Preparation of perovskite bismuth-based compound thin films by hot isostatic pressing

• Project/Area Number: 19560736
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: University of Hyogo
• Principal Investigator: KOBUNE Masafumi University of Hyogo, 大学院・工学研究科, 准教授 (90240960)
• Co-Investigator(Kenkyū-buntansha): 藤澤 浩訓 兵庫県立大学, 大学院・工学研究科, 助教 (30285340)
• Co-Investigator(Renkei-kenkyūsha): FUJISAWA Hironori 兵庫県立大学, 大学院・工学研究科, 准教授 (30285340)
• Project Period (FY): 2007 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000); Fiscal Year 2008: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000); Fiscal Year 2007: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
• Keywords: 高圧アニール / 結晶制御

Research Abstract

常温スパッタ法により(001)配向(Bi0.5La0.5)(Ni0.5Ti0.5)O3 [BLNT]結晶核上に非晶質BLNT膜を作製し、等方高圧アニール(HIP)法により至適に調整された酸素分圧下で結晶化を行い、結晶核と同方向の配向性とペロブスカイト構造をもつBLNT薄膜の作製に成功した。作製した膜の諸特性(構造及び電気特性)評価を行い、すぐれた強誘電体であることを実証した

Research Products

• [Journal Article] Structural characteris- tics and ferroelectric properties of bismuth-based compound thin films crystallized by hot isostatic press- ing (2009)
  • Author(s): M. Kobune, H. Tada, H. Oshima, D. Horii, A. Tamura, Y. Daiko, A. Mineshige and T. Yazawa
  • Journal Title: Key Engineering Materials (accepted)
  • Peer Reviewed
• [Journal Article] Fabrication and characterization of perovskite (Bi, Sm)(Ni, Ti)O_3 thin films by rf magnetron sputtering (2009)
  • Author(s): H. Tada, M. Kobune, K. Fukushima, H. Oshima, D. Horii, A. Tamura, Y. Daiko, A. Mineshige, T. Yazawa, H. Fujisawa, M. Shimizu, H. Yamaguchi and K. Honda
  • Journal Title: J. Korean Phys. Soc. (accepted)
  • Peer Reviewed
• [Journal Article] Formation mechanism in perovskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabri- cated by rf magnetron sputtering (2009)
  • Author(s): H. Oshima, M. Kobune, H. Tada, K. Fukushima, D. Horii, A. Tamura, Y. Daiko, A. Mineshige, T. Yazawa, H. Yamaguchi and K. Honda
  • Journal Title: J. Korean Phys. Soc. (accepted)
  • Peer Reviewed
• [Journal Article] Structural characteristics and ferroelectric properties of bismuth-based compound thin films crystallized by hot lsostatic pressing (2009)
  • Author(s): M. Kobune, et al.
  • Journal Title: Key Engineering Materials (accepted)
  • Peer Reviewed
• [Journal Article] Fabrication and characterization of perovskite (Bi, Sm)(Ni, Ti)0_3 thin films by rf magnetron sputtering (2009)
  • Author(s): H. Tada, et al.
  • Journal Title: J. Korean Phys. Soc. (accepted)
  • Peer Reviewed
• [Journal Article] Formation mechanism in perovskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabricated by rf magnetron sputtering (2009)
  • Author(s): H. Oshima, et al.
  • Journal Title: J. Korean Phys. Soc. (accepted)
  • Peer Reviewed
• [Journal Article] Growth of ferroelectric bismuth lanthanum nickel titanate thin films byrf magnetron sputtering (2007)
  • Author(s): M.Kobune, et. al.
  • Journal Title: Journal of Applied Physics 101
  • Peer Reviewed
• [Journal Article] Growth of perovskite(Bi,Ln)(Ni_<0.5>Ti_<0.5>)O_3 thin films by rf magnetronsputtering (2007)
  • Author(s): K.Fukushima, et. al.
  • Journal Title: Japanese Journal of Applied Physics 46 Pages: 6938-6943
  • Peer Reviewed
• [Presentation] スパッタ法により作製した(Bi, Ln)- (Ni, Ti)O_3薄膜のペロブスカイト構造形成メカニズム (2008)
  • Author(s): 小舟正文、多田英人、大島尚士、堀井大輔、大幸裕介、嶺重温、矢澤哲夫
  • Organizer: 日本セラミックス協会第21回秋季シンポジウム講演予稿集(188)
  • Place of Presentation: 北九州国際会議場
• [Presentation] Fabrication and characteriza- tion of perovskite (Bi, Sm)(Ni, Ti)O_3 thin films by rf magnetron sputtering (2008)
  • Author(s): H. Tada, M. Kobune, K. Fukushima, H. Oshima, D. Horii, A. Mineshige and T. Yazawa
  • Organizer: Abstract book of the 7^<th> Korea-Japan conference on ferroelectricity
  • Place of Presentation: Jeju, Korea
• [Presentation] Formation mechanism in pero- vskite structure of (Bi, Ln)(Ni, Ti)O_3 thin films fabricated by rf magnetron sputtering (2008)
  • Author(s): H. Oshima, M. Kobune, K. Fukushima, H. Tada, D. Horii, A. Mineshige and T. Yazawa
  • Organizer: Abstract book of the 7^<th> Korea-Japan conference on ferroelec- tricity
  • Place of Presentation: Jeju, Korea
• [Presentation] Structural characteristics and ferroelectric properties of bis- muth-based compound thin films crys- tallized by hot isostatic pressing (2008)
  • Author(s): H. Tada, M. Kobune, K. Fukushima, H. Oshima, D. Horii, A. Mineshige, T. Yazawa
  • Organizer: Abstract book of the 6^<th> asian meeting on electroceramics(161)
  • Place of Presentation: Tsukuba, Japan
• [Presentation] スパッタ法により作製した(Bi, Ln)(Ni, Ti)O_3薄膜のペロプスカイド構造形成メカニズム (2008)
  • Author(s): 小舟正文, ほか
  • Organizer: 日本セラミックス協会 第21回秋季シンポジウム
  • Place of Presentation: 北九州国際会議場
• [Presentation] Fabrication and characterization of perovskite (Bi, Sm)(Ni, Ti)0_3 thin films by rf magnetron sputtering (2008)
  • Author(s): H. Tada, et al.
  • Organizer: The 7^<th> Korea-Japan Conference on Ferro-electricity
  • Place of Presentation: Jeju, Korea
• [Presentation] Formation mechanism in perovskite structure of (Bi, Ln)-(Ni, Ti)0_3 thin films fabricated by rf magnetron sputtering (2008)
  • Author(s): H. Oshima, et al.
  • Organizer: The 7^<th> Korea-Japan Conference on Ferro-electricity
  • Place of Presentation: Jeju, Korea
• [Presentation] Structural and ferroelectric properties of bismuth-based compound thin films crystallized by hot isostatic pressing (2008)
  • Author(s): H. Tada, et al.
  • Organizer: The 6^<th> Asian Meeting on Electroceramics
  • Place of Presentation: Tsukuba, Japan
• [Presentation] スパッタリング法による(Bi,Nd)(Ni_0.5Ti_0.5)O_3ペロブスカイト化合物薄膜の成長 (2007)
  • Author(s): 多田 英人, ほか
  • Organizer: 第20回秋季シンポジウム
  • Place of Presentation: 名古屋工業大学
  • Year and Date: 2007-09-12
• [Presentation] スパッタリング法による(Bi,Ln)(Ni_0.5Ti_0.5)O_3ペロブスカイト化合物薄膜の成長 (2007)
  • Author(s): 福島 浩次, ほか
  • Organizer: 第24回強誘電体応用会議
  • Place of Presentation: コープイン京都
  • Year and Date: 2007-05-25
• [Remarks]
  • URL: http://www.eng.u-hyogo.ac.jp/msc/msc5/info.html