storage and electrodes for fuel cell as well as an electron field emitter. We proposed novel plasma processing, radical-controlled processing using "radical injection" technique, and demonstrated the successful formation of vertically aligned carbon nanowalls using fluorocarbon (radio-frequency) rf plasma-enhanced chemical vapor deposition (PECVD) assisted by H radical injection. The correlation between carbon nanowall growth and the fabrication conditions was investigated. H and CF_x (x=1-3) radical densities in the pla
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sma were measured in order to discuss the growth mechanism of carbon nanowalls. The density ratio of H radicals to CF_x radicals was found to be an important factor responsible for the formation of carbon nanowalls from fluorocarbon/hydrogen systems. The morphologies of carbon nanowalls were controllable by changing the types of carbon source gases and the amount of H radicals injected. As one of applications of carbon nanowalls, platinum particles with size of about 2 nm were successfully deposited on the surface of carbon nanowalls. Field electron emission characteristics were also investigated for the carbon nanowall film. The field electron emission from carbon nanowalls was clearly observed. The aggregation of carbon nanowalls would be useful as templates for the fabrication of other types of nanostructured materials as well as supporting materials for nano-particles of catalysts, and would certainly find application in gas sensors, energy storage devices and electrodes for fuel cells, due to their large surface areas. Less
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Report
(3 results)
Research Products
(14 results)