A Study of Site-Specific Fragmentation by Using Core Excitation・with the Aim of Application to Molecular Knife-
| Project/Area Number |
17550013
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Physical chemistry
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| Research Institution | Ehime University |
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Principal Investigator |
NAGAOKA Shin-ichi Ehime University, Graduate School of Science and Technology, Professor, 理工学研究科, 教授 (30164403)
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| Co-Investigator(Kenkyū-buntansha) |
MASE Kazuhiko High Energy Accelerator Research Organization, Institute of Materials Structure Science, Associate Professor, 物質構造科学研究所, 助教授 (40241244)
TAKAHASHI Osamu Hiroshima University, Graduate School of Science, Research Associate, 理学研究科, 助手 (60253051)
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| Project Period (FY) |
2005 – 2006
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| Project Status |
Completed (Fiscal Year 2006)
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| Budget Amount *help |
¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 2006: ¥1,500,000 (Direct Cost: ¥1,500,000)
Fiscal Year 2005: ¥2,000,000 (Direct Cost: ¥2,000,000)
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| Keywords | Chemical Physics / Atomic and Molecular Physics / Nano Material / Site-Specificity / Core / Molecular Knife |
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| Research Abstract |
With the aim of application to molecular knife, we studied site-specific fragmentation caused by core-ionization of organosilicon molecules (for example, F_3SiCH_2CH_2Si(CH_3)_3), N_2O, CF_3SF_5, and formic acid dimer (HCOOH)_2 by means of electron-ion coincidence spectroscopy in the vapor phase and condensed phase. The ab initio molecular orbital method was used for the theoretical description.
Site-specific fragmentation caused by Si:2p core-level photoionization. of F_3SiCH_2CH_2Si(CH_3)_3 vapor was studied by means of high-resolution energy-selected-electron photoion-photoion triple-coincidence spectroscopy. F_3SiCH_2CH_2^+-Si(CH_3)3^+ ion-pairs were produced by the 2p photoionization of the Si atoms bonded to the three methyl groups, and SiF^+-containing ion-pairs were produced by the 2p photoionization of the Si atoms bonded to the three F atoms.
The site-specificity was reduced in the Si:1s ionization. The site-specific ion desorption caused by N:1s photoionization of N_2O was not clearly revealed. The effective electron migration between the two nitrogen sites, which are connected with each other in N_2O, would be responsible for the disappearance of the site-specificity for the ion desorption.
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Report
(3 results)
Research Products
(23 results)
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[Journal Article] Electron-Ion-Ion Triple-Coincidence Spectroscopic Study of Site-Specific Fragmentation Caused by Si:2p Core-Level Photoionization of F_3SiCH_2CH_2Si(CH_3)_3 Vapor2007
Author(s)
S.Nagaoka, G.Prumper, H.Fukuzawa, M.Hino, M.Takemoto, Y.Tamenori, J.Harries, I.H.Suzuki, O.Takahashi, K.Okada, K.Tabayashi, X.-J.Liu, T.Lischke, K.Ueda
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Journal Title
Description
「研究成果報告書概要(欧文)」より
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