Development of filtered-arc-deposition source with activated anode and preparation of functional-amorphous carbon film
| Project/Area Number |
21360131
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Power engineering/Power conversion/Electric machinery
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| Research Institution | Toyohashi University of Technology |
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Principal Investigator |
TAKIKAWA Hirofumi 豊橋技術科学大学, 大学院・工学研究科, 教授 (90226952)
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| Co-Investigator(Renkei-kenkyūsha) |
SUDA Yoshiyuki 豊橋技術科学大学, 大学院・工学研究科, 准教授 (70301942)
OKE Shinichiro 津山工業高等専門学校, 電子制御工学科, 講師 (20362329)
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| Project Period (FY) |
2009 – 2011
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| Project Status |
Completed (Fiscal Year 2011)
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| Budget Amount *help |
¥18,200,000 (Direct Cost: ¥14,000,000、Indirect Cost: ¥4,200,000)
Fiscal Year 2011: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2010: ¥3,640,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥840,000)
Fiscal Year 2009: ¥10,920,000 (Direct Cost: ¥8,400,000、Indirect Cost: ¥2,520,000)
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| Keywords | 電気機器 / 真空アーク / 真空アークプラズマ / フィルタードアーク蒸着 / 機能性アモルファスカーボン薄膜 / ダイヤモンドライクカーボン薄膜 / 均一成膜 / 異種元素ドーピング手法 / 光学膜厚モニタ / プラズマガン / 光学特性 / 密度・硬度 |
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| Research Abstract |
About a functional film deposition apparatus using the vacuum arc discharge plasma, we designed and developed a new filtered-arc-deposition system for doping dissimilar element into DLC film and preparing high-quality(high smoothness, uniform and droplet-free) DLC film. Apparatus function was assessed and dissimilar element doped DLC film was prepared.
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Report
(4 results)
Research Products
(86 results)
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[Journal Article] Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in at-FAD2010
Author(s)
H. Tanoue, M. Kamiya, S. Oke, Y. Suda, H. Takikawa, Y. Hasegawa, M. Taki, N. Tsuji, T. Ishikawa, H. Yasui, S. Temmei, H. Takahashi
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Journal Title
Thin Solid Films
Volume: Vol.518, No.13
Pages: 3546-3550
Related Report
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[Journal Article] Argon-dominated plasma beam generated by filtered vacuum arc and its substrate etching2009
Author(s)
H. Tanoue, M. Kamiya, S. Oke, Y. Suda, H. Takikawa, Y. Hasegawa, M. Taki, M. Kumagai, M. Kano, T. Ishikawa, H. Yasui
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Journal Title
Applied Surface Science
Volume: 255
Pages: 7780-7785
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[Journal Article] T-shape filtered arc deposition system with built-in electrostatic macro-particle trap for DLC film preparation2009
Author(s)
M. Kamiya, T. Yanagita, H. Tanoue, S. Oke, Y. Suda, H. Takikawa, M. Taki, Y. Hasegawa, T. Ishikawa, H. Yasui
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Journal Title
Thin Solid Films
Volume: Vol.518, No.5
Pages: 1498-1502
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[Presentation] 水素フリーダイヤモンドライクカーボン膜の半導体性評価2011
Author(s)
田上英人,柏木大幸,奥田浩史,角口公章,須田善行,滝川浩史,神谷雅男,瀧真,長谷川祐史,辻信広,石川剛史
Organizer
平成23年度電気関係学会東海支部連合大会
Place of Presentation
三重大学,三重県
Year and Date
2011-09-26
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[Presentation] フィルタードアークプラズマビームの回転スキャンおよび偏向制御2010
Author(s)
奥田浩史,柏木大幸,田上英人,神谷雅男,柳田太一郎,須田善行,滝川浩史,長谷川祐史,瀧真,辻信広,石川剛史,安井治之,金子智
Organizer
平成22年電気関係学会東海支部連合大会,I5-2
Place of Presentation
中部大学,愛知県
Year and Date
2010-08-31
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[Presentation] フィルタードアークプラズマビームを用いた水素フリーDLC膜の生成2010
Author(s)
奥田浩史,田上英人,神谷雅男,柳田太一郎,内藤翔太,須田善行,滝川浩史,長谷川祐史,瀧真,辻信広,石川剛史,安井治之
Organizer
平成22年電気学会放電・静止器・開閉保護合同研究会
Place of Presentation
東京都市大学,東京都
Year and Date
2010-06-28
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[Presentation] Effect ofgas introduction position on substrateetching using Ar plasma-beam inμT-FAD2009
Author(s)
H. Tanoue, M. Kamiya, S. Oke, Y. Suda, H. Takikawa, Y. Hasegawa, M. Taki, N. Tsuji, T. Ishikawa, H. Yasui
Organizer
SPSM-22
Place of Presentation
東京大学,東京都
Year and Date
2009-06-15
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