Radical-Containing Block Copolymers: Microphase Separation and Charge Storage/Transport Modulation in the Organic Thin Film Devices
| Project/Area Number |
21750129
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Single-year Grants |
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| Research Field |
Polymer chemistry
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| Research Institution | Waseda University |
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Principal Investigator |
SUGA Takeo Waseda University, 理工学術院, 講師 (10409659)
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| Project Period (FY) |
2009 – 2010
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| Project Status |
Completed (Fiscal Year 2010)
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| Budget Amount *help |
¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Fiscal Year 2010: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2009: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
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| Keywords | 高分子合成 / 機能性高分子 / 高分子構造・物性 / 有機電子材料・素子 / 高分子薄膜・表面 / 機能性高分子化学 / 高分子機能材料 / 導電機能素子 |
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| Research Abstract |
Redox-active radicals and ion pairs for charge compensation were incorporated into the microphase-separated domains, to modulate charge-injection/-transport properties, especially for a new design of organic nonvolatile memory. Radical/ion-containing block copolymers were prepared via stepwise controlled radical polymerization, or selective incorporation of TEMPO-ionic liquids into block copolymers, which construct the well-defined radical- and ionic-domains, and their interface. The correlation between the morphology and memory characteristics was investigated.
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Report
(3 results)
Research Products
(76 results)
