Investigation of process reaction mechanism in plasma nitridation with laser diagnostics
| Project/Area Number |
20760046
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Applied physics, general
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| Research Institution | Nagoya University |
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Principal Investigator |
TAKEDA Keigo Nagoya University, 大学院・工学研究科, 助教 (00377863)
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| Project Period (FY) |
2008 – 2009
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| Project Status |
Completed (Fiscal Year 2009)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2009: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2008: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
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| Keywords | プラズマ酸窒化 / 窒化プロセス / 窒素・酸素ラジカル / プラズマ気相診断 / 原子絶対密度計測 / 準安定原子状ラジカル / 大気圧マイクロホローカソード光源 / 窒素ラジカル / 定量解析 / プラズマ酸化 / 真空紫外レーザー吸収分光法 / 反応メカニズム / 低温プロセス |
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| Research Abstract |
Plasma oxidation and nitridation are key technology in the silicon technology. In this study, we have successfully measured the absolute densities of activated species, such as oxygen and nitrogen atoms in these processing plasmas, with plasma diagnostics methods such as vacuum ultraviolet laser absorption spectroscopy, etc. Moreover, a technique with a micro hollow cathode lamp has been made technological advances for measuring the metastable atomic radicals.
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Report
(3 results)
Research Products
(34 results)
